Method and composition for selectively modifying base material surface

Patent metadata

Field	Value
Publication number	US-11211246-B2
Application number	US-201916288385-A
Country	US
Kind code	B2
Filing date	Feb 28, 2019
Priority date	Sep 1, 2016
Publication date	Dec 28, 2021
Grant date	Dec 28, 2021

Abstract

A method for selectively modifying a base material surface, includes applying a composition on a surface of a base material to form a coating film. The coating film is heated. The base material includes a surface layer which includes a first region including silicon. The composition includes a first polymer and a solvent. The first polymer includes at an end of a main chain or a side chain thereof, a group including a first functional group capable of forming a bond with the silicon. The first region preferably contains a silicon oxide, a silicon nitride, or a silicon oxynitride. The base material preferably further includes a second region that is other than the first region and that contains a metal; and the method preferably further includes, after the heating, removing with a rinse agent a portion formed on the second region, of the coating film.

First claim

The invention claimed is:

1. A selective modifier composition, comprising:
a polymer comprising, at an end of a main chain or a side chain thereof, a group comprising a first functional group capable of forming a bond with silicon; and
a solvent,
wherein the first functional group is one of a silanol group, a methoxysilyl group, and a hydrosilyl group, and
the main chain of the polymer consists of at least one structural unit selected from the group consisting of
a structural unit derived from a substituted or unsubstituted styrene,
a structural unit derived from a (meth)acrylic acid or a (meth)acrylic acid ester, and
a structural unit containing a —Si—O— bond.

2. The selective modifier composition of claim 1 , wherein the polymer has a polystyrene equivalent number average molecular weight of 500 50,000.

3. The selective modifier composition of claim 1 , wherein the first functional group is a silanol group.

4. The selective modifier composition of claim 2 , wherein the first functional group is a silanol group.

5. The selective modifier composition of claim 1 , wherein the main chain of the polymer consists of a structural unit derived from a substituted or unsubstituted styrene.

6. The selective modifier composition of claim 4 , wherein the main chain of the polymer consists of a structural unit derived from a substituted or unsubstituted styrene.

7. The selective modifier composition of claim 1 , wherein the group comprising the first functional group is present at one end of the main chain of the polymer.

8. The selective modifier composition of claim 6 , wherein the group comprising the first functional group is present at one end of the main chain of the polymer.

9. The selective modifier composition of claim 4 , wherein the first functional group is a methoxysilyl group.

10. The selective modifier composition of claim 4 , wherein the first functional group is a methoxysilyl group.

11. A method for selectively modifying a base material surface, the method comprising:
applying the selective modifier composition of claim 1 on a surface of a base material such that a coating film is formed on the surface having a first region comprising silicon; and
heating the coating film.

12. The method according to claim 11 , wherein the first region comprises a silicon oxide, a silicon nitride, or a silicon oxynitride.

13. The method according to claim 11 , wherein:
the base material further comprises a second region that is other than the first region and that comprises a metal; and
the method further comprises, after the heating, removing with a rinse agent a portion of the coating film, the portion being formed on the second region.

14. The method according to claim 11 , wherein a polystyrene equivalent number average molecular weight of the polymer is no less than 500 and no greater than 50,000.

15. The method according to claim 11 , wherein
the first functional group is a silanol group or a methoxysilyl group.

16. The method according to claim 11 , wherein the main chain of the polymer consists of a structural unit derived from a substituted or unsubstituted styrene.

17. The method according to claim 11 , wherein the polymer comprises at one end of the main chain thereof, the group comprising the first functional group.

18. The method according to claim 13 , further comprising
bringing an alcohol, a dilute acid, a hydrogen peroxide solution, ozone or plasma into contact with the surface of the base material after the removing.

19. The method according to claim 13 , further comprising
depositing a pattern on the surface of the base material after the removing, with a CVD method or an ALD method.

20. The method according to claim 13 , further comprising
etching away the polymer from the surface of the base material after the removing of the portion of the coating film.

Assignees

• Jsr Corp

Inventors

• Komatsu Hiroyuki
• Oda Tomohiro
• Osaki Hitoshi
• Hori Masafumi
• Naruoka Takehiko

Classifications

• H10P95/00

  Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass · CPC title

• H10P50/287

  by chemical means · CPC title

• H10P14/6546

  to change the surface groups of the insulating materials · CPC title

• H10P14/6528

  In-situ cleaning after layer formation, e.g. removing process residues · CPC title

• H10P14/6342

  Liquid deposition, e.g. spin-coating, sol-gel techniques or spray coating · CPC title