Method for infiltrating with precursor solution using moisture control

US11177482B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11177482-B2
Application numberUS-201816759822-A
CountryUS
Kind codeB2
Filing dateDec 6, 2018
Priority dateDec 7, 2017
Publication dateNov 16, 2021
Grant dateNov 16, 2021

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  1. Title

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  2. Abstract

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  5. First independent claim

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Abstract

Official abstract text for this publication.

Disclosed is a method for infiltrating a porous structure with a precursor solution by means of humidification. The infiltration method with a precursor solution using moisture control comprises the steps of: (S1) providing a substrate having porous structures deposited thereon; (S2) depositing, by electrospraying, a precursor solution on the substrate having porous structures deposited thereon; (S3) humidifying the porous structures having the precursor solution deposited thereon; and (S4) sintering the humidified porous structures.

First claim

Opening claim text (preview).

What is claimed is: 1. A method for infiltrating with a precursor solution using moisture control, comprising the steps of: (S1) providing a substrate having porous structures deposited thereon; (S2) depositing, by electrospraying, a precursor solution on the substrate having porous structures deposited thereon; (S3) humidifying the porous structures having the precursor solution deposited thereon; and (S5) sintering the humidified porous structures. 2. The method for infiltrating with a precursor solution using moisture control according to claim 1 , wherein in the depositing step (S2), the precursor solution is electrosprayed on the substrate having the porous structures deposited thereon under a relative humidity of 10%. 3. The method for infiltrating with a precursor solution using moisture control according to claim 1 , wherein in the humidifying step (S3), humidification of the porous structures having the precursor solution deposited thereon is performed under a relative humidity of 70%. 4. The method for infiltrating with a precursor solution using moisture control according to claim 1 , wherein in the humidifying step (S3), the degree of infiltration of the precursor solution into the porous structure is controlled according to the amount of humidification. 5. The method for infiltrating with a precursor solution using moisture control according to claim 1 , wherein the substrate having the porous structures deposited thereon is a ceramic substrate having the porous ceramic structures deposited thereon. 6. The method for infiltrating with a precursor solution using moisture control according to claim 1 , wherein the substrate having the porous structures deposited thereon comprises an anode layer, an electrolyte layer, and a cathode layer of a solid oxide fuel cell. 7. The method for infiltrating with a precursor solution using moisture control according to claim 6 , wherein the porous structure includes a cathode layer. 8. The method for infiltrating with a precursor solution using moisture control according to claim 6 , wherein the precursor solution to be electrosprayed is a solution comprising deionized water as a solvent and any one selected from the group consisting of lanthanum nitrate hexahydrate, strontium nitrate, cobalt nitrate hexahydrate, citric acid, and a combination thereof. 9. The method for infiltrating with a precursor solution using moisture control according to claim 6 , wherein the precursor solution to be electrosprayed is a cathode material comprising any one of selected from the group consisting of Lanthanum Strontium Cobaltite (LSC) sol, Lanthanum Strontium Cobalt Ferrite (LSCF) sol, Samarium Strontium Cobaltite Oxide (SSC) sol, and a combination thereof. 10. The method for infiltrating with a precursor solution using moisture control according to claim 6 , wherein the precursor solution to be electrosprayed is a solution having the same composition as the material of the cathode layer. 11. The method for infiltrating with a precursor solution using moisture control according to claim 6 , wherein the sintering step (S5) is performed at 950° C. 12. The method for infiltrating with a precursor solution using moisture control according to claim 1 , wherein the method further comprises (S4) heating the humidified porous structures, between the humidifying step (S3) and the sintering step (S5). 13. The method for infiltrating with a precursor solution using moisture control according to claim 12 , wherein the substrate having the porous structures deposited thereon comprises an anode layer, an electrolyte layer, and a cathode layer of a solid oxide fuel cell. 14. The method for infiltrating with a precursor solution using moisture control according to claim 13 , wherein the heating step (S4) is performed at 110° C. 15. The method for infiltrating with a precursor solution using moisture control according to claim 13 , wherein the porous structure includes a cathode layer. 16. The method for infiltrating with a precursor solution using moisture control according to claim 13 , wherein the precursor solution to be electrosprayed is a solution comprising deionized water as a solvent and any one selected from the group consisting of lanthanum nitrate hexahydrate, strontium nitrate, cobalt nitrate hexahydrate, citric acid, and a combination thereof. 17. The method for infiltrating with a precursor solution using moisture control according to claim 13 , wherein the precursor solution to be electrosprayed is a cathode material comprising any one of selected from the group consisting of Lanthanum Strontium Cobaltite (LSC) sol, Lanthanum Strontium Cobalt Ferrite (LSCF) sol, Samarium Strontium Cobaltite Oxide (SSC) sol, and a combination thereof. 18. The method for infiltrating with a precursor solution using moisture control according to claim 13 , wherein the precursor solution to be electrosprayed is a solution having the same composition as the material of the cathode layer. 19. The method for infiltrating with a precursor solution using moisture control according to claim 13 , wherein the sintering step (S5) is performed at 950° C.

Assignees

Inventors

Classifications

  • After-treatment · CPC title

  • Sintering or firing · CPC title

  • Impregnation · CPC title

  • H01M4/8842Primary

    Coating using a catalyst salt precursor in solution followed by evaporation and reduction of the precursor · CPC title

  • Positive electrodes · CPC title

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What does patent US11177482B2 cover?
Disclosed is a method for infiltrating a porous structure with a precursor solution by means of humidification. The infiltration method with a precursor solution using moisture control comprises the steps of: (S1) providing a substrate having porous structures deposited thereon; (S2) depositing, by electrospraying, a precursor solution on the substrate having porous structures deposited thereon…
Who is the assignee on this patent?
Global Frontier Ct Multiscale Energy Systems, Korea Inst Sci & Tech, Seoul Nat Univ R&Db Foundation, and 1 more
What technology area does this patent fall under?
Primary CPC classification H01M4/8842. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Nov 16 2021 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).