Regulation plate, anode holder, and substrate holder

US11268207B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11268207-B2
Application numberUS-201816630369-A
CountryUS
Kind codeB2
Filing dateJul 6, 2018
Priority dateJul 11, 2017
Publication dateMar 8, 2022
Grant dateMar 8, 2022

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  1. Title

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  2. Abstract

    A short plain-language summary of the technical disclosure.

  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

To partially or locally control a plating film thickness on a polygonal substrate. There is provided a regulation plate for adjusting a current between an anode and the polygonal substrate. This regulation plate includes a main body that has an edge forming a polygonal opening through which the current passes and an attachable/detachable shielding member to shield at least a part of the polygonal opening.

First claim

Opening claim text (preview).

The invention claimed is: 1. A regulation plate for adjusting a current between an anode and a polygonal substrate, the regulation plate comprising: a main body that has an edge forming a polygonal opening through which the current passes; an attachable/detachable shielding member to shield at least a part of the polygonal opening; and a shaft-shaped supporting member disposed to be across the polygonal opening, wherein the shielding member includes a shielding plate attachably/detachably mounted on the supporting member. 2. The regulation plate according to claim 1 , wherein the shielding member includes a partition member configured to divide the polygonal opening into a plurality of compartments. 3. The regulation plate according to claim 1 , wherein the shielding plate is attachably/detachably mounted on the supporting member without contacting the main body. 4. The regulation plate according to claim 2 , wherein the partition member partitions the polygonal opening to form a plurality of openings, the regulation plate further includes a shaft-shaped supporting member disposed to be across at least one of the plurality of openings, and the shielding member includes a shielding plate attachably/detachably mounted on the supporting member. 5. A regulation plate for adjusting a current between an anode and a polygonal substrate, the regulation plate comprising: a main body that has an edge forming a polygonal opening through which the current passes; and an attachable/detachable shielding member to shield at least a part of the polygonal opening, wherein the shielding member includes a partition member configured to divide the polygonal opening into a plurality of compartments, the partition member partitions the polygonal opening to form a plurality of openings, the regulation plate further includes a shaft-shaped supporting member disposed to be across at least one of the plurality of openings, and the shielding member includes a shielding plate attachably/detachably mounted on the supporting member.

Assignees

Inventors

Classifications

  • Electrolytic deposition, i.e. electroplating; Electroless plating · CPC title

  • C25D17/008Primary

    Current shielding devices · CPC title

  • Suspending or supporting devices for articles to be coated · CPC title

  • using masking means · CPC title

  • Apparatus specially adapted for electrolytic coating of wafers, e.g. semiconductors or solar cells · CPC title

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Frequently asked questions

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What does patent US11268207B2 cover?
To partially or locally control a plating film thickness on a polygonal substrate. There is provided a regulation plate for adjusting a current between an anode and the polygonal substrate. This regulation plate includes a main body that has an edge forming a polygonal opening through which the current passes and an attachable/detachable shielding member to shield at least a part of the polygon…
Who is the assignee on this patent?
Ebara Corp
What technology area does this patent fall under?
Primary CPC classification C25D17/008. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Mar 08 2022 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 2 related publications on this page (citations in our corpus or others sharing the same primary CPC).