Method for measuring a temperature

US11262250B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11262250-B2
Application numberUS-201916271336-A
CountryUS
Kind codeB2
Filing dateFeb 8, 2019
Priority dateFeb 28, 2018
Publication dateMar 1, 2022
Grant dateMar 1, 2022

How to read this patent

A practical reading order for non-experts. Skip the full description unless you need deep technical detail.

  1. Title

    What the patent document calls the invention.

  2. Abstract

    A short plain-language summary of the technical disclosure.

  3. Assignees and inventors

    Who owns or filed the patent and who is credited as inventor.

  4. Key dates

    Filing, priority, publication, and grant dates set the timeline.

  5. First independent claim

    The legal scope of protection — read this for what is actually claimed.

  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

    Prior art links and similar publications in this corpus.

Abstract

Official abstract text for this publication.

Implementations described herein generally relate to semiconductor manufacturing, and more specifically to a temperature measurement device. In one implementation, the temperature measurement device includes a substrate and a stack of metal layers coupled to the substrate. Each metal layer of the stack of metal layers extends continuously uninterrupted from edge to edge of the substrate. The first metal layer has a lower electrical resistivity than the second metal layers. The electrical resistivity of the stack is based on the electrical resistivity of the first metal layer, which is temperature dependent. Utilizing a known relationship between temperature measurements and resistivity measurements, the temperature measurement device can measure and store temperature information in various substrate processing processes.

First claim

Opening claim text (preview).

What is claimed is: 1. A temperature measuring device, comprising: a substrate including a first side and a second side opposite the first side the first side and second side meeting at an edge circumscribing the first side and second side, the substrate configured to replicate a workpiece used in vacuum processing; and a stack extending substantially across the first side of the substrate to the edge, the stack comprising: a first metal layer comprising a first material; and two second metal layers each comprising a second material different than the first material, the first metal layer being disposed between the two second metal layers wherein the second metal layers are configured to diffuse atoms into the first metal layer at elevated temperatures. 2. The temperature measuring device of claim 1 , wherein the first material comprises aluminum, tungsten, or silver. 3. The temperature measuring device of claim 2 , wherein the second material comprises titanium. 4. The temperature measuring device of claim 1 , wherein the stack is in direct contact with the substrate. 5. The temperature measuring device of claim 1 , further comprising a layer disposed between the substrate and the stack. 6. The temperature of claim 5 , wherein the layer comprises a dielectric material. 7. The temperature measuring device of claim 1 , further comprising a passivation layer encapsulating the stack. 8. The temperature measuring device of claim 7 , wherein the passivation layer comprises a dielectric material. 9. The temperature measuring device of claim 1 , wherein the substrate comprises semiconductor, glass, or polymer. 10. A temperature measuring device, comprising: a substrate including a first side and a second side opposite the first side, the first side and second side meeting at an edge circumscribing the first side and second side, the substrate configured to replicate a workpiece used in vacuum processing; and a stack extending substantially across the first side of the substrate to the edge, the stack comprising: a first metal layer having a first electrical resistivity; and two second metal layers each having a second electrical resistivity greater than the first electrical resistivity, the first metal layer being disposed between the two second metal layers wherein the second metal layers are configured to diffuse atoms into the first metal layer to permanently change the electrical resistivity of the first metal layer. 11. The temperature measuring device of claim 10 , wherein the first material comprises aluminum, tungsten, or silver. 12. The temperature measuring device of claim 11 , wherein the second material comprises titanium. 13. The temperature measuring device of claim 10 , wherein the stack is in direct contact with the substrate. 14. The temperature measuring device of claim 10 , further comprising a layer disposed between the substrate and the stack. 15. The temperature measuring device of claim 10 , further comprising a passivation layer encapsulating the stack. 16. A method for measuring a temperature, comprising: placing a first temperature measuring device into a process chamber, the first temperature measuring device extending from edge to edge of a substrate and having a first metal layer disposed between two second metal layers wherein the two second metal layers each having a second electrical resistivity greater than a first electrical resistivity of the first metal layer; perform a process on the first temperature measuring device; removing the first temperature measuring device from the process chamber; measuring a sheet resistivity of the first temperature measuring device; and converting the sheet resistivity to determine a temperature experienced in the process chamber. 17. The method of claim 16 , wherein the converting the sheet resistivity to a temperature comprises using a regression model previously identified during a calibration process, the calibration process performed using a second temperature measuring device different than the first temperature measuring device. 18. The method of claim 17 , wherein the calibration process comprises incrementally heating the second temperature measuring device to multiple temperatures. 19. The method of claim 18 , wherein the calibration process further comprises measuring a sheet resistivity of the second temperature measuring device at each temperature of the multiple temperatures. 20. The method of claim 19 , further comprising establishing the regression model using the multiple temperatures and the corresponding sheet resistivity.

Assignees

Inventors

Classifications

  • Temperature monitoring · CPC title

  • mainly by conduction · CPC title

  • combined with sampling devices for measuring temperatures of samples of materials · CPC title

  • for remote indication · CPC title

  • G01K7/183Primary

    characterised by the use of the resistive element · CPC title

Patent family

Related publications grouped by family.

External sources

Frequently asked questions

Answers are generated from the same data shown on this page.

What does patent US11262250B2 cover?
Implementations described herein generally relate to semiconductor manufacturing, and more specifically to a temperature measurement device. In one implementation, the temperature measurement device includes a substrate and a stack of metal layers coupled to the substrate. Each metal layer of the stack of metal layers extends continuously uninterrupted from edge to edge of the substrate. The fi…
Who is the assignee on this patent?
Applied Materials Inc
What technology area does this patent fall under?
Primary CPC classification H10P72/0602. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Mar 01 2022 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 2 related publications on this page (citations in our corpus or others sharing the same primary CPC).