Ultrasound Phantom Models, Materials, and Methods
US-2016180745-A1 · Jun 23, 2016 · US
Photocurable resin composition containing fluorine and method for producing a resin mold using same
US8936744B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-8936744-B2 |
| Application number | US-201013381151-A |
| Country | US |
| Kind code | B2 |
| Filing date | Jul 7, 2010 |
| Priority date | Jul 13, 2009 |
| Publication date | Jan 20, 2015 |
| Grant date | Jan 20, 2015 |
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- Title
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Abstract
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There are provided a fluorine-containing photocurable resin composition and a method of preparing a mold comprising the same and more particularly, a photocurable resin composition having chemical resistance, mechanical properties and high transmittance, etc. as well as being easily wetted with and released from thermosetting or photocurable resins for pattern formation regardless of additional surface treatment, as opposed to the existing polymer resin materials used for resin molds, and a method of preparing a resin mold using the same.
First claim
Opening claim text (preview).
What is claimed is: 1. A method of preparing a polymer resin mold, comprising: S1) applying a fluorine-containing photocurable resin solution to one side of a mold die with a pattern formed thereon and curing it to transfer the pattern of the mold die; and S2) releasing the cured polymer resin with the pattern transferred thereto from the mold die; S3a) forming a plasma-treated surface on the back side of the cured polymer resin with the released pattern formed thereon; S4a)…
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Operations & Transport · mapped topic
Chemistry & Metallurgy · mapped topic
Chemistry & Metallurgy · mapped topic
Operations & Transport · mapped topic
Chemistry & Metallurgy · mapped topic
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Frequently asked questions
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- What does patent US8936744B2 cover?
- There are provided a fluorine-containing photocurable resin composition and a method of preparing a mold comprising the same and more particularly, a photocurable resin composition having chemical resistance, mechanical properties and high transmittance, etc. as well as being easily wetted with and released from thermosetting or photocurable resins for pattern formation regardless of additional…
- Who is the assignee on this patent?
- Yoo Jae-Won, Kim Byung-Uk, Kim Un-Yong, and 2 more
- What technology area does this patent fall under?
- Primary CPC classification B29C39/006. Mapped technology areas include Operations & Transport.
- When was this patent published?
- Publication date Tue Jan 20 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).