Spin hall write select for magneto-resistive random access memory

US11164615B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11164615-B2
Application numberUS-201815922333-A
CountryUS
Kind codeB2
Filing dateMar 15, 2018
Priority dateFeb 23, 2017
Publication dateNov 2, 2021
Grant dateNov 2, 2021

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A magneto-resistance random access memory (MRAM) cell includes a transistor, a wire and a magnetic tunnel junction (MTJ). The MTJ includes a fixed layer of fixed magnetic polarity electrically connected with the transistor, a free layer of variable magnetic polarity electrically connected with the wire and an insulator between the fixed and free layers. First current passed through the wire destabilizes the variable magnetic polarity of the free layer. Second current passed through the transistor in one of two directions during first current passage through the wire directs the variable magnetic polarity of the free layer toward a parallel or anti-parallel condition with respect to the fixed magnetic polarity of the fixed layer. A ceasing of the first current prior to a ceasing of the second current sets the variable magnetic polarity of the free layer in the parallel or anti-parallel condition.

First claim

Opening claim text (preview).

What is claimed is: 1. A magneto-resistance random access memory (MRAM) device, comprising: a wire; a plurality of magnetic tunnel junctions (MTJs); a substrate comprising an interior layer, a plurality of metallic landing pads and dielectric material portions disposed along the edge of the interior layer, surrounding sides of each metallic landing pad and comprising exterior facing surfaces, each metallic landing pad comprising: a first surface recessed from the exterior facing surfaces and facing and abutting dielectric material of the interior layer of the substrate; and a second surface opposite the first surface and coplanar with the exterior facing surfaces of the dielectric material portions; a plurality of transistors disposed entirely within the interior layer of the substrate, each transistor being coupled, at the edge of the interior layer, to the first surface of a corresponding one of the plurality of the metallic landing pads through the dielectric material of the interior layer of the substrate by a connection which is narrower than the metallic landing pad and which extends from the transistor to the metallic landing pad through the dielectric material of the interior layer; each of the plurality of the MTJs being respectively electrically connected between the wire and corresponding ones of the plurality of metallic landing pads and the plurality of transistors; and a controller disposed within the interior layer of the substrate and coupled to the wire and the plurality of transistors and to respective supplies of first and second currents, wherein: the controller is configured to sequentially pass and cease first and second currents through the wire and the plurality of transistors, respectively, to set variable magnetic polarities of respective free layers of the plurality of MTJs in parallel or anti-parallel conditions with respect to fixed magnetic polarities of respective fixed layers of the plurality of MTJs, and the transistors and the MTJs are arranged in a matrix with multiple rows and multiple columns and the wire is provided as a single wire with a serpentine configuration arranged throughout the matrix. 2. The MRAM device according to claim 1 , wherein the wire comprises metal or a metallic alloy. 3. The MRAM device according to claim 1 , wherein the wire comprises at least one of tungsten and tantalum. 4. The MRAM device according to claim 1 , wherein the first current exceeds the second current. 5. The MRAM device according to claim 1 , wherein the second current is initiated and ceased about 5-10 ns or less after the first current is initiated and ceased, respectively.

Assignees

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Classifications

  • Timing circuits or methods · CPC title

  • using Hall-effect devices · CPC title

  • Writing or programming circuits or methods · CPC title

  • details concerning the memory cell structure, e.g. the layers of the ferromagnetic memory cell · CPC title

  • Cell access · CPC title

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Frequently asked questions

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What does patent US11164615B2 cover?
A magneto-resistance random access memory (MRAM) cell includes a transistor, a wire and a magnetic tunnel junction (MTJ). The MTJ includes a fixed layer of fixed magnetic polarity electrically connected with the transistor, a free layer of variable magnetic polarity electrically connected with the wire and an insulator between the fixed and free layers. First current passed through the wire des…
Who is the assignee on this patent?
IBM
What technology area does this patent fall under?
Primary CPC classification G11C11/1675. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Nov 02 2021 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 2 related publications on this page (citations in our corpus or others sharing the same primary CPC).