Movable body apparatus, exposure apparatus, manufacturing method of flat panel display, device manufacturing method, and movable body drive method

Patent metadata

Field	Value
Publication number	US-10444642-B2
Application number	US-201816031346-A
Country	US
Kind code	B2
Filing date	Jul 10, 2018
Priority date	Mar 28, 2014
Publication date	Oct 15, 2019
Grant date	Oct 15, 2019

Abstract

A substrate stage apparatus provided with: a substrate holder that can be moved in a plane including an X-axis and a Y-axis; a head unit that can be moved synchronously with the substrate holder along the Y-axis; an encoder system for measuring substrate position, the system including a scale disposed on the substrate holder, and heads disposed on the head unit, and acquiring the X-axis direction and the Y-axis direction position information of the substrate holder on the basis of the output of the heads; an encoder system for measuring head-unit position, the system acquiring the Y-axis direction position information of the head unit; and a position control system that controls the position of the substrate holder within the XY plane on the basis of the output of the encoder system for measuring substrate position and the encoder system for measuring head-unit position.

First claim

The invention claimed is:

1. An exposure apparatus that performs scanning exposure of an object by relatively driving the object with respect to an optical system, the apparatus comprising:
a first movable body that holds the object and is movable in a first direction and a second direction intersecting each other;
a reference member serving as a reference for movement of the first movable body in the first direction and the second direction;
a second movable body disposed between the first movable body and the reference member, and movable in the second direction;
a first measurement system that acquires position information of the first movable body in the first direction with respect to the reference member, with a first head disposed at one of the first movable body and the second movable body and a first scale disposed at the other of the first movable body and the second movable body that can measure a movement range of the first movable body in the first direction at the time of the scanning exposure; and
a second measurement system that acquires position information of the first movable body in the second direction with respect to the reference member, with a second head disposed at one of the second movable body and the reference member and a second scale disposed at the other of the second movable body and the reference member that can measure a movement range of the first movable body in the second direction at the time of the scanning exposure.

2. The exposure apparatus according to claim 1 , further comprising:
a control system that controls a position of the first movable body with respect to the reference member, wherein
the first measurement system acquires the position information by the first head measuring the first scale having a measurement component in the second direction,
the second measurement system acquires the position information by the second head measuring the second scale having a measurement component in the first direction, and
the control system controls the position of the first movable body with respect to the reference member, on the basis of the position information acquired by the first measurement system and the second measurement system.

3. The exposure apparatus according to claim 1 , wherein
the object is a substrate used in a flat panel display.

4. The exposure apparatus according to claim 3 , wherein
the substrate has at least one of a side length and a diagonal length that is 500 mm and over.

5. A manufacturing method of a flat panel display, comprising:
exposing the object using the exposure apparatus according to claim 1 ; and
developing the object which has been exposed.

6. A device manufacturing method, comprising:
exposing the object using the exposure apparatus according to claim 1 ; and
developing the object which has been exposed.

7. An exposure method in which scanning exposure of an object is performed by relatively scanning the object with respect to an optical system, the method comprising:
acquiring position information of a first movable body, which holds the object and is movable in a first direction and a second direction intersecting each other, in the first direction with respect to a reference member, using a first measurement system having a first head disposed at one of a second movable body and the first movable body and a first scale disposed at the other of the second movable body and the first movable body that can measure a movement range of the first movable body in the first direction at the time of the scanning exposure, the second movable body being disposed between the first movable body and the reference member, and being movable in the second direction; and
acquiring position information of the first movable body in the second direction with respect to the reference member, using a second measurement system, having a second head disposed at one of the second movable body and the reference member and a second scale disposed at the other of the second movable body and the reference member, that can measure a movement range of the first movable body in the second direction at the time of scanning exposure.

8. The exposure method according to claim 7 , further comprising:
controlling a position of the first movable body with respect to the reference member, wherein
the first measurement system acquires the position information by the first head measuring the first scale having a measurement component in the second direction,
the second measurement system acquires the position information by the second head measuring the second scale having a measurement component in the first direction, and
the position of the first movable body with respect to the reference member is controlled, on the basis of position information acquired by the first measurement system and the second measurement system.

Assignees

• Nikon Corp

Inventors

• Shirato Akinori

Classifications

• G03F7/70725

  control · CPC title

• G03F9/7049

  Technique, e.g. interferometric · CPC title

• G03F7/70716

  Stages · CPC title

• G03F7/0005 Primary

  Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor · CPC title

• G03F7/70775 Primary

  Position control, e.g. interferometers or encoders for determining the stage position · CPC title