Light-emitting diode, array substrate, and method of making the same

US11114638B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11114638-B2
Application numberUS-201716473844-A
CountryUS
Kind codeB2
Filing dateDec 13, 2017
Priority dateJun 5, 2017
Publication dateSep 7, 2021
Grant dateSep 7, 2021

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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Abstract

Official abstract text for this publication.

The present application discloses an organic light-emitting diode (OLED). The OLED includes a first electrode and an organic light-emitting layer on the first electrode. Additionally, the OLED includes a second electrode on a side of the organic light-emitting layer distal to the first electrode. Furthermore, the OLED includes a substantially transparent protective layer on a side of the second electrode layer distal to the organic light emitting layer. Moreover, the OLED includes a substantially transparent conductive layer on a side of the substantially transparent protective layer distal to the second electrode, the substantially transparent conductive layer electrically connected to the second electrode.

First claim

Opening claim text (preview).

What is claimed is: 1. A method of manufacturing a light-emitting diode in an array substrate for a display panel, the method comprising: forming a first electrode; forming a light-emitting layer on the first electrode; forming a second electrode on a side of the light-emitting layer distal to the first electrode; forming a substantially transparent protective layer on a side of the second electrode distal to the light-emitting layer; and forming a substantially transparent conductive layer on a side of the substantially transparent protective layer distal to the second electrode, wherein the substantially transparent conductive layer and the second electrode are formed to be electrically connected to each other; wherein the forming a substantially transparent conductive layer comprises sputtering a metal oxide material in multiple sublayers on a side of the substantially transparent protective layer distal to the second electrode; wherein the sputtering the metal oxide material comprises sputtering the metal oxide material at a first deposition rate and a first sputtering power thereby forming a first sublayer and sputtering the metal oxide material at a second deposition rate and a second sputtering power thereby forming a second sublayer, the second deposition rate being greater than the first deposition rate, the second sputtering power being greater than the first sputtering power; wherein the first sublayer is formed to have a highest transmissivity and a lowest stress among all sublayers of the multi-layer film. 2. The method of claim 1 , wherein the forming the substantially transparent protective layer comprises: forming a polymer material layer by depositing a polymer material through a mask plate on a side of the second electrode distal to the light-emitting layer, the polymer material comprising an unsaturated carbon-carbon double-bond functional group and/or an organic material having unsaturated carbon chain; and curing the polymer material layer thereby forming the substantially transparent protective layer; wherein the mask plate has a pattern including one or more shielded regions for forming one or more vias in the substantially transparent protective layer. 3. The method of claim 2 , wherein the forming the polymer material layer includes heating the unsaturated carbon-carbon double-bond functional group and/or an organic material having unsaturated carbon chain. 4. The method of claim 2 , wherein the forming the polymer material comprises depositing approximately 10% v/v polyisoprene in acrylic monomers for a duration of approximately 120 seconds and curing for a duration of approximately 40 seconds to form the substantially transparent protective layer comprising a thickness in a range of approximately 2 μm. 5. The method of claim 1 , further comprising forming a via extending through the substantially transparent protective layer outside a light emission region of the light-emitting diode; wherein the substantially transparent conductive layer is formed to be electrically connected to the second electrode through the via. 6. The method of claim 2 , wherein the forming the polymer material further comprises doping a plurality of conductive particles thereby forming electrical connections between the substantially transparent conductive layer and the second electrode.

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What does patent US11114638B2 cover?
The present application discloses an organic light-emitting diode (OLED). The OLED includes a first electrode and an organic light-emitting layer on the first electrode. Additionally, the OLED includes a second electrode on a side of the organic light-emitting layer distal to the first electrode. Furthermore, the OLED includes a substantially transparent protective layer on a side of the second…
Who is the assignee on this patent?
Hefei Xinsheng Optoelectronics Technology Co Ltd, Boe Technology Group Co Ltd
What technology area does this patent fall under?
Primary CPC classification H10K59/80522. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Sep 07 2021 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 4 related publications on this page (citations in our corpus or others sharing the same primary CPC).