Preparation of triiodosilanes

US11203604B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11203604-B2
Application numberUS-201916706347-A
CountryUS
Kind codeB2
Filing dateDec 6, 2019
Priority dateDec 10, 2018
Publication dateDec 21, 2021
Grant dateDec 21, 2021

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

Provided is a process for preparing certain silane precursor compounds, e.g., triiodosilane from trichlorosilane utilizing lithium iodide in powder form and catalyzed by tertiary amines. The process provides triiodosilane in high yields and high purity. Triiodosilane is a precursor compound useful in the atomic layer deposition of silicon onto various microelectronic device structures.

First claim

Opening claim text (preview).

We claim: 1. A process for preparing compounds of the formula (R 1 ) y Si(I) z , wherein each R 1 is independently chosen from hydrogen, C 1 -C 9 alkyl, vinyl, or a C 2 -C 4 alkynyl group, y is 0, 1, 2, or 3, and z is 1, 2, 3, or 4, and wherein y+z is equal to 4, which comprises contacting a compound of the formula (R 1 ) y Si(Cl) z with lithium iodide in the presence of a tertiary amine, tetraalkylammonium halide, or tetraalkylphosphonium halide wherein the lithium iodide is in the form of a powder having an average particle size of less than about 2 mm. 2. The process of claim 1 , wherein the particle size of the lithium iodide powder is less than about 1 mm. 3. The process of claim 1 , wherein the particle size of the lithium iodide powder is less than about 0.5 mm. 4. The process of claim 1 , wherein the particle size of the lithium iodide powder is less than about 0.1 mm. 5. The process of claim 1 , wherein the compound of the formula (R 1 ) y Si(I) z is triiodosilane. 6. The process of claim 1 , wherein the compound of the formula (R 1 ) y Si(I) z is chosen from CH 3 Si(I) 3 , CH 3 CH 2 Si(I) 3 , CH 3 CH 2 CH 2 Si(I) 3 , CH 3 CH 2 CH 2 CH 2 Si(I) 3 , (CH 3 ) 2 CHSi(I) 3 , CH 3 CH 2 (CH 3 )CHSi(I) 3 , (CH 3 ) 3 CSi(I) 3 , CH 3 CH 2 CH 2 CH 2 Si(I) 3 , (CH 3 ) 3 CCH 2 Si(I) 3 , CH 2 ═CHSi(I) 3 , CH≡CSi(I) 3 , CH≡CCH 2 Si(I) 3 , CH 3 C≡CSi(I) 3 , CH≡CCH 2 CH 2 Si(I) 3 , CH 3 CH≡CCH 2 Si(I) 3 , CH 2 CH 2 CH 2 C≡CSi(I) 3 , (CH 3 ) 2 Si(I) 2 , CH 3 CH 2 ) 2 Si(I) 2 , (CH 3 CH 2 CH 2 ) 2 Si(I) 2 , (CH 3 CH 2 CH 2 CH 2 ) 2 Si(I) 2 , ((CH 3 ) 2 CH) 2 Si(I) 2 , (CH 3 CH 2 (CH 3 )CH) 2 Si(I) 2 , ((CH 3 ) 3 C) 2 Si(I) 2 , (CH 3 CH 2 CH 2 CH 2 ) 2 Si(I) 2 , ((CH 3 ) 3 CCH 2 ) 2 Si(I) 2 , (CH 2 ═CH) 2 Si(I) 2 , (CH≡C) 2 Si(I) 2 , (CH≡CCH 2 ) 2 Si(I) 2 , (CH 3 C≡C) 2 Si(I) 2 , (CH≡CCH 2 CH 2 ) 2 Si(I) 2 , (CH 3 CH≡CCH 2 ) 2 Si(I) 2 , (CH 2 CH 2 CH 2 C≡C) 2 Si(I) 2 , (CH 3 ) 3 SiI, (CH 3 CH 2 ) 3 SiI, (CH 3 CH 2 CH 2 ) 3 SiI, (CH 3 CH 2 CH 2 CH 2 ) 3 SiI, ((CH 3 ) 2 CH) 3 SiI, (CH 3 CH 2 (CH 3 )CH) 3 SiI, ((CH 3 ) 3 C) 3 SiI, (CH 3 CH 2 CH 2 CH 2 ) 3 SiI, ((CH 3 ) 3 CCH 2 ) 3 SiI, (CH 2 ═CH) 3 SiI, (CH≡C) 3 SiI, (CH≡CCH 2 ) 3 SiI, (CH 3 C≡C) 3 Si, (CH≡CCH 2 CH 2 ) 3 SiI, (CH 3 CH≡CCH 2 ) 3 SiI, and (CH 2 CH 2 CH 2 C≡C) 3 SiI. 7. The process of claim 1 , wherein the tertiary amine is a mono-amine. 8. The process of claim 7 , wherein the tertiary amine is triethylamine. 9. The process of claim 1 , wherein the tertiary amine has the formula: wherein each R is independently hydrogen or a C 1 -C 9 alkyl group, m is an integer of from 1 to 4, and n is an integer of from 2 to 5. 10. The process of claim 9 , wherein the tertiary amine has the formula wherein each R is independently hydrogen or a C 1 -C 9 alkyl group. 11. The process of claim 9 , wherein the tertiary amine has the formula wherein each R is independently hydrogen or a C 1 -C 9 alkyl group. 12. The process of claim 9 , wherein each R is independently chosen from methyl and ethyl. 13. The process of claim 1 , wherein the tertiary amine is N,N,N′,N′-tetraethylene diamine. 14. The process of claim 1 , wherein the tertiary amine is N,N,N′,N″,N″-pentamethyldiethylenetriamine. 15. The process of claim 1 , wherein the tetraalkylammonium chloride is tetrabutylammonium chloride. 16. The process of claim 1 , wherein the tetraalkylphosphonium chloride is tetrabutylphosphonium chloride.

Assignees

Inventors

Classifications

  • C07F7/123Primary

    by reactions involving the formation of Si-halogen linkages · CPC title

  • comprising at least one atom selected from the elements N, O, halogen, S, Se or Te · CPC title

  • C07F7/0827Primary

    Syntheses with formation of a Si-C bond · CPC title

  • C07F7/083Primary

    Syntheses without formation of a Si-C bond · CPC title

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What does patent US11203604B2 cover?
Provided is a process for preparing certain silane precursor compounds, e.g., triiodosilane from trichlorosilane utilizing lithium iodide in powder form and catalyzed by tertiary amines. The process provides triiodosilane in high yields and high purity. Triiodosilane is a precursor compound useful in the atomic layer deposition of silicon onto various microelectronic device structures.
Who is the assignee on this patent?
Entegris Inc
What technology area does this patent fall under?
Primary CPC classification C07F7/123. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Dec 21 2021 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 7 related publications on this page (citations in our corpus or others sharing the same primary CPC).