Window in thin polishing pad

US11161218B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11161218-B2
Application numberUS-201916252513-A
CountryUS
Kind codeB2
Filing dateJan 18, 2019
Priority dateFeb 26, 2016
Publication dateNov 2, 2021
Grant dateNov 2, 2021

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A polishing pad includes a polishing layer stack that has a polishing surface, a bottom surface, and an aperture from the polishing surface to the bottom surface. The polishing layer stack includes a polishing layer that has the polishing surface. A fluid-impermeable layer spans the aperture and the polishing pad. A first adhesive layer of a first adhesive material is in contact with and secures the bottom surface of the polishing layer to the fluid-impermeable layer. The first adhesive layer spans the aperture and the polishing pad. The light-transmitting body is positioned in the aperture and has a lower surface in contact with, is secured to the first adhesive layer, and is spaced apart from a side-wall of the aperture by a gap. An adhesive sealant of a different second material is disposed in and laterally fills the gap.

First claim

Opening claim text (preview).

What is claimed is: 1. A polishing pad, comprising: a polishing layer stack having a polishing surface, a bottom surface, and an aperture from the polishing surface to the bottom surface, the polishing layer stack including a polishing layer having the polishing surface; a fluid-impermeable layer spanning the aperture and spanning the polishing pad; a first adhesive layer of a first adhesive material in contact with and securing the bottom surface of the polishing layer stack to the fluid-impermeable layer, the first adhesive layer spanning the aperture and the polishing pad; a light-transmitting body positioned in the aperture, the light-transmitting body having a lower surface in contact with and secured to the first adhesive layer and spaced apart from a side-wall of the aperture by a gap; and an adhesive sealant of a different second material disposed in and laterally filling the gap; wherein an air gap separates the adhesive sealant from the first adhesive layer. 2. The polishing pad of claim 1 , wherein the light-transmitting body is softer than the polishing layer. 3. The polishing pad of claim 2 , wherein the polishing layer has a hardness of about 58-65 Shore D and the light-transmitting body has a hardness of about 45-60 Shore D. 4. The polishing pad of claim 1 , wherein the adhesive sealant has about the same hardness as the light-transmitting body. 5. The polishing pad of claim 4 , wherein the light-transmitting body and the adhesive sealant have a hardness of about 45-60 Shore D. 6. The polishing pad of claim 1 , wherein the gap completely laterally surrounds the light-transmitting body. 7. The polishing pad of claim 1 , comprising a second adhesive layer positioned on a side of the fluid-impermeable layer opposite the first adhesive layer and in contact with the fluid-impermeable layer. 8. The polishing pad of claim 7 , comprising a second aperture through the second adhesive layer aligned with the light-transmitting body. 9. The polishing pad of claim 7 , further comprising a removable liner covering the second adhesive layer. 10. The polishing pad of claim 1 , wherein the first adhesive material comprises a pressure sensitive adhesive and the second material comprises a cured epoxy or polyurethane. 11. The polishing pad of claim 1 , wherein the polishing layer stack comprises the polishing layer and a backing layer, and wherein the polishing layer is a napped polyurethane and the backing layer is a different material than the polishing layer. 12. The polishing pad of claim 11 , wherein each of the backing layer and the fluid-impermeable layer are a polyester. 13. The polishing pad of claim 1 , wherein the polishing pad has a total thickness less than about 3 mm.

Assignees

Inventors

Classifications

  • B24B37/205Primary

    provided with a window for inspecting the surface of the work being lapped · CPC title

  • characterised by a multi-layered structure · CPC title

  • characterised by the composition or properties of the pad materials · CPC title

Patent family

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Frequently asked questions

Answers are generated from the same data shown on this page.

What does patent US11161218B2 cover?
A polishing pad includes a polishing layer stack that has a polishing surface, a bottom surface, and an aperture from the polishing surface to the bottom surface. The polishing layer stack includes a polishing layer that has the polishing surface. A fluid-impermeable layer spans the aperture and the polishing pad. A first adhesive layer of a first adhesive material is in contact with and secure…
Who is the assignee on this patent?
Applied Materials Inc
What technology area does this patent fall under?
Primary CPC classification B24B37/205. Mapped technology areas include Operations & Transport.
When was this patent published?
Publication date Tue Nov 02 2021 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 3 related publications on this page (citations in our corpus or others sharing the same primary CPC).