Method and system for plasma assisted low vacuum charged-particle microscopy

Patent metadata

Field	Value
Publication number	US-11152189-B2
Application number	US-202016823140-A
Country	US
Kind code	B2
Filing date	Mar 18, 2020
Priority date	Mar 18, 2020
Publication date	Oct 19, 2021
Grant date	Oct 19, 2021

Abstract

Various methods and systems are provided for imaging a sample under low vacuum with a charged particle beam. A magnetic field is provided in a detection area of the detector. Gas and plasma are provided in the detection area while detecting charged particles emitted from the sample. Sample image is formed based on the detected charged particles.

First claim

What is claimed is:

1. A method for imaging a sample, comprising:
providing a gas in a detection space;
providing a magnetic field in the detection space;
irradiating the sample with a charged particle beam while providing a plasma in the detection space;
detecting charged particles emitted from the sample into the detection space responsive to the irradiation; and
forming an image based on the detected charged particles.

2. The method of claim 1 , wherein the gas is a mixture of multiple gas species.

3. The method of claim 1 , wherein the plasma includes at least one gas molecule species with a molar weight less than 5.

4. The method of claim 1 , wherein the plasma includes hydrogen.

5. The method of claim 1 , wherein the plasma is provided by ionizing at least one species of the gas provided in the detection space.

6. The method of claim 1 , wherein the sample is immersed in the magnetic field.

7. The method of claim 1 , wherein the charged particles emitted from the sample are detected by a detector, and the detection space is defined by a position and a structure of the detector.

8. The method of claim 1 , wherein the sample is positioned within a sample chamber with a pressure less than 0.05 torr.

9. The method of claim 1 , wherein the charged particle beam is an electron beam, and the detected charged particles are secondary electrons.

10. The method of claim 1 , further comprising adjusting an amount of the gas and an amount of the plasma provided to the detection space based on the formed image.

11. A method for imaging a sample, comprising:
providing a magnetic field in a detection space;
scanning the sample with an electron beam while providing a gas and a plasma in the detection space;
detecting charged particles emitted from the sample; and
forming a sample image based on the detected charged particles.

12. The method of claim 11 , wherein the electron beam is directed to the sample through an optical column, and a pressure in the detection space is the same as a pressure in a part of the optical column.

13. The method of claim 11 , further comprising forming a second sample image by recording a specimen current.

14. A system for imaging a sample, comprising:
a sample chamber;
a sample stage positioned in the sample chamber for holding the sample;
a column coupled to the sample chamber for generating a charged particle beam towards the sample stage;
a gas source coupled to the sample chamber;
a detector for detecting charged particles in a detection space; and
a controller with instructions stored in a non-transitory memory, the controller is configured to:
provide a gas to the detection space with the gas source;
provide a magnetic field in the detection space;
irradiate the sample with the charged particle beam while providing a plasma in the detection space;
detect, via the detector, charged particles emitted from the sample into the detection space responsive to the irradiation; and
form an image based on the detected charged particles.

15. The system of claim 14 , further comprising a plasma generator coupled to the sample chamber, and wherein providing the plasma in the detection space includes ionizing at least one gas species of the provided gas with the plasma generator.

16. The system of claim 14 , wherein the detector is positioned between the column and the sample stage.

17. The system of claim 14 , wherein the magnetic field is provided by a magnetic lens positioned in the column for focusing the charged particle beam towards the sample stage.

18. The system of claim 14 , wherein no pressure limiting aperture is coupled between the column and the sample chamber.

19. The system of claim 18 , wherein the detection space extends from a sample surface irradiated by the charged particle beam into the column.

20. The system of claim 14 , wherein the detector provides an electric field in the detection space, and trajectories of the charged particles in the detection space is controlled by the magnetic field and the electric field.

Assignees

• Fei Co

Inventors

• Bishop James
• Totonjian Daniel
• Elbadawi Chris
• Lobo Charlene
• Toth Milos

Classifications

• H01J37/32449

  Gas control, e.g. control of the gas flow · CPC title

• H01J37/28

  with scanning beams {(H01J37/268, H01J37/292, H01J37/2955 take precedence)} · CPC title

• G01N2223/102

  beta or electrons · CPC title

• G01N2223/07

  secondary emission · CPC title

• G01N23/2251 Primary

  using incident electron beams, e.g. scanning electron microscopy [SEM] · CPC title