Electrochemical reactor for electrochemically treating water, a water treatment apparatus and use of such said electrochemical reactor
US-2018297860-A1 · Oct 18, 2018 · US
from semiconductor processing, e.g. waste water from polishing of wafers
from semiconductor processing, e.g. waste water from polishing of wafers · Cooperative Patent Classification (CPC)
Chemical and metallurgical processes, compounds, and materials.
Related technology areas
Mapped technology topics for this CPC code.
| Metric | Value |
|---|---|
| CPC code | C02F2103/346 |
| Official title | {from semiconductor processing, e.g. waste water from polishing of wafers} |
| Display label | from semiconductor processing, e.g. waste water from polishing of wafers |
| Total patents | 265 |
Filing trend
Year-over-year patent counts classified under this CPC code.
Filing activity over the last five years is stable.
| Year | Patents |
|---|---|
| 2015 | 11 |
| 2016 | 11 |
| 2017 | 21 |
| 2018 | 21 |
| 2019 | 26 |
| 2020 | 19 |
| 2021 | 23 |
| 2022 | 25 |
| 2023 | 36 |
| 2024 | 34 |
| 2025 | 27 |
| 2026 | 11 |
Representative patents
Representative publications under this CPC code from precomputed stats, or recent filings when stats are unavailable.
Method and System for Providing Ultrapure Water With Flexible Lamp Configuration
US-2018273412-A1 · Sep 27, 2018 · US
Methods and systems for liquid particle prequalification
US-10081036-B2 · Sep 25, 2018 · US
Inorganic material for removing harmful substance from wastewater and method of preparing the same, and method for wastewater treatment
US-10052623-B2 · Aug 21, 2018 · US
Method for improving rejection rate of reverse osmosis membrane
US-10046280-B2 · Aug 14, 2018 · US
Water purification using porous carbon electrode
US-2018222781-A1 · Aug 9, 2018 · US
Swellable and insoluble nanofibers and use thereof in the treatment of essentially aqueous effluents
US-2018215882-A1 · Aug 2, 2018 · US
Method for treating ammoniacal nitrogen in wastewater
US-2018208491-A1 · Jul 26, 2018 · US
Aluminum-doped, iminodiacetic acid group-containing chelate resins
US-10017401-B2 · Jul 10, 2018 · US
Method for treating waste liquid from process of etching indium tin oxide
US-2018187327-A1 · Jul 5, 2018 · US
Processing liquid supply method, processing liquid supply apparatus and storage medium
US-9975073-B2 · May 22, 2018 · US
Substrate processing apparatus, process fluid treating apparatus, and ozone decomposition method
US-2018111860-A1 · Apr 26, 2018 · US
Porous polyamide hollow fiber membrane having very small pore diameter, and method for producing same
US-9950300-B2 · Apr 24, 2018 · US
Waste liquid treatment method and waste liquid treatment apparatus
US-2018079668-A1 · Mar 22, 2018 · US
Methods and systems for liquid particle prequalification
US-2018078975-A1 · Mar 22, 2018 · US
Functional Platform for Rapid Capture and Removal of Nanoparticles
US-2018022604-A1 · Jan 25, 2018 · US
Diaphragm valve with welded diaphragm seat carrier
US-9863542-B2 · Jan 9, 2018 · US
Waste liquid treatment device and waste liquid treatment method
US-2017341961-A1 · Nov 30, 2017 · US
Catalyst for hydrogen peroxide decomposition, process for producing the same, and method for decomposing hydrogen peroxide using the catalyst
US-2017341060-A1 · Nov 30, 2017 · US
Method of removing particulate silicon from an effluent water
US-9828263-B2 · Nov 28, 2017 · US
Frequently asked questions
Answers are generated from the same data shown on this page.
- What is CPC C02F2103/346?
- CPC C02F2103/346 is the Cooperative Patent Classification code for “from semiconductor processing, e.g. waste water from polishing of wafers.”
- How many patents are filed under CPC C02F2103/346 (from semiconductor processing, e.g. waste water from polishing of wafers)?
- Our database includes 265 publications tagged with this CPC code.
- Is patent activity under CPC C02F2103/346 growing?
- Publication counts under this code: 34 in 2024 vs 27 in 2025 (latest complete years).