Charged particle beam apparatus

Patent metadata

Field	Value
Publication number	US-11257658-B2
Application number	US-201916572873-A
Country	US
Kind code	B2
Filing date	Sep 17, 2019
Priority date	Sep 27, 2018
Publication date	Feb 22, 2022
Grant date	Feb 22, 2022

Abstract

An object of the invention is to correct an aberration or a defocus of an electron beam for irradiation, and control an influence on a deflector by a fluctuation in an electric field of an electrostatic lens. The invention provides a charged particle beam apparatus including a deflector that deflects a charged particle beam with which a specimen is irradiated, an objective lens that focuses the charged particle beam on the specimen, an electrostatic lens that includes a part of the objective lens and to which a voltage for correcting the aberration or the defocus of the charged particle beam is applied, and an constant electric field applying electrode that is provided between the deflector and the electrostatic lens and to which a constant voltage having a same sign with the voltage applied to the electrostatic lens is applied.

First claim

What is claimed is:

1. A charged particle beam apparatus comprising:
a deflector that deflects a charged particle beam with which a specimen is irradiated;
an objective lens that focuses the charged particle beam on the specimen;
an electrostatic lens that includes a part of the objective lens and to which a voltage for correcting an aberration or a defocus of the charged particle beam is applied; and
an constant electric field applying electrode that is provided between the deflector and the electrostatic lens and to which a constant voltage having a same sign with the voltage applied to the electrostatic lens is applied.

2. The charged particle beam apparatus according to claim 1 , wherein
the constant electric field applying electrode is arranged along a shape of the electrostatic lens.

3. The charged particle beam apparatus according to claim 1 , wherein
the constant electric field applying electrode is divided in an irradiation direction of the charged particle beam, and a voltage is independently applied to each divided electrode.

4. The charged particle beam apparatus according to claim 3 , wherein
each divided electrode has a same inner diameter, and a high voltage is applied as approaching the specimen.

5. The charged particle beam apparatus according to claim 1 , wherein
the constant electric field applying electrode is divided in a circumferential direction which takes an irradiation direction of the charged particle beam as an axis, and a voltage is independently applied to each divided electrode.

6. The charged particle beam apparatus according to claim 1 further comprising:
a distance changing unit that changes a distance between the specimen and the objective lens; and
a specimen side electrode provided between the specimen and the objective lens.

7. The charged particle beam apparatus according to claim 6 , wherein
a voltage applied to the specimen side electrode is adjusted according to the distance.

Assignees

• Hitachi High Tech Corp

Inventors

• Takahashi Noritsugu
• Sakakibara Makoto
• Suzuki Makoto
• Yamazaki Minoru

Classifications

• H01J37/153

  Electron-optical or ion-optical arrangements for the correction of image defects, e.g. stigmators · CPC title

• H01J2237/31749

  Focused ion beam · CPC title

• H01J37/12

  electrostatic · CPC title

• H01J37/28 Primary

  with scanning beams {(H01J37/268, H01J37/292, H01J37/2955 take precedence)} · CPC title

• H01J2237/21

  Focus adjustment · CPC title