Etching method

Patent metadata

Field	Value
Publication number	US-11107692-B2
Application number	US-201716069723-A
Country	US
Kind code	B2
Filing date	May 2, 2017
Priority date	May 10, 2016
Publication date	Aug 31, 2021
Grant date	Aug 31, 2021

Abstract

An etching method of etching a silicon nitride region with high selectivity is provided. In the etching method, a processing target object, having a silicon nitride region and a silicon-containing region having a composition different from the silicon nitride region, is accommodated in a processing vessel, and the silicon nitride region is selectively etched. In a first process, a deposit containing hydrofluorocarbon is formed on the silicon nitride region and the silicon-containing region by generating plasma of a processing gas containing a hydrofluorocarbon gas within the processing vessel. In a second process, the silicon nitride region is etched by radicals of the hydrofluorocarbon contained in the deposit. The first process and the second process are repeated alternately.

First claim

We claim:

1. An etching method, comprising:
accommodating, within a processing vessel, a processing target object having a silicon nitride region and a silicon-containing region, wherein the silicon-containing region has a composition different from the silicon nitride region, and the silicon nitride region and the silicon-containing region are exposed;
a first process of forming a deposit containing hydrofluorocarbon on the silicon nitride region and the silicon-containing region by generating plasma from a processing gas containing a hydrofluorocarbon gas within the processing vessel; and
a second process of sputtering the deposit by active species of atoms of a rare gas in plasma generated from the rare gas and etching the silicon nitride region by radicals generated from the hydrofluorocarbon contained in the deposit,
wherein the first process and the second process are repeated alternately.

2. The etching method of claim 1 ,
wherein the silicon-containing region contains at least one silicon compound selected from the group consisting of SiC, SiOC, SiON, SiCN, SiOCN and SiO 2 .

3. The etching method of claim 1 ,
wherein the hydrofluorocarbon gas contains at least one gas selected from the group consisting of CH 3 F, CH 2 F 2 and CHF 3 .

4. The etching method of claim 1 ,
wherein a ratio between a period of the first process and a period of the second process is set such that an etching amount of the silicon nitride region is at least five times as large as an etching amount of the silicon-containing region.

5. The etching method of claim 1 ,
wherein, in the second process, the radicals generated from the hydrofluorocarbon contained in the deposit are generated by exposing the deposit to the plasma of the rare gas.

6. The etching method of claim 1 ,
wherein an oxygen gas concentration in the processing gas is equal to or less than 2.0×10 −10 mol/cm 3 .

7. The etching method of claim 1 ,
wherein the second process includes generating the plasma from the rare gas and exposing a surface of the processing target object to the generated plasma.

8. The etching method of claim 1 ,
wherein, in the first process and the second process, a temperature of the processing target object is set to be in the range from 0° C. to 100° C.

9. The etching method of claim 1 ,
wherein the first process and the second process are performed in the same processing vessel without carrying-out the processing target object.

10. The etching method of claim 1 ,
wherein, in the first process, a surface of the silicon nitride region is modified.

11. The etching method of claim 1 ,
wherein the silicon nitride region and the silicon-containing region are exposed.

12. The etching method of claim 1 ,
wherein the silicon-containing region comprises a SiCN region containing SiCN and a SiC region containing SiC.

13. The etching method of claim 1 ,
wherein the silicon-containing region contains at least one silicon compound selected from the group consisting of SiC, SiOC, SiON, SiCN, SiOCN and SiO 2 , and
wherein the hydrofluorocarbon gas contains at least one gas selected from the group consisting of CH 3 F, CH 2 F 2 and CHF 3 .

14. The etching method of claim 1 ,
wherein a ratio of a processing time of the first process with respect to a sum of processing times of the first and second processes is set to be in a range from 5% to 30%.

15. The etching method of claim 1 ,
wherein the processing vessel includes a lower electrode on which the processing target object is placed and an upper electrode facing the lower electrode, and
wherein, in the first process, a pressure of a space within the processing vessel is set to a pressure within a range from 20 mTorr to 50 mTorr, and a distance between the upper electrode and a top surface of a mounting table including the lower electrode is set to be in a range from 20 mm to 50 mm.

16. The etching method of claim 1 ,
wherein the processing vessel includes a lower electrode on which the processing target object is placed and an upper electrode facing the lower electrode, and
wherein, in the first process, a negative voltage is applied to the upper electrode.

17. The etching method of claim 1 ,
wherein the processing vessel includes a lower electrode on which the processing target object is placed and an upper electrode facing the lower electrode, and
wherein, in the second process, a pressure of a space within the processing vessel is set to a pressure within a range from 20 mTorr to 50 mTorr, and a distance between the upper electrode and a top surface of a mounting table including the lower electrode is set to be in a range from 20 mm to 50 mm.

18. The etching method of claim 1 ,
wherein the processing vessel includes a lower electrode on which the processing target object is placed and an upper electrode facing the lower electrode, and
wherein, in the second process, a negative voltage is applied to the upper electrode.

19. An etching method, comprising:
accommodating, within a processing vessel, a processing target object having a silicon nitride region and a silicon-containing region, wherein the silicon-containing region has a composition different from the silicon nitride region, and the silicon nitride region and the silicon-containing region are exposed;
a first process of forming a deposit containing hydrofluorocarbon on the silicon nitride region and the silicon-containing region by generating plasma from a processing gas containing a hydrofluorocarbon gas within the processing vessel; and
a second process of sputtering the deposit by active species of atoms of a rare gas in plasma generated from the rare gas and etching the silicon nitride region by radicals generated from the hydrofluorocarbon contained in the deposit,
wherein, in the first process, a thickness of the deposit formed on the silicon-containing region is thicker than a thickness of the deposit formed on the silicon nitride region, and
in the second process, the deposit on the silicon-containing region suppresses the silicon-containing region from being substantially etched, and
a ratio of a processing time of the first process with respect to a sum of processing times of the first and second processes is set to be in a range from 5% to 30%.

20. The etching method of claim 19 ,
wherein the silicon-containing region comprises a SiCN region containing SiCN and a SiC region containing SiC.

Assignees

• Tokyo Electron Ltd

Inventors

• Watanabe Hikaru
• Ebihara Ryosuke

Classifications

• H10P50/283 Primary

  by chemical means · CPC title

• H10P50/268

  of silicon-containing layers · CPC title

• H10P50/246

  of Group III-V materials · CPC title

• H10P14/6922

  the material containing Si, O and at least one of H, N, C, F or other non-metal elements, e.g. SiOC, SiOC:H or SiONC · CPC title

• H10P14/6529

  by exposure to a gas or vapour · CPC title