Resist underlayer composition, and method of forming patterns using the composition

Patent metadata

Field	Value
Publication number	US-11249396-B2
Application number	US-202016789233-A
Country	US
Kind code	B2
Filing date	Feb 12, 2020
Priority date	Mar 6, 2019
Publication date	Feb 15, 2022
Grant date	Feb 15, 2022

Abstract

A resist underlayer composition includes a polymer including a structural unit represented by Chemical Formula 1; and a solvent and a method of forming patterns using the resist underlayer composition:

In Chemical Formula 1, at least one of A 1 and A 2 is a group represented by Chemical Formula A:

First claim

What is claimed is:

1. A resist underlayer composition, comprising:
a polymer including a structural unit represented by Chemical Formula 1; and
a solvent:

wherein, in Chemical Formula 1,
L 1 to L 5 are each independently a single bond, a substituted or unsubstituted C1 to C30 alkylene group, a substituted or unsubstituted C6 to C30 arylene group, a substituted or unsubstituted C1 to C30 heteroalkylene group, a substituted or unsubstituted C3 to C20 cycloalkylene group, a substituted or unsubstituted C2 to C20 heterocycloalkylene group, a substituted or unsubstituted C1 to C30 heteroalkenylene group, a substituted or unsubstituted C2 to C30 heteroarylene group, a substituted or unsubstituted C1 to C30 alkenylene group, a substituted or unsubstituted C1 to C30 alkynylene group, or a combination thereof,
L 6 and L 7 are each independently O, S, S(O), S(O 2 ), C(O), C(O)O, OC(O)O, a single bond, a substituted or unsubstituted C1 to C30 alkylene group, a substituted or unsubstituted C6 to C30 arylene group, a substituted or unsubstituted C1 to C30 heteroalkylene group, a substituted or unsubstituted C3 to C20 cycloalkylene group, a substituted or unsubstituted C2 to C20 heterocycloalkylene group, a substituted or unsubstituted C1 to C30 heteroalkenylene group, a substituted or unsubstituted C2 to C30 heteroarylene group, a substituted or unsubstituted C1 to C30 alkenylene group, a substituted or unsubstituted C1 to C30 alkynylene group, or a combination thereof,
R 1 and R 2 are each independently hydrogen, deuterium, a halogen, a hydroxy group, a cyano group, a nitro group, an amino group, an epoxy group, a vinyl group, a (meth)acrylate group, an oxetane group, a thiol group, a carboxyl group, a substituted or unsubstituted C1 to C30 alkyl group, a substituted or unsubstituted C2 to C30 alkenyl group, a substituted or unsubstituted C2 to C30 alkynyl group, a substituted or unsubstituted C1 to C10 alkoxy group, a substituted or unsubstituted C1 to C30 thioalkyl group, a substituted or unsubstituted C3 to C30 cycloalkyl group, a substituted or unsubstituted C2 to C20 heterocycloalkyl group, a substituted or unsubstituted C6 to C30 aryl group, a substituted or unsubstituted C6 to C30 aryloxy group, a substituted or unsubstituted C6 to C30 thioaryl group, a substituted or unsubstituted C2 to C30 heteroaryl group, or a combination thereof,
n is an integer of 1 to 1,000,
D is O, S, S(O 2 ), C(O), or C(O)O,
m is an integer of 0 or 1,
* is a linking point,
A 1 and A 2 are each independently O, S, S(O), S(O 2 ), C(O), C(O)O, OC(O)O, a substituted or unsubstituted C3 to C10 cycloalkylene group, a substituted or unsubstituted C2 to C10 heterocycloalkylene group, a substituted or unsubstituted C6 to C30 arylene group, a substituted or unsubstituted C2 to C30 heteroarylene group, or a combination thereof, and
at least one of A 1 and A 2 is a group represented by Chemical Formula A:

wherein, in Chemical Formula A,
L a is a single bond, a substituted or unsubstituted C1 to C30 alkylene group, a substituted or unsubstituted C6 to C30 arylene group, a substituted or unsubstituted C1 to C30 heteroalkylene group, a substituted or unsubstituted C3 to C20 cycloalkylene group, a substituted or unsubstituted C2 to C20 heterocycloalkylene group, a substituted or unsubstituted C1 to C30 heteroalkenylene group, a substituted or unsubstituted C2 to C30 heteroarylene group, a substituted or unsubstituted C1 to C30 alkenylene group, a substituted or unsubstituted C1 to C30 alkynylene group, or a combination thereof, and
* is a linking point.

2. The resist underlayer composition of claim 1 , wherein A 1 and A 2 are each independently a substituted or unsubstituted C3 to C10 cycloalkylene group, a substituted or unsubstituted C2 to C10 heterocycloalkylene group, a substituted or unsubstituted C6 to C30 arylene group, a substituted or unsubstituted C2 to C30 heteroarylene group, or combination thereof.

3. The resist underlayer composition of claim 2 , wherein A 1 and A 2 are each independently one selected from the moieties of Group I:

wherein, in Group I,
X 1 to X 15 and X 17 to X 24 are each independently N or CR b ,
X 16 is NR a or CR c R d ,
Z 1 to Z 6 are each independently O, S, C(O), or CR c R d ,
R a , R b , R c , R d , R e , R f , R g , and R h are each independently hydrogen, deuterium, a hydroxy group, a thiol group, a halogen, a substituted or unsubstituted vinyl group, a substituted or unsubstituted C1 to C30 alkyl group, a substituted or unsubstituted C6 to C30 aryl group, a substituted or unsubstituted C1 to C10 alkoxy group, or a combination thereof,
L b is a single bond, a substituted or unsubstituted C1 to C30 alkylene group, a substituted or unsubstituted C6 to C30 arylene group, a substituted or unsubstituted C1 to C30 heteroalkylene group, a substituted or unsubstituted C3 to C20 cycloalkylene group, a substituted or unsubstituted C2 to C20 heterocycloalkylene group, a substituted or unsubstituted C1 to C30 heteroalkenylene group, a substituted or unsubstituted C2 to C30 heteroarylene group, a substituted or unsubstituted C1 to C30 alkenylene group, a substituted or unsubstituted C1 to C30 alkynylene group, or a combination thereof, and
* is a linking point.

4. The resist underlayer composition of claim 3 , wherein A 1 and A 2 are each independently one selected from the moieties of Group I-1:

wherein, in Group I-1, * is a linking point.

5. The resist underlayer composition of claim 1 , wherein the polymer comprises at least one of the structural units represented by Chemical Formula 2 to Chemical Formula 5:

wherein, in Chemical Formula 2 to Chemical Formula 5,
R 1 and R 2 are each independently hydrogen, deuterium, a halogen, a hydroxy group, a cyano group, a nitro group, an amino group, an epoxy group, a vinyl group, a (meth)acrylate group, an oxetane group, a thiol group, a carboxyl group, a substituted or unsubstituted C1 to C30 alkyl group, a substituted or unsubstituted C2 to C30 alkenyl group, a substituted or unsubstituted C2 to C30 alkynyl group, a substituted or unsubstituted C1 to C10 alkoxy group, a substituted or unsubstituted C1 to C30 thioalkyl group, a substituted or unsubstituted C3 to C30 cycloalkyl group, a substituted or unsubstituted C2 to C20 heterocycloalkyl group, a substituted or unsubstituted C6 to C30 aryl group, a substituted or unsubstituted C6 to C30 aryloxy group, a substituted or unsubstituted C6 to C30 thioaryl group, a substituted or unsubstituted C2 to C30 heteroaryl group, or a combination thereof,
n is an integer of 1 to 1,000,
L 6 and L 7 are each independently O, S, S(O), S(O 2 ), C(O), C(O)O, OC(O)O, a single bond, a substituted or unsubstituted C1 to C30 alkylene group, a substituted or unsubstituted C6 to C30 arylene group, a substituted or unsubstituted C1 to C30 heteroalkylene group, a substituted or unsubstituted C3 to C20 cycloalkylene group, a substituted or unsubstituted C2 to C20 heterocycloalkylene group, a substituted or unsubstituted C1 to C30 heteroalkenylene group, a substituted or unsubstituted C2 to C30 heteroarylene group, a sub

Assignees

• Samsung Sdi Co Ltd

Inventors

• Park Hyeon
• Choi Yoojeong
• Kwon Soonhyung
• Bae Shinhyo
• Baek Jaeyeol

Classifications

• C08G73/0655

  from polycyanurates · CPC title

• C09D175/16 Primary

  having terminal carbon-to-carbon unsaturated bonds · CPC title

• G03F7/094

  Multilayer resist systems, e.g. planarising layers · CPC title

• G03F7/168

  Finishing the coated layer, e.g. drying, baking, soaking · CPC title

• C08G18/791

  containing isocyanurate groups · CPC title