Methods and systems for liquid particle prequalification
US-2018078975-A1 · Mar 22, 2018 · US
US11192153B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-11192153-B2 |
| Application number | US-201816049355-A |
| Country | US |
| Kind code | B2 |
| Filing date | Jul 30, 2018 |
| Priority date | Sep 19, 2016 |
| Publication date | Dec 7, 2021 |
| Grant date | Dec 7, 2021 |
A practical reading order for non-experts. Skip the full description unless you need deep technical detail.
What the patent document calls the invention.
A short plain-language summary of the technical disclosure.
Who owns or filed the patent and who is credited as inventor.
Filing, priority, publication, and grant dates set the timeline.
The legal scope of protection — read this for what is actually claimed.
Technology tags used to group this patent with similar filings.
Prior art links and similar publications in this corpus.
Official abstract text for this publication.
Systems for prequalifying components for a processing chamber are described. The systems may be used to clean particulates from chamber parts and concurrently quantify the cleanliness. The systems may be used to qualify replacement parts before sending to a customer site for installation. The systems have three adjacent compartments separated by impermeable barriers. All three compartments are filled with liquid while cleaning a chamber component. The center compartment contains a submerged component for cleaning and qualifying. Two compartments on either side of the center compartment are configured with submerged ultrasonic transducers to deliver ultrasonic energy to either side of the component being cleaned and prequalified. A liquid pump is connected to the cleaning tub to recirculate water from the cleaning bath and another liquid pump is configured to remove a small amount of the cleaning bath to sample particulates.
Opening claim text (preview).
The invention claimed is: 1. An ultrasonic cleaning and sampling system, comprising: a cleaning tub including a cleaning bath; a first ultrasonic tub; a second ultrasonic tub; a first impermeable barrier disposed between the first ultrasonic tub and the cleaning tub; a second impermeable barrier disposed between the second ultrasonic tub and the cleaning tub; a first ultrasonic transducer; a second ultrasonic transducer, wherein the first ultrasonic transducer is in a first ultrasonic bath and the second ultrasonic transducer is in a second ultrasonic bath; a water source configured to deliver water into the cleaning bath; a sampling pump fluidly coupled to the cleaning bath and configured to remove contaminated water from the cleaning bath; a dilution unit fluidly coupled to the sampling pump and configured to dilute the contaminated water; and a liquid particle counter fluidly coupled to the dilution unit and configured to measure a particle concentration of the contaminated water. 2. The ultrasonic cleaning and sampling system of claim 1 wherein the first ultrasonic transducer is configured to be driven at a first frequency which is greater than 20 kHz to produce cavitation in the cleaning tub. 3. The ultrasonic cleaning and sampling system of claim 1 wherein the first ultrasonic transducer and the second ultrasonic transducer are configured to be driven at a same frequency to concurrently produce cavitation in the cleaning tub. 4. The ultrasonic cleaning and sampling system of claim 1 wherein the first ultrasonic transducer is configured to be driven at a first megasonic frequency to produce cavitation in the cleaning tub. 5. The ultrasonic cleaning and sampling system of claim 1 wherein a sampling pumping speed of the sampling pump is between 0.001 milliliters/min and 10 milliliters/min. 6. The ultrasonic cleaning and sampling system of claim 1 wherein the first ultrasonic tub is configured such that the first ultrasonic transducer is submersible. 7. An ultrasonic cleaning and sampling system, comprising: a cleaning tub containing a cleaning bath; a first ultrasonic tub and a second ultrasonic tub, wherein the first ultrasonic tub is disposed on the opposite side of the cleaning tub from the second ultrasonic tub; a first impermeable barrier disposed between the first ultrasonic tub and the cleaning tub; a second impermeable barrier disposed between the second ultrasonic tub and the cleaning tub; a first ultrasonic transducer and a second ultrasonic transducer, wherein the first ultrasonic transducer is in a first ultrasonic bath disposed within the first ultrasonic tub and the second ultrasonic transducer is in a second ultrasonic bath disposed within the second ultrasonic tub; an ultrapure water source configured to deliver ultrapure water into the cleaning bath; a sampling pump fluidly coupled to the cleaning bath and configured to remove contaminated water from the cleaning bath; a dilution unit fluidly coupled to the sampling pump and configured to dilute the contaminated water; and a liquid particle counter fluidly coupled to the dilution unit. 8. The ultrasonic cleaning and sampling system of claim 7 wherein a sampling pumping speed of the sampling pump is between 0.001 milliliters/min and 10 milliliters/min. 9. The ultrasonic cleaning and sampling system of claim 7 wherein the dilution unit is configured to dilute the contaminated water by a factor of at least 500 by adding at least 500 times more ultrapure water from the ultrapure water source. 10. The ultrasonic cleaning and sampling system of claim 7 wherein each of the first impermeable barrier and the second impermeable barrier are sheets of polypropylene, plastic, glass or quartz. 11. The ultrasonic cleaning and sampling system of claim 7 wherein the liquid particle counter is configured to detect particle sizes down to and including 100 nm.
in liquids, e.g. trouble · CPC title
Investigating concentration of particle suspensions (by weighing G01N5/00; investigating sedimentation of particle suspensions G01N15/04; investigating individual particles G01N15/10) · CPC title
Cleaning by methods involving the use or presence of liquid or steam (B08B9/00 takes precedence) · CPC title
from semiconductor processing, e.g. waste water from polishing of wafers · CPC title
by sonic or ultrasonic vibrations · CPC title
Related publications grouped by family.
Answers are generated from the same data shown on this page.