Light-directed electrochemical patterning of copper structures

US11214885B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11214885-B2
Application numberUS-202016987978-A
CountryUS
Kind codeB2
Filing dateAug 7, 2020
Priority dateAug 29, 2016
Publication dateJan 4, 2022
Grant dateJan 4, 2022

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A method creating a patterned film with cuprous oxide and light comprising the steps of electrodepositing copper from a solution onto a substrate; illuminating selected areas of said deposited copper with light having photon energies above the band gap energy of 2.0 eV to create selected illuminated sections and non-illuminated sections; and stripping non-illuminated sections leaving said illuminated sections on the substrate. An additional step may include galvanically replacing the copper with one or more noble metals.

First claim

Opening claim text (preview).

What is claimed is: 1. A method of creating a pattern on a substrate using electrodeposition and light comprising the steps of: on selected areas of said substrate, depositing material by electrodeposition and by illumination to create a deposition rate of material that is greater than in the non-illuminated areas; and reversing the polarity while maintaining the illumination of said selected areas to cause said non-illuminated areas to have a higher rate of dissolution than said selected areas. 2. The method of claim 1 wherein said deposited material is copper. 3. The method of claim 1 wherein said illumination is changed by time to create three-dimensional patterns. 4. The method of claim 1 wherein said illumination is changed by intensity to create three-dimensional patterns. 5. The method of claim 1 wherein said illumination is changed by color of the illumination to create three-dimensional patterns. 6. The method of claim 1 wherein said illumination is changed by a combination of color of the illumination, time or intensity to create three-dimensional patterns.

Assignees

Inventors

Classifications

  • Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass · CPC title

  • Electrolytic deposition, i.e. electroplating; Electroless plating · CPC title

  • for photovoltaic cells · CPC title

  • Electrodes · CPC title

  • for solar cells · CPC title

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What does patent US11214885B2 cover?
A method creating a patterned film with cuprous oxide and light comprising the steps of electrodepositing copper from a solution onto a substrate; illuminating selected areas of said deposited copper with light having photon energies above the band gap energy of 2.0 eV to create selected illuminated sections and non-illuminated sections; and stripping non-illuminated sections leaving said illum…
Who is the assignee on this patent?
Univ Arkansas
What technology area does this patent fall under?
Primary CPC classification C25D9/08. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Jan 04 2022 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 2 related publications on this page (citations in our corpus or others sharing the same primary CPC).