Strain gauge with increased resistor protection

US11262181B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11262181-B2
Application numberUS-201917042412-A
CountryUS
Kind codeB2
Filing dateApr 1, 2019
Priority dateApr 3, 2018
Publication dateMar 1, 2022
Grant dateMar 1, 2022

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A strain gauge includes a flexible resin substrate, and a functional layer formed of a metal, an alloy, or a metal compound, on one surface of the substrate. The strain gauge includes a resistor formed as a film containing Cr, CrN, and Cr2N, on one surface of the functional layer. The strain gauge includes an insulating layer formed of an inorganic material, the resistor being coated with the insulating layer. The strain gauge includes an insulating resin layer formed of an organic material, the insulating layer being coated with the insulating resin layer.

First claim

Opening claim text (preview).

The invention claimed is: 1. A strain gauge comprising: a flexible resin substrate; a functional layer formed of a metal, an alloy, or a metal compound, on one surface of the substrate; a resistor formed as a film containing Cr, CrN, and Cr 2 N, on one surface of the functional layer; an insulating layer formed of an inorganic material, the resistor being coated with the insulating layer; and an insulating resin layer formed of an organic material, the insulating layer being coated with the insulating resin layer. 2. The strain gauge according to claim 1 , further comprising electrodes electrically connected to the resistor, wherein each electrode includes: a terminal section extending from a given end portion of the resistor; and a metallic layer formed on the terminal section, wherein the insulating layer is an oxide film of a metal that constitutes the metallic layer. 3. The strain gauge according to claim 1 , wherein a main component of the resistor is alpha-chromium. 4. The strain gauge according to claim 3 , wherein the resistor includes alpha-chromium at 80% by weight or more. 5. The strain gauge according to claim 1 , wherein the functional layer includes a function of promoting crystal growth of the resistor.

Assignees

Inventors

Classifications

  • using resistance strain gauges · CPC title

  • G01B7/18Primary

    using change in resistance · CPC title

  • G01B7/20Primary

    formed by printed-circuit technique · CPC title

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Frequently asked questions

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What does patent US11262181B2 cover?
A strain gauge includes a flexible resin substrate, and a functional layer formed of a metal, an alloy, or a metal compound, on one surface of the substrate. The strain gauge includes a resistor formed as a film containing Cr, CrN, and Cr2N, on one surface of the functional layer. The strain gauge includes an insulating layer formed of an inorganic material, the resistor being coated with the i…
Who is the assignee on this patent?
Minebea Mitsumi Inc
What technology area does this patent fall under?
Primary CPC classification G01B7/18. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Mar 01 2022 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).