Control based on probability density function of parameter

Patent metadata

Field	Value
Publication number	US-11143971-B2
Application number	US-201916966596-A
Country	US
Kind code	B2
Filing date	Jan 14, 2019
Priority date	Feb 22, 2018
Publication date	Oct 12, 2021
Grant date	Oct 12, 2021

Abstract

A method for determining adjustment to a patterning process. The method includes obtaining a probability density function of a parameter related to a feature of a substrate subject to the patterning process based on measurements of the parameter, determining an asymmetry of the probability density function, and determining an adjustment to the patterning process based on the asymmetry of the probability density function of the parameter so as to reduce a probability of the feature having a parameter value that falls outside a range between threshold values of the parameter.

First claim

What is claimed is:

1. A method for determining an adjustment to a patterning process, the method comprising:
obtaining a probability density function of a parameter related to a feature of a substrate subject to the patterning process based on measurements of the parameter;
determining, by a hardware computer system, an asymmetry of the probability density function; and
determining, by the hardware computer system, an adjustment to the patterning process based on the asymmetry of the probability density function of the parameter so as to reduce a probability of the feature having a parameter value that falls outside a range between threshold values of the parameter.

2. The method according to claim 1 , wherein the asymmetry is a difference between a first integrated value of the probability density function determined by integrating the probability density function across a first range and a second integrated value of the probability density function determined by integrating the probability density function across a second range.

3. The method according to claim 2 , wherein the first range is a range of the parameter smaller than an average value of the parameter and the second range is a range for which the parameter is equal to or larger than the average value of the parameter.

4. The method according to claim 1 , wherein the asymmetry is a difference between tails of the probability density function.

5. The method according to claim 1 , wherein the adjustment includes increasing or decreasing a value of a control parameter of the patterning process including dose and/or focus.

6. The method according to claim 1 , further comprising:
removing, by the hardware computer system, an average value of the parameter from the probability density function of the parameter to determine a residual distribution of the parameter; and
determining, by the hardware computer system, the adjustment based on the measurements of the parameter and the residual distribution of the parameter so as to reduce the total number of features that have parameter values outside the range between the threshold values of the parameter.

7. The method according to claim 1 , wherein one of the threshold values is a first threshold value greater than an average value associated with the probability density function of the parameter and/or one of the threshold values is a second threshold value less than an average value associated with the probability density function of the parameter.

8. The method according to claim 7 , further comprising adjusting the control parameter of the patterning process to cause the average value associated with the probability density function of the parameter to shift towards the first threshold or second threshold value.

9. The method according to claim 1 , further comprising:
identifying, by the hardware computer system, a location of a defect on the substrate, the defect corresponds to a value of the parameter outside at least one of the threshold values; and
determining, by the hardware computer system, the adjustment specific to the location of the defect on the substrate.

10. The method according to claim 1 , wherein the measurements of the parameter are performed continuously or intermittently during the patterning process, and wherein the probability density function of the parameter is updated continuously or intermittently.

11. A computer program product comprising a non-transitory computer-readable storage medium having instructions therein, the instructions, upon execution by a computer system, configured to cause the computer system to perform the method according to claim 1 .

12. A method for determining an adjustment to a patterning process, the method comprising:
obtaining (i) an input distribution of a control parameter of the patterning process, (ii) a behavior of the patterning process, (iii) an output distribution of a parameter of the patterning process based on the behavior of the patterning process and the input distribution of the control parameter, and (iv) a deviation in the output distribution from a benchmark distribution of the parameter; and
determining, by a hardware computer system, the adjustment to the control parameter to reduce the deviation in the output distribution based on the behavior of the patterning process and the deviation in the output distribution of the parameter,
wherein i) the deviation in the output distribution corresponds to values of the control parameter that are transformed by a non-linear part of the behavior of the patterning process into values of the parameter and ii) the transformed values of the control parameter correspond to a tail portion of the input distribution, the tail portion being defined beyond a two standard deviation from an average of the input distribution.

13. The method according to claim 12 , wherein the determining the adjustment to the control parameter comprises:
modifying, by modelling and/or simulation, a statistic of the output distribution of the parameter to reduce the deviation from the benchmark distribution; and
determining, by modelling and/or simulation of the behavior of the patterning process, values of the control parameter corresponding to the modified output distribution.

14. The method according to claim 13 , wherein the modifying the output distribution involves modifying a statistic of the output distribution and the statistic of the output distribution of the parameter is at least one selected from: an average value, a value of a shaping parameter, or variance of the output distribution.

15. The method according to claim 12 , wherein the control parameter is a dose and/or focus and the parameter is a critical dimension and/or overlay.

16. The method according to claim 12 , wherein the benchmark distribution of the parameter is defined as a function of a linear behavior of the patterning process and the control parameter.

17. The method according to claim 12 , wherein the adjustment of the control parameter is within predefined threshold values.

18. The method according to claim 12 , further comprising applying the adjustment to an apparatus to reduce a defect at the identified location.

19. The method according to claim 12 , further comprising performing a pattern transfer via a lithographic apparatus based on the adjustment to the control parameter.

20. A computer program product comprising a non-transitory computer-readable storage medium having instructions therein, the instructions, upon execution by a computer system, configured to cause the computer system to perform the method according to claim 12 .

Assignees

• Asml Netherlands Bv

Inventors

• Tel Wim Tjibbo
• Kea Marc Jurian
• Anunciado Roy

Classifications

• G03F7/706837

  Data analysis, e.g. filtering, weighting, flyer removal, fingerprints or root cause analysis · CPC title

• G03F7/7065

  Defects, e.g. optical inspection of patterned layer for defects · CPC title

• G03F7/70616

  Monitoring the printed patterns · CPC title

• G03F7/70525 Primary

  Controlling normal operating mode, e.g. matching different apparatus, remote control or prediction of failure · CPC title