Bonding methods for light emitting diodes
US-2020357952-A1 · Nov 12, 2020 · US
US11158761B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-11158761-B2 |
| Application number | US-202016863589-A |
| Country | US |
| Kind code | B2 |
| Filing date | Apr 30, 2020 |
| Priority date | May 7, 2019 |
| Publication date | Oct 26, 2021 |
| Grant date | Oct 26, 2021 |
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Disclosed herein are techniques for bonding components of LEDs. According to certain embodiments, a micro-LED includes a first component having a semiconductor layer stack including an n-side semiconductor layer, an active light emitting layer, and a p-side semiconductor layer. The semiconductor layer stack includes a III-V semiconductor material. The micro-LED also includes a second component having a passive or an active matrix integrated circuit within a Si layer. A first dielectric material of the first component is bonded to a second dielectric material of the second component, first contacts of the first component are aligned with and bonded to second contacts of the second component, a surface recombination velocity (SRV) of the micro-LED is less than or equal to 3E4 cm/s, and an e-h diffusion of the micro-LED is less than or equal to 20 cm2/s.
Opening claim text (preview).
What is claimed is: 1. A micro-LED comprising: a first component comprising a semiconductor layer stack including an n-side semiconductor layer, an active light emitting layer, and a p-side semiconductor layer, wherein the semiconductor layer stack comprises a III-V semiconductor material; and a second component comprising a passive or an active matrix integrated circuit within a silicon layer, wherein: a first dielectric material of the first component is bonded to a second dielectric material of the second component, first contacts of the first component are aligned with and bonded to second contacts of the second component, a surface recombination velocity (SRV) of the micro-LED is less than or equal to 3E4 cm/s, and an electron-hole (e-h) diffusion of the micro-LED is less than or equal to 20 cm 2 /s. 2. The micro-LED of claim 1 , wherein: the micro-LED is configured to emit red light, the SRV of the micro-LED is between 1E4 cm/s and 2E4 cm/s, and the e-h diffusion of the micro-LED is less than 20 cm 2 /s. 3. The micro-LED of claim 1 , wherein: the micro-LED is configured to emit red light, a carrier lifetime of the micro-LED is greater than 700 ns, a non-radiative recombination time within the active light emitting layer is greater than 1 μs, and the e-h diffusion of the micro-LED is less than 1 cm 2 /s. 4. The micro-LED of claim 1 , wherein: the micro-LED is configured to emit blue or green light, and the SRV of the micro-LED is approximately 900 cm/s. 5. The micro-LED of claim 1 , wherein: the micro-LED is configured to emit blue or green light, a carrier lifetime of the micro-LED is greater than 700 ns, a non-radiative recombination time within the active light emitting layer is greater than 1 μs, the SRV of the micro-LED is less than 1000 cm/s, and the e-h diffusion of the micro-LED is less than or equal to 2 cm 2 /s. 6. The micro-LED of claim 1 , wherein the e-h diffusion of the micro-LED is less than 1 cm 2 /s. 7. A micro-LED comprising: a first component comprising a semiconductor layer stack including an n-side semiconductor layer, an active light emitting layer, and a p-side semiconductor layer, wherein the semiconductor layer stack comprises a III-V semiconductor material; and a second component comprising a passive or an active matrix integrated circuit within a silicon layer, wherein: a first dielectric material of the first component is bonded to a second dielectric material of the second component, first contacts of the first component are aligned with and bonded to second contacts of the second component, and a local electron-hole (e-h) potential barrier within the active light emitting layer confines lateral carriers via indium (In) fluctuations. 8. The micro-LED of claim 7 , wherein: the micro-LED is configured to emit red light, and the active light emitting layer comprises AlInGaP. 9. The micro-LED of claim 7 , wherein: the micro-LED is configured to emit green or blue light, and the active light emitting layer comprises InGaN. 10. The micro-LED of claim 7 , wherein: the micro-LED is configured to emit red light, and a density of states within the active light emitting layer is greater than 60 meV. 11. The micro-LED of claim 7 , wherein: the micro-LED is configured to emit green light, and a density of states within the active light emitting layer is between 40 meV and 60 meV. 12. The micro-LED of claim 7 , wherein: the micro-LED is configured to emit blue light, and a density of states within the active light emitting layer is between 20 meV and 35 meV. 13. A micro-LED comprising: a first component comprising a semiconductor layer stack including an n-side semiconductor layer, an active light emitting layer, and a p-side semiconductor layer, wherein the semiconductor layer stack comprises a III-V semiconductor material; and a second component comprising a passive or an active matrix integrated circuit within a silicon layer, wherein: a first dielectric material of the first component is bonded to a second dielectric material of the second component, first contacts of the first component are aligned with and bonded to second contacts of the second component, a pixel size of the micro-LED is less than 10 μm, a peak effective internal quantum efficiency (IQE eff ) of the micro-LED is greater than or equal to 10%, and a surface loss of the micro-LED is less than or equal to 10%. 14. The micro-LED of claim 13 , wherein: the micro-LED is configured to emit red light, and the peak IQE eff is greater than 20%. 15. The micro-LED of claim 13 , wherein: the micro-LED is configured to emit red light, and the peak IQE eff is greater than 40%. 16. The micro-LED of claim 13 , wherein: the micro-LED is configured to emit red light, and the peak IQE eff is greater than 80%. 17. The micro-LED of claim 13 , wherein: the micro-LED is configured to emit red light, the peak IQE eff is approximately 10% at a current density between 1 A/cm 2 and 30 A/cm 2 , and a total wall-plug efficiency (WPE) of the micro-LED is greater than 8% at the current density between 1 A/cm 2 and 30 A/cm 2 . 18. The micro-LED of claim 13 , wherein: the micro-LED is configured to emit blue light, the peak IQE eff is greater than 60%, a surface recombination velocity (SRV) of the micro-LED is approximately 900 cm/s, and the surface loss of the micro-LED is approximately 7%. 19. The micro-LED of claim 13 , wherein: the micro-LED is configured to emit blue light, the peak IQE eff is greater than 60% at a current density between 0.1 A/cm 2 and 20 A/cm 2 , and a total wall-plug efficiency (WPE) of the micro-LED is greater than 10% at the current density between 0.1 A/cm 2 and 20 A/cm 2 . 20. The micro-LED of claim 13 , wherein: the micro-LED is configured to emit green light, the peak IQE eff is greater than 45%, a surface recombination velocity (SRV) of the micro-LED is approximately 900 cm/s, and the surface loss of the micro-LED is approximately 10%. 21. The micro-LED of claim 13 , wherein: the micro-LED is configured to emit green light, the peak IQE eff is greater than 40% at a current density between 0.7 A/cm 2 and 10 A/cm 2 , and a total wall-plug efficiency (WPE) of the micro-LED is greater than 5% at the current density between 0.7 A/cm 2 and 10 A/cm 2 .
changes in materials · CPC title
Materials of bond wires · CPC title
using bonding · CPC title
Two-dimensional arrangements, e.g. asymmetric LED layout · CPC title
Wavelength conversion materials · CPC title
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