Exposure apparatus and exposure method, and flat panel display manufacturing method

Patent metadata

Field	Value
Publication number	US-11187987-B2
Application number	US-202016861971-A
Country	US
Kind code	B2
Filing date	Apr 29, 2020
Priority date	Sep 30, 2015
Publication date	Nov 30, 2021
Grant date	Nov 30, 2021

Abstract

A control system, of a plurality of heads, acquires grating correction information related to at least two of scales in a first grating group and scales in a second grating group, based on position information of a movable body measured using at least four heads irradiating measurement beams on at least two of the scales and scales. The grating correction information is used to control movement of the movable body using at least three heads irradiating at least two of the scales and scales.

First claim

The invention claimed is:

1. An exposure apparatus comprising:
a first movable body that holds an object and is movable along a predetermined two-dimensional plane including a first direction and a second direction intersecting each other;
an optical system that irradiates the object with an illumination light to expose the object;
a support section that supports the optical system;
a second movable body that is movable together with the first movable body in the first direction;
a first measurement system that includes a first encoder system in which one of a scale and a head is provided at the first movable body and the other of the scale and the head is provided at the second movable body, the first measurement system obtaining position information of the first movable body, with respect to the second movable body, in at least the second direction based on an output of the head;
a second measurement system that obtains position information of the second movable body, with respect to the support section, in the first direction; and
a position control system that performs position control of the first movable body, with respect to the support section, within the two-dimensional plane based on (i) correction information for compensating for a measurement error of the first measurement system that occurs due to the scale or the head, and (ii) outputs of the first and the second measurement systems.

2. The exposure apparatus according to claim 1 , wherein
the correction information compensates for the measurement error of the first measurement system that occurs due to at least one of deformation, displacement, flatness and a formation error of at least one of the scale.

3. The exposure apparatus according to claim 1 , wherein
a plurality of the scales are provided at the first movable body, and
during movement in the first direction of the head, a measurement beam irradiated from the head moves off from a first scale of the plurality of scales and switches to a second scale of the plurality of scales.

4. The exposure apparatus according to claim 1 , wherein
in the second measurement system, one of a scale and a head is provided at the second movable body and the other of the scale and the head is provided at a predetermined fixed member.

5. The exposure apparatus according to claim 4 , wherein
the first encoder system of the first measurement system is capable of obtaining position information of the first movable body in the first and the second directions, and
the position control system performs position control of the first movable body in the first direction based on the position information of the second movable body in the first direction obtained by the second measurement system and relative position information of the first movable body with respect to the second movable body in the first direction obtained by the first measurement system.

6. The exposure apparatus according to claim 1 , wherein
the second movable body is moved in the first direction independently from the first movable body.

7. The exposure apparatus according to claim 1 , further comprising
a pattern forming device that, while moving a pattern holding body that holds a predetermined pattern in the second direction, forms the pattern on the object via the pattern holding body using an energy beam.

8. The exposure apparatus according to claim 7 , wherein
the object is a substrate used in a flat-panel display.

9. The exposure apparatus according to claim 8 , wherein
at least a length of a side or a diagonal line of the substrate is 500 mm or greater.

10. A manufacturing method of a flat-panel display, comprising:
exposing the object using the exposure apparatus according to claim 7 ; and
developing the object that has been exposed.

11. A device manufacturing method, comprising:
exposing the object using the exposure apparatus according to claim 7 ; and
developing the object that has been exposed.

Assignees

• Nikon Corp

Inventors

• Shirato Akinori
• Shibuya Takashi

Classifications

• G03F7/70775

  Position control, e.g. interferometers or encoders for determining the stage position · CPC title

• G03F7/70191 Primary

  Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like · CPC title

• G03F7/20 Primary

  Exposure; Apparatus therefor (photographic printing apparatus for making copies G03B27/00) · CPC title

• G02F1/1303 Primary

  Apparatus specially adapted to the manufacture of LCDs · CPC title

• G02B26/10

  Scanning systems · CPC title