Multiple electron beams irradiation apparatus

Patent metadata

Field	Value
Publication number	US-11145485-B2
Application number	US-201916726003-A
Country	US
Kind code	B2
Filing date	Dec 23, 2019
Priority date	Dec 26, 2018
Publication date	Oct 12, 2021
Grant date	Oct 12, 2021

Abstract

A multiple electron beam irradiation apparatus includes a shaping aperture array substrate to form multiple primary electron beams, a plurality of electrode array substrates stacked each to dispose thereon a plurality of electrodes each arranged at a passage position of each of the multiple primary electron beams, each of the multiple primary electron beams surrounded by an electrode of the plurality of electrodes when each of the multiple primary electron beams passes through the passage position, the first wiring and the second wiring applied with one of different electric potentials, and a stage to mount thereon a target object to be irradiated with the multiple primary electron beams having passed through the plurality of electrode array substrates, wherein, in each of the plurality of electrode array substrates, each of the plurality of electrodes is electrically connected to either one of the first wiring and the second wiring.

First claim

What is claimed is:

1. A multiple electron beam irradiation apparatus comprising:
a forming mechanism that forms multiple primary electron beams;
a plurality of electrode array substrates each that disposes thereon a plurality of electrodes each being arranged at a passage position of each of the multiple primary electron beams, the plurality of electrode array substrates being stacked, the each of the multiple primary electron beams being surrounded by an electrode of the plurality of electrodes in a case where the each of the multiple primary electron beams passes through the passage position;
a first wiring and a second wiring that are applied with one of different electric potentials; and
a stage that mounts thereon a target object to be irradiated with the multiple primary electron beams having passed through the plurality of electrode array substrates,
wherein, in each of the plurality of electrode array substrates, each of the plurality of electrodes is electrically connected to either one of the first wiring and the second wiring, and at least one of the plurality of electrode array substrates has both of an electrode electrically connected to the first wiring and an electrode electrically connected to the second wiring.

2. The apparatus according to claim 1 , wherein, in the each of the electrode array substrates, the each of the plurality of electrodes is connected to either one of the first wiring and the second wiring such that the plurality of electrodes is rotational symmetry with respect to a trajectory central axis of a whole of the multiple primary electron beams.

3. The apparatus according to claim 1 , wherein, in the each of the electrode array substrates, the each of the plurality of electrodes is connected to either selected one of the first wiring and the second wiring by selecting one of the first wiring and the second wiring in which a beam focusing action becomes smaller in proportion to being further away from a trajectory central axis of a whole of the multiple primary electron beams.

4. The apparatus according to claim 1 , wherein the each of the plurality of electrode array substrates is disposed at a position different from a position conjugate to an image plane position of the each of the multiple primary electron beams.

5. The apparatus according to claim 1 further comprising:
an objective lens that focuses the multiple primary electron beams having passed through the plurality of electrode array substrates onto a surface of the target object.

6. The apparatus according to claim 1 further comprising:
a beam separator that separates multiple secondary electron beams emitted because the target object is irradiated with the multiple primary electron beams from the multiple primary electron beams; and
a multi-detector that individually detects the multiple secondary electron beams having been separated.

7. The apparatus according to claim 1 , wherein the first wiring and the second wiring are disposed such that they penetrate through the plurality of electrode array substrates.

Assignees

• Nuflare Technology Inc
• Nuflare Tech America Inc

Inventors

• Inoue Kazuhiko
• Ando Atsushi
• Ogasawara Munehiro
• Hartley John

Classifications

• H01J37/153 Primary

  Electron-optical or ion-optical arrangements for the correction of image defects, e.g. stigmators · CPC title

• H01J2237/1534

  Aberrations · CPC title

• H01J2237/04924

  electrostatic · CPC title

• H01J37/3177

  Multi-beam, e.g. fly's eye, comb probe · CPC title

• H01J37/28

  with scanning beams {(H01J37/268, H01J37/292, H01J37/2955 take precedence)} · CPC title