Spin valve and spintronic device comprising the same

US11249150B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11249150-B2
Application numberUS-202016783041-A
CountryUS
Kind codeB2
Filing dateFeb 5, 2020
Priority dateNov 14, 2019
Publication dateFeb 15, 2022
Grant dateFeb 15, 2022

How to read this patent

A practical reading order for non-experts. Skip the full description unless you need deep technical detail.

  1. Title

    What the patent document calls the invention.

  2. Abstract

    A short plain-language summary of the technical disclosure.

  3. Assignees and inventors

    Who owns or filed the patent and who is credited as inventor.

  4. Key dates

    Filing, priority, publication, and grant dates set the timeline.

  5. First independent claim

    The legal scope of protection — read this for what is actually claimed.

  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

    Prior art links and similar publications in this corpus.

Abstract

Official abstract text for this publication.

Exemplary embodiments of the present disclosure provide a spin valve and a spintronic device comprising the same. The spin valves may comprise two or more magnetic layers stacked in sequence, wherein any two adjacent magnetic layers among the two or more magnetic layers have different coercive forces, and at least one of the any two adjacent magnetic layers is a van der Waals magnetic layer, wherein the van der Waals magnetic layer refers to a magnetic layer made of a van der Waals magnetic material.

First claim

Opening claim text (preview).

We claim: 1. A spin valve comprising two or more magnetic layers stacked in sequence, wherein any two adjacent magnetic layers among the two or more magnetic layers have different coercive forces, and at least one of the any two adjacent magnetic layers is a van der Waals magnetic layer, wherein the van der Waals magnetic layer refers to a magnetic layer made of a van der Waals magnetic material, wherein at least one van der Waals magnetic layer among the two or more magnetic layers has a different van der Waals magnetic material from another van der Waals magnetic layer among the two or more magnetic layers. 2. The spin valve according to claim 1 , wherein each van der Waals magnetic layer is made of the same van der Waals magnetic material. 3. The spin valve according to claim 1 , wherein the van der Waals magnetic layer is made of at least one of: a van der Waals magnetic metal, a van der Waals magnetic semimetal, a van der Waals magnetic semiconductor, a van der Waals magnetic superconductor, a van der Waals magnetic insulator, a van der Waals ferromagnetic material, a van der Waals antiferromagnetic material, a van der Waals in-plane magnetic anisotropic material, a van der Waals out-of-plane magnetic anisotropic material, an organic van der Waals magnetic material, and an inorganic van der Waals magnetic material. 4. The spin valve according to claim 1 , wherein a non-van der Waals magnetic layer among the two or more magnetic layers is made of at least one of: a magnetic metal, a magnetic semimetal, a magnetic semiconductor, a magnetic superconductor, a magnetic insulator, a ferromagnetic material, an antiferromagnetic material, an in-plane magnetic anisotropic material, an out-of-plane magnetic anisotropic material, an organic magnetic material, and an inorganic magnetic material. 5. The spin valve according to claim 1 , wherein at least one of the two or more magnetic layers has a fixed magnetization direction, and other magnetic layer(s) have an unfixed magnetization direction. 6. The spin valve according to claim 1 , further comprising a pinning layer disposed above and/or below the at least one magnetic layer, and configured to fix a magnetization direction of the at least one magnetic layer. 7. A spintronic device comprising the spin valve according to claim 1 . 8. The spintronic device according to claim 7 , wherein the spintronic device is a magnetic memory, a spin transistor, a spin diode, a spin logic device, a spin oscillator, a magnetic sensor, or a temperature sensor.

Assignees

Inventors

Classifications

  • Materials of the active region · CPC title

  • G01R33/093Primary

    using multilayer structures, e.g. giant magnetoresistance sensors (thin magnetic films H01F10/00) · CPC title

  • Nanomagnetism, e.g. magnetoimpedance, anisotropic magnetoresistance, giant magnetoresistance or tunneling magnetoresistance · CPC title

  • Electricity · mapped topic

  • H10N50/10Primary

    Magnetoresistive devices · CPC title

Patent family

Related publications grouped by family.

External sources

Frequently asked questions

Answers are generated from the same data shown on this page.

What does patent US11249150B2 cover?
Exemplary embodiments of the present disclosure provide a spin valve and a spintronic device comprising the same. The spin valves may comprise two or more magnetic layers stacked in sequence, wherein any two adjacent magnetic layers among the two or more magnetic layers have different coercive forces, and at least one of the any two adjacent magnetic layers is a van der Waals magnetic layer, wh…
Who is the assignee on this patent?
Inst Semiconductors Cas
What technology area does this patent fall under?
Primary CPC classification G01R33/093. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Feb 15 2022 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).