In-situ DC plasma for cleaning pedestal heater

Patent metadata

Field	Value
Publication number	US-11260432-B2
Application number	US-202017024955-A
Country	US
Kind code	B2
Filing date	Sep 18, 2020
Priority date	Sep 19, 2019
Publication date	Mar 1, 2022
Grant date	Mar 1, 2022

Abstract

Substrate supports, substrate support assemblies and methods of using an arc generated between a first electrode and a second electrode to clean a support surface. The first electrode comprises a plurality of first branches which are interdigitated with a plurality of branches of the second electrode in a finger-joint like pattern creating a gap between the first electrode and the second electrode.

First claim

What is claimed is:

1. A method of cleaning a substrate support, the method comprising:
generating a direct current plasma between a first electrode having a plurality of first branches and second electrode having a plurality of second branches from a direct current power supply;
the first electrode having a middle hub with a first trunk extending in a first direction from the middle hub to a first outer peripheral end;
the second electrode with a second trunk extending in a second direction opposite the first direction from an inner end adjacent to and spaced from the middle hub to a second outer peripheral end;
the plurality of first branches crossing the first trunk, each of the first branches located a respective first trunk distance from the middle hub and spaced from adjacent first branches, each of the first branches having a first leg extending from a trunk end at the first trunk to a branch end in an arcuate path in a first direction around the middle hub with a respective first leg first radius equal to the respective first trunk distance and a second leg extending from a trunk end at the first trunk to a branch end in an arcuate path in a second direction opposite the first direction around the middle hub with a respective second leg first radius equal to the respective first trunk distance; and
the plurality of second branches crossing the second trunk, each of the second branches located a respective second trunk distance from the middle hub and spaced from adjacent second branches, each of the second branches having a first leg extending from a trunk end at the second trunk to a branch end in an arcuate path in a first direction around the middle hub with a respective first leg second radius equal to the respective second trunk distance and a second leg extending from a trunk end at the second trunk to a branch end in an arcuate path in a second direction around the middle hub with a respective second leg second radius equal to the respective second trunk distance, the plurality of second branches inter-digitated with and spaced from the plurality of first branches by a gap;
wherein the gap is configured for generating the direct current plasma between the first electrode and the second electrode, and cleaning a support surface of the support upon contact of the direct current plasma with the support surface.

2. A method of cleaning a substrate support comprising:
lifting a substrate on a plurality of lift pins through a plurality of lift pin openings by a height;
generating a direct current plasma between a first electrode having a plurality of first branches and second electrode having a plurality of second branches from a direct current power supply;
the first electrode having a middle hub with a first trunk extending in a first direction from the middle hub to a first outer peripheral end;
the second electrode with a second trunk extending in a second direction opposite the first direction from an inner end adjacent to and spaced from the middle hub to a second outer peripheral end;
the plurality of first branches crossing the first trunk, each of the first branches located a respective first trunk distance from the middle hub and spaced from adjacent first branches, each of the first branches having a first leg extending from a trunk end at the first trunk to a branch end in an arcuate path in a first direction around the middle hub with a respective first leg first radius equal to the respective first trunk distance and a second leg extending from a trunk end at the first trunk to a branch end in an arcuate path in a second direction opposite the first direction around the middle hub with a respective second leg first radius equal to the respective first trunk distance; and
the plurality of second branches crossing the second trunk, each of the second branches located a respective second trunk distance from the middle hub and spaced from adjacent second branches, each of the second branches having a first leg extending from a trunk end at the second trunk to a branch end in an arcuate path in a first direction around the middle hub with a respective first leg second radius equal to the second trunk distance and a second leg extending from a trunk end at the second trunk to a branch end in an arcuate path in a second direction around the middle hub with a respective second leg second radius equal to the respective second trunk distance, the plurality of second branches inter-digitated with and spaced from the plurality of first branches by a gap,
wherein the gap is configured for generating the direct current plasma between the first electrode and the second electrode, and cleaning a support surface of the support upon contact of the direct current plasma with the support surface, and
wherein the height of the bottom surface of the substrate to the substrate support surface is configured to clean a bottom surface of the substrate upon generating the plasma without damaging the substrate.

3. The method of claim 2 , further comprising lowering the substrate onto the support surface.

Assignees

• Applied Materials Inc

Inventors

• Ulavi Tejas
• Dan Arkaprava
• Baluja Sanjeev
• Tang Wei V

Classifications

• H10P72/7626

  characterised by the construction of the shaft · CPC title

• H10P72/7618

  characterised by a movable susceptor, stage or support, others than those only rotating on their own vertical axis, e.g. susceptors on a rotating carrousel · CPC title

• H10P72/7621

  characterised by supporting two or more semiconductor substrates · CPC title

• H10P72/722

  Details of electrostatic chucks · CPC title

• H10P72/0452

  characterised by the layout of the process chambers · CPC title