PDMS resin for stereolithographic 3D-printing of PDMS

Patent metadata

Field	Value
Publication number	US-11104802-B2
Application number	US-201716336850-A
Country	US
Kind code	B2
Filing date	Sep 26, 2017
Priority date	Sep 26, 2016
Publication date	Aug 31, 2021
Grant date	Aug 31, 2021

Abstract

Photocurable poly(siloxane) formulations for making stereolithographic 3D-printed PDMS structures, stereolithographic 3D-printing methods for making PDMS structures, and stereolithographic 3D-printed PDMS structures.

First claim

The embodiments of the invention in which an exclusive property or privilege is claimed are defined as follows:

1. A poly(siloxane) formulation, comprising:
(a) a first polymerizable poly(siloxane) having a first terminus and a second terminus, each terminus comprising a terminal polymerizable group;
(b) a second polymerizable poly(siloxane) comprising repeating units, at least some of the repeating units having a side-chain polymerizable group;
(c) a photo-initiator; and
(d) a photo-sensitizer,
wherein the photo-initiator is ethyl (2,4,6-trimethylbenzoyl) phenyl phosphinate (TPO-L) and the photo-sensitizer is isopropyl thioxanthone (ITX).

2. The poly(siloxane) formulation of claim 1 further comprising an ultraviolet light absorber.

3. The poly(siloxane) formulation of claim 1 , wherein the poly(siloxane) is a poly(dimethylsiloxane).

4. The poly(siloxane) formulation of claim 1 , wherein the first polymerizable poly(siloxane) is a poly(dimethylsiloxane).

5. The poly(siloxane) formulation of claim 1 , wherein the terminal polymerizable group is reactive toward free radical polymerization.

6. The poly(siloxane) formulation of claim 1 , wherein the terminal polymerizable group is independently selected from an acrylate, a methacrylate, an acrylamide, or a vinyl group.

7. The poly(siloxane) formulation of claim 1 , wherein the first polymerizable poly(siloxane) is methacryloxypropyl poly(dimethylsiloxane).

8. The poly(siloxane) formulation of claim 1 , wherein the second polymerizable poly(siloxane) is a poly(dimethylsiloxane).

9. The poly(siloxane) formulation of claim 1 , wherein the side-chain polymerizable group is reactive toward free radical polymerization.

10. The poly(siloxane) formulation of claim 1 , wherein the side-chain polymerizable group is independently selected from an acrylate, a methacrylate, an acrylamide, or a thiol group.

11. The poly(siloxane) formulation of claim 1 , wherein the second polymerizable poly(siloxane) is a copolymer of dimethyl siloxane and methacryloxypropyl dimethyl siloxane.

12. The poly(siloxane) formulation of claim 2 , wherein the ultraviolet light absorber has an absorbance in the range from about 300 nm to about 420 nm (UV-A range).

13. A method for stereolithographic 3-D printing an object, comprising:
(a) distributing a poly(siloxane) formulation of claim 1 in a vessel having an XY surface to provide a resin contained in the vessel, wherein the resin is coextensive with the surface;
(b) positioning a build-surface on which the object is to be printed at a distance Z from the bottom of the vessel;
(c) selectively illuminating a first portion of the resin through positioning of a light source relative to the build-surface to effect photopolymerization of the first portion of the resin to provide a first photocured layer adjacent to the surface, wherein the first photocured layer has a thickness defined by the distance between the build-surface and the bottom of the vessel;
(d) adjusting the relative position of the build-surface and the light source and selectively illuminate a second portion of the resin adjacent to the first photocured layer to provide a second photocured layer, wherein the first and second photocured layers form an integral photocured layer; and
(e) repeating steps (c) and (d) until the object is built.

14. In a method for stereolithographic 3-D printing an object from a photocurable resin, the improvement being the use of a poly(siloxane) formulation of claim 1 as the photocurable resin.

15. The method of claim 13 further comprising washing the built object to remove uncured resin that is residual in the built object.

16. The method of claim 15 , wherein washing the built object to remove uncured resin reveals voids in the built object resulting from select illumination and photopolymerization.

17. The method of claim 15 , wherein washing the built object comprises serial washing with solvents with increasing polarity.

18. A stereolithographically 3D-printed structure, comprising a poly(siloxane) network prepared by photocuring the poly(siloxane) formulation of claim 1 .

19. The structure of claim 18 , wherein the structure is a solid structure.

20. The structure of claim 18 , wherein the structure is a microfluidic device.

Assignees

• Univ Washington

Inventors

• Folch Albert
• Bhattacharjee Nirveek
• Parra Cesar

Classifications

• B33Y70/00

  Materials specially adapted for additive manufacturing · CPC title

• C08G77/44

  containing only polysiloxane sequences · CPC title

• C08G77/382

  containing atoms other than carbon, hydrogen, oxygen or silicon · CPC title

• C08J3/28

  Treatment by wave energy or particle radiation · CPC title

• C08L83/08

  containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen · CPC title