Support substrate for radioisotope production, target plate for radioisotope production, and production method for support substrate

Patent metadata

Field	Value
Publication number	US-11239003-B2
Application number	US-201716077377-A
Country	US
Kind code	B2
Filing date	Apr 20, 2017
Priority date	Apr 21, 2016
Publication date	Feb 1, 2022
Grant date	Feb 1, 2022

Abstract

Provided is a target plate for radioisotope production that has sufficient durability and sufficient heat resistance for use in radioisotope production and that is capable of reducing the extent of radioactivation. In a target plate for radioisotope production, a support substrate, which supports a target, includes a graphite film(s). The thermal conductivity in a surface direction of the graphite film(s) is 1200 W/(m·K) or greater, and the thickness of the graphite film(s) is 0.05 μm or greater and 100 μm or less.

First claim

The invention claimed is:

1. A support substrate for radioisotope production, the support substrate being configured to support a target for receiving charged particle beam irradiation, the support substrate consisting essentially of two or more graphite films, wherein:
the two or more graphite films are placed such that a surface thereof intersects a charged particle beam,
the two or more graphite films each have a thermal conductivity, in a surface direction, of 1200 W/(m·K) or greater,
the two or more graphite films each have a thickness of 0.05 μm or greater and less than 100 μm,
the support substrate includes a stack of the two or more graphite films; and the support substrate has a total thickness of 0.1 μm or greater and 1 mm or less.

2. The support substrate according to claim 1 , wherein, in the two or more graphite films, the thermal conductivity in the surface direction is equal to or greater than 50 times a thermal conductivity in a thickness direction.

3. The support substrate according to claim 1 , wherein, in the two or more graphite films, an electric conductivity in the surface direction is 12000 S/cm or greater.

4. The support substrate according to claim 1 , wherein, in the two or more graphite films, an electric conductivity in the surface direction is equal to or greater than 100 times an electric conductivity in a thickness direction.

5. The support substrate according to claim 1 , wherein the two or more graphite films each have a density of 1.40 g/cm 3 or greater and 2.26 g/cm 3 or less.

6. The support substrate according to claim 1 , comprising a metal plate made of a metal, the metal plate being disposed on the two or more graphite films.

7. The support substrate according to claim 6 , wherein the metal plate includes a cooling mechanism.

8. A target plate for radioisotope production, comprising:
a target for receiving charged particle beam irradiation; and
the support substrate recited in claim 1 , the support substrate supporting the target.

Assignees

• Kaneka Corp

Inventors

• Murakami Mutsuaki
• Tatami Atsushi
• Tachibana Masamitsu

Classifications

• H05H2277/116

  Isotope production · CPC title

• H05H6/00

  Targets for producing nuclear reactions (supports for targets or objects to be irradiated G21K5/08 {; preparation of tritium C01B4/00; targets, e.g. pellets for fusion reactions by laser or charged particles beam injection H05H1/22}) · CPC title

• G21G1/10

  by bombardment with electrically charged particles (irradiation devices G21K5/00) · CPC title

• C01B32/205 Primary

  Preparation · CPC title

• C01B32/21

  After-treatment · CPC title