Selective deposition of metals, metal oxides, and dielectrics

Patent metadata

Field	Value
Publication number	US-11213853-B2
Application number	US-201916657307-A
Country	US
Kind code	B2
Filing date	Oct 18, 2019
Priority date	Feb 4, 2014
Publication date	Jan 4, 2022
Grant date	Jan 4, 2022

Abstract

Methods are provided for selectively depositing a material on a first surface of a substrate relative to a second, different surface of the substrate. The selectively deposited material can be, for example, a metal, metal oxide, or dielectric material.

First claim

We claim:

1. A method for selectively depositing a metal or metal oxide material on a first hydrophilic surface of a substrate relative to a second, different surface of the same substrate, the method comprising:
at least one deposition cycle comprising alternately contacting the substrate with a precursor comprising a metal and a reactant, and
wherein the second, different surface is treated to inhibit deposition of the metal or metal oxide material thereon prior to the at least one deposition cycle, and
wherein the metal or metal oxide material is selectively deposited on the first hydrophilic surface relative to the second, different surface with a selectivity of at least 50%.

2. The method of claim 1 , wherein the metal or metal oxide material is selectively deposited on the first hydrophilic surface relative to the second, different surface with a selectivity of at least 90%.

3. The method of claim 1 , wherein the deposition cycle is an atomic layer deposition process.

4. The method of claim 1 , wherein the second, different surface is a conductive surface.

5. The method of claim 4 , wherein the second, different surface is no longer conductive after it is treated.

6. The method of claim 1 , wherein the second, different surface comprises a noble metal.

7. The method of claim 1 , wherein the second, different surface comprises Cu, Ru, Al, Ni, or Co.

8. The method of claim 1 , wherein the second, different surface is treated by oxidation to provide a metal oxide surface.

9. The method of claim 1 , wherein the second, different surface comprises Si.

10. The method of claim 9 , wherein the second, different surface is treated to provide a SiH 3 terminated surface.

11. The method of claim 1 , wherein the second, different surface is treated by passivating the surface.

12. The method of claim 11 , wherein the second surface is passivated with alkyl-silyl groups.

13. The method of claim 1 , wherein the first hydrophilic surface comprises OH groups.

14. The method of claim 1 , wherein the first hydrophilic surface comprises SiO 2 , GeO 2 or a low-k surface.

15. The method of claim 1 , wherein the precursor comprises Ni, Fe or Co.

16. The method of claim 1 , wherein the metal or metal oxide is selected from Ni, Fe, Co, Ni oxide, Fe oxide and Co oxide.

17. The method of claim 1 , wherein a metal is selectively deposited on the first hydrophilic surface relative to the second, different surface.

18. The method of claim 17 , wherein the metal is subsequently oxidized to form a metal oxide.

19. The method of claim 1 , wherein the reactant comprises an oxygen source.

20. The method of claim 1 , wherein the reactant comprises hydrogen, forming gas or an alcohol.

Assignees

• Asm Ip Holding Bv

Inventors

• Haukka Suvi P
• Matero Raija H
• Tois Eva
• Niskanen Antti
• Tuominen Marko
• Huotari Hannu
• Pore Viljami J
• Raaijmakers Ivo

Classifications

• C23C18/1216

  Metal oxides (C23C18/1212 takes precedence) · CPC title

• C23C18/1245

  Inorganic substrates other than metallic · CPC title

• C23C16/02 Primary

  Pretreatment of the material to be coated (C23C16/04 takes precedence) · CPC title

• C23C16/045

  Coating cavities or hollow spaces, e.g. interior of tubes; Infiltration of porous substrates · CPC title

• C23C18/122

  Inorganic polymers, e.g. silanes, polysilazanes, polysiloxanes · CPC title