Chemical vapor deposition system including ground strap bar

US11214870B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11214870-B2
Application numberUS-201815990051-A
CountryUS
Kind codeB2
Filing dateMay 25, 2018
Priority dateMay 29, 2017
Publication dateJan 4, 2022
Grant dateJan 4, 2022

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A chemical vapor deposition (CVD) system may include a chamber, a susceptor provided in the chamber to support a substrate, a gas distribution part provided over the susceptor, a first ground strap bar provided on a bottom inner surface of the chamber and electrically connected to the chamber, a second ground strap bar provided on a bottom surface of the susceptor and electrically connected to the susceptor, and a plurality of ground straps electrically connected to the first and second ground strap bars, each of the plurality of ground straps including two opposite portions that are fastened to the first and second ground strap bars, respectively.

First claim

Opening claim text (preview).

What is claimed is: 1. A chemical vapor deposition (CVD) system, comprising: a chamber; a susceptor provided in the chamber to support a substrate; a gas distribution part provided over the susceptor; a first ground strap bar provided on a bottom inner surface of the chamber and directly connected to the bottom inner surface of the chamber; a second ground strap bar provided on a bottom surface of the susceptor to face the first ground strap bar and electrically connected to the susceptor; and a plurality of ground straps electrically connected to the first ground strap bar and the second ground strap bar, each of the plurality of ground straps comprising two opposite portions that are fastened to the first ground strap bar and the second ground strap bar, respectively, the plurality of ground straps comprising three or more ground straps; wherein the first ground strap bar extends in a first direction along a length of the first ground strap bar, said length of the first ground strap bar having a first end and a second end, said length of the first ground strap bar corresponding to an edge of the susceptor, wherein the second ground strap bar extends in the first direction along a length of the second ground strap bar, said length of the second ground strap bar having a first end and a second end, said length of the second ground strap bar corresponding to the edge of the susceptor, and wherein the plurality of ground straps are fastened to the first ground strap bar along the length of the first ground strap bar in between the first end and second end of the first ground strap bar; and wherein the plurality of ground straps are fastened to the second ground strap bar along the length of the second ground strap bar in between the first end and the second end of the second ground strap bar. 2. The CVD system of claim 1 , further comprising a plurality of first ground blocks that are provided to cover first regions of the plurality of ground straps, respectively, and are fastened in common to the first ground strap bar. 3. The CVD system of claim 2 , wherein each of the first ground blocks is provided to define at least one first ground block hole, the first ground strap bar is provided to define a first strap hole overlapped with the first ground block hole, and each of the first ground blocks is fastened to the first ground strap bar by a first bolt inserted in the first ground block hole and the first strap hole. 4. The CVD system of claim 3 , wherein each of the first regions is provided to have an opening hole overlapped with the first strap hole. 5. The CV system of claim 2 , further comprising a plurality of second ground blocks that are provided to cover second regions of the plurality of ground straps, respectively, and are fastened in common to the second ground strap bar. 6. The CVD system of claim 5 , wherein each of the second ground blocks is provided to define at least one second ground block hole, the second ground strap bar is provided to define a second strap hole overlapped with the second ground block hole, and each of the second ground blocks is fastened to the second ground strap bar by a second bolt inserted in the second ground block hole and the second strap hole. 7. The CVD system of claim 1 , wherein each of the first ground strap bar and the second ground strap bar is provided in plural. 8. The CVD system of claim 7 , wherein the first ground strap bar comprises: a first sub-ground strap bar and a second sub-ground strap bar spaced apart from and opposite to each other in a first direction; and a third sub-ground strap bar and a fourth sub-ground strap bar spaced apart from and opposite to each other in a second direction crossing the first direction. 9. The CVD system of claim 8 , wherein the second ground strap bar comprises: a fifth sub-ground strap bar and a sixth sub-ground strap bar spaced apart from and opposite to each other in the first direction; and a seventh sub-ground strap bar and an eighth sub-ground strap bar spaced apart from and opposite to each other in the second direction. 10. The CVD system of claim 8 , wherein the first sub-ground strap bar and the third sub-ground strap bar are provided to form a single body, and the second sub-ground strap bar and the fourth sub-ground strap bar are provided to form a single body. 11. The CVD system of claim 1 , wherein the first ground strap bar is provided to define at least one first bolt hole, the bottom inner surface of the chamber is provided to define a first bolt-fastening region overlapped with the first bolt hole, and the first ground strap bar is fastened to the bottom inner surface by a first body bolt inserted in the first bolt hole and the first bolt-fastening region. 12. The CVD system of claim 1 , wherein the second ground strap bar is provided to define at least one second bolt hole, the bottom surface of the susceptor is provided to define a second bolt-fastening region overlapped with the second bolt hole, and the second ground strap bar is fastened to the bottom surface by a second body bolt inserted in the second bolt hole and the second bolt-fastening region. 13. The CVD system of claim 1 , wherein the two opposite portions of each of the plurality of ground straps comprise a first region of each of the plurality of ground straps and a second region of each of the plurality of ground straps, respectively.

Assignees

Inventors

Classifications

  • the material being a silicon nitride not containing oxygen, e.g. SixNy or SixByNz · CPC title

  • the material being a silicon oxide, e.g. SiO2 · CPC title

  • in the presence of a plasma [PECVD] · CPC title

  • Amorphous · CPC title

  • N-type · CPC title

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What does patent US11214870B2 cover?
A chemical vapor deposition (CVD) system may include a chamber, a susceptor provided in the chamber to support a substrate, a gas distribution part provided over the susceptor, a first ground strap bar provided on a bottom inner surface of the chamber and electrically connected to the chamber, a second ground strap bar provided on a bottom surface of the susceptor and electrically connected to …
Who is the assignee on this patent?
Samsung Display Co Ltd
What technology area does this patent fall under?
Primary CPC classification C23C16/4583. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Jan 04 2022 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 6 related publications on this page (citations in our corpus or others sharing the same primary CPC).