Composition, insulating material, and method for preparing an insulating material

Patent metadata

Field	Value
Publication number	US-11118082-B2
Application number	US-201816232766-A
Country	US
Kind code	B2
Filing date	Dec 26, 2018
Priority date	Dec 29, 2017
Publication date	Sep 14, 2021
Grant date	Sep 14, 2021

Abstract

A composition, an insulating material, and a method for preparing an insulating material are provided. The composition includes (a) 100 parts by weight of oligomer of Formula (I)

(b) 20-50 parts by weight of polymer having at least two reactive functional groups, wherein the reactive functional group is a reactive-double-bond-containing functional group; (c) 1-5 parts by weight of photoinitiator; (d) 0.5-2 parts by weight of thermal initiator; and (e) 0.5-2 parts by weight of photoacid generator.

First claim

What is claimed is:

1. A composition, comprising:
(a) 100 parts by weight of oligomer of Formula (I)

wherein R 1 and R 2 are independently hydrogen or

R 1 is not hydrogen when R 2 is hydrogen; a is 0 or 1; b is 0, 1, 2, 3, 4, 5, or 6; n≥5; m≥1; and the repeat unit

and the repeat unit

are arranged in a random or block fashion;
(b) 20-50 parts by weight of polymer having at least two reactive functional groups, wherein the reactive functional group is a reactive-double-bond-containing functional group;
(c) 1-5 parts by weight of photoinitiator;
(d) 0.5-2 parts by weight of thermal initiator; and
(e) 0.5-2 parts by weight of photoacid generator.

2. The composition as claimed in claim 1 , wherein the oligomer has a number-average molecular weight from 1,000 to 5,000, m is from 1 to 25, and n is 5 to 40.

3. The composition as claimed in claim 1 , wherein the ratio of n to m is 95:5 to 50:50.

4. The composition as claimed in claim 1 , wherein the R 1 and R 2 are independently hydrogen, methyl, ethyl, n-propyl, n-butyl, n-pentyl, or n-hexyl; and R 1 is not hydrogen when R 2 is hydrogen.

5. The composition as claimed in claim 1 , wherein the polymer having at least two reactive functional groups is polyether having at least two reactive functional groups, polynorbornene having at least two reactive functional groups, polyphenylene ether having at least two reactive functional groups, polypropylene having at least two reactive functional groups, polybutadiene having at least two reactive functional groups, or a combination thereof.

6. The composition as claimed in claim 1 , wherein the reactive functional group is acryloyl group, allyl group, vinylbenzyl group, methylacryloyl group, propargyl group, cyanoallyl group, or a combination thereof.

7. The composition as claimed in claim 1 , wherein the polymer having at least two reactive functional groups has a number-average molecular weight from about 1,000 to 200,000.

8. The composition as claimed in claim 1 , wherein the polymer having at least two reactive functional groups is polyphenylene ether having at least two methylacryloyl groups, polyphenylene ether having at least two vinylbenzyl groups, or polybutadiene having at least two acryloyl groups.

9. The composition as claimed in claim 1 , wherein the photoinitiator is benzoin-based compound, acetophenone-based compound, thioxanthone-based compound, ketal compound, benzophenone-based compound, a-aminoacetophenone compound, acylphosphineoxide compound, biimidazole-based compound, triazine-based compound, or a combination thereof.

10. The composition as claimed in claim 1 , wherein the thermal initiator is azo compound, cyanovaleric-acid-based compound, peroxide, or a combination thereof.

11. The composition as claimed in claim 1 , wherein the photoacid generator comprises ionic photoacid generator, non-ionic photoacid generator, polymeric photoacid generator, or a combination thereof.

12. The composition as claimed in claim 1 , wherein the photoacid generator comprises onium salt, selenium salt, phosphonium salt, iodinium, sulfonium salt, organic halogen compound, O-nitrobenzylsulfonate compound, N-iminosulfonate compound, N-imidosulfonate compound, diazosulfonate compound, sulfonamide compound, diazodisulfonate compound, disulfone compound, or a combination thereof.

13. The composition as claimed in claim 1 , further comprising:
(f) solvent.

14. The composition as claimed in claim 13 , wherein the solvent is acetone, methyl ethyl ketone, 1-methoxy-2-propanol, 1,2-propanediol monomethyl ether acetate, toluene, xylene, dimethyl formamide, N-methyl-2-pyrrolidone, dimethyl sulfoxide, or a combination thereof.

15. An insulating material, which is a cured product of the composition as claimed in claim 1 .

16. A method for preparing an insulating material, comprising:
subjecting the composition as claimed in claim 1 to a coating process to form a coating;
subjecting the coating to a first thermal treatment;
irradiating the coating with a light source; and
subjecting the coating to a second thermal treatment after irradiation.

17. The method as claimed in claim 16 , wherein the first thermal treatment has a temperature from 70 to 120° C.

18. The method as claimed in claim 16 , wherein the light source has a wavelength from 190 nm to 430 nm.

19. The method as claimed in claim 16 , wherein the second thermal treatment has a temperature from 100 to 250° C.

20. The method as claimed in claim 16 , after irradiation, further comprising:
subjecting the coating to a developing process.

Assignees

• Ind Tech Res Inst

Inventors

• Jeng Jyh-Long
• Tsai Jeng-Yu
• Chu Yen-Yi
• Yang Wei-Ta

Classifications

• C08F299/00

  Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers · CPC title

• H01B3/441

  from alkenes · CPC title

• H01B3/448

  from other vinyl compounds · CPC title

• G03F7/0388

  with ethylenic or acetylenic bands in the side chains of the photopolymer · CPC title

• C08G2261/418

  Ring opening metathesis polymerisation [ROMP] · CPC title