Electrostatic chuck

Patent metadata

Field	Value
Publication number	US-11145532-B2
Application number	US-201916722789-A
Country	US
Kind code	B2
Filing date	Dec 20, 2019
Priority date	Dec 21, 2018
Publication date	Oct 12, 2021
Grant date	Oct 12, 2021

Abstract

An electrostatic chuck includes a base plate and a ceramic dielectric substrate. The ceramic dielectric substrate has a first major surface. The first major surface includes at least a first region and a second region. At least one first gas introduction hole is connected to at least one of multiple first grooves. At least one second groove are provided in the first region. The multiple first grooves have substantially circular planar configurations and are provided concentrically. The second groove is connected to at least two of the first grooves. When projected onto a plane perpendicular to a first direction from the base plate toward the ceramic dielectric substrate, at least a portion of the first gas introduction hole overlaps at least one of the first groove or the second groove at a portion where the first groove and the second groove are connected.

First claim

What is claimed is:

1. An electrostatic chuck, comprising:
a base plate; and
a ceramic dielectric substrate having a substantially circular planar configuration, being provided on the base plate, and having a first major surface exposed externally,
the first major surface including at least a first region, and a second region adjacent to the first region,
the first region having a plurality of first grooves, at least one first gas introduction hole, and at least one second groove provided in the first region, the at least one first gas introduction hole being connected to at least one of the plurality of first grooves, the at least one second groove extending in a direction crossing the plurality of first grooves,
the plurality of first grooves having substantially circular planar configurations and being provided concentrically,
the second groove being connected to at least two of the first grooves,
wherein, when projected onto a plane perpendicular to a first direction, at least a portion of the first gas introduction hole overlaps both of the first groove and the second groove at a portion where the first groove and the second groove are connected, the first direction being from the base plate toward the ceramic dielectric substrate, the first region has a first boundary groove at an edge portion thereof proximate the second region, the second region has a second boundary groove at an edge portion thereof proximate the first region, and the first and second boundary grooves are spaced closer together than other, adjacent grooves of the plurality of first grooves.

2. The chuck according to claim 1 , wherein at least two of the second grooves are provided in the first region.

3. The chuck according to claim 1 , wherein
the second region further has a plurality of third grooves provided in the second region,
the second region further has at least one second gas introduction hole connected to at least one of the plurality of third grooves,
the second region further has at least one fourth groove connected to at least two of the third grooves, the at least one fourth groove extending in a direction crossing the plurality of third grooves,
the plurality of third grooves has substantially circular planar configurations and is provided concentrically with a center of the plurality of first grooves as a center, and
when projected onto the plane perpendicular to the first direction, at least a portion of the second gas introduction hole overlaps at least one of the third groove or the fourth groove at a portion where the third groove and the fourth groove are connected.

4. The chuck according to claim 3 , wherein at least two of the fourth grooves are provided in the second region.

5. The chuck according to claim 3 , wherein
the second region is provided outward of the first region with respect to a center of the first major surface, and
when projected onto the plane perpendicular to the first direction, at least a portion of the first gas introduction hole overlaps at least one of the second groove or an outermost first groove among the first grooves in the first region at a portion where the second groove and the outermost first groove are connected, and at least a portion of the second gas introduction hole overlaps at least one of the fourth groove or an innermost third groove among the third grooves in the second region at a portion where the fourth groove and the innermost third groove are connected.

6. The chuck according to claim 3 , wherein an angle between a first boundary and a line connecting a center of the first gas introduction hole and a center of the second gas introduction hole is less than 90°, the first boundary being between the first region and the second region.

7. The chuck according to claim 3 , wherein an angle between a first boundary and a line connecting a center of the first gas introduction hole and a center of the second gas introduction hole is 90°, the first boundary being between the first region and the second region.

8. The chuck according to claim 7 , wherein
the first region has a lift pin hole provided in the first region, and
a distance between the lift pin hole and the outermost first groove is greater than a distance between the lift pin hole and the first groove most proximal to the lift pin hole among the plurality of first grooves other than the outermost first groove.

9. The chuck according to claim 1 , wherein the ceramic dielectric substrate has a plurality of spaced-apart raised dots extending upwardly from the first major surface and configured to support a workpiece thereon at a level above the first major surface.

10. An electrostatic chuck, comprising:
a base plate; and
a ceramic dielectric substrate having a substantially circular planar configuration, being provided on the base plate, and having a first major surface exposed externally,
the first major surface including at least a first region, and a second region adjacent to the first region,
the first region having a plurality of first grooves, at least one first gas introduction hole, and at least one second groove provided in the first region, the at least one first gas introduction hole being connected to at least one of the plurality of first grooves, the at least one second groove extending in a direction crossing the plurality of first grooves,
the plurality of first grooves having substantially circular planar configurations and being provided concentrically,
the second groove being connected to at least two of the first grooves,
wherein:
at least a portion of the first gas introduction hole overlaps at least one of the first groove or the second groove at a portion where the first groove and the second groove are connected,
the first region has a first boundary groove at an edge portion thereof proximate the second region,
the second region has a second boundary groove at an edge portion thereof proximate the first region, and
the first and second boundary grooves are spaced closer together than other, adjacent grooves of the plurality of first grooves.

11. An electrostatic chuck, comprising:
a base plate; and
a ceramic dielectric substrate having a substantially circular planar configuration, being provided on the base plate, the ceramic dielectric substrate having a first major surface exposed externally, and having a plurality of spaced-apart raised dots extending upwardly from the first major surface and configured to support a workpiece thereon at a level above the first major surface,
the first major surface including at least a first region, and a second region adjacent to the first region,
the first region having a plurality of first grooves, at least one first gas introduction hole, and at least one second groove provided in the first region, the at least one first gas introduction hole being connected to at least one of the plurality of first grooves, the at least one second groove extending in a direction crossing the plurality of first grooves,
the plurality of first grooves having substantially circular planar configurations and being provided concentrically,
the second groove being connected to at least two of the first grooves,
wherein at least a portion of the first gas introduction hole overlaps at least one of the first groove or the second groove at a portion where the first groove and the second groove are connected, the first region has a first boundary groove at an edge portion thereof proximate the second region, the second region has a second boundary groove at an edge portion thereof proximate the first region, and the first and second boundary grooves are spaced closer together than other, adjacent grooves of the plurality of

Assignees

• Toto Ltd

Inventors

• Ikeguchi Masafumi
• Itoyama Tetsuro
• Saigan Shuichiro
• Shiraishi Jun

Classifications

• H10P72/0402

  Apparatus for fluid treatment (H10P72/0441, H10P72/0448 take precedence) · CPC title

• H10P72/7612

  characterised by lifting arrangements, e.g. lift pins · CPC title

• H10P72/722 Primary

  Details of electrostatic chucks · CPC title

• H10P72/7624

  characterised by the mechanical construction of the susceptor, stage or support · CPC title

• H10P72/7614

  characterised by a plurality of individual support members, e.g. support posts or protrusions · CPC title