Maintaining a set of process fingerprints

Patent metadata

Field	Value
Publication number	US-11099485-B2
Application number	US-201816493326-A
Country	US
Kind code	B2
Filing date	Apr 9, 2018
Priority date	Apr 19, 2017
Publication date	Aug 24, 2021
Grant date	Aug 24, 2021

Abstract

A method of maintaining a set of fingerprints representing variation of one or more process parameters across wafers subjected to a device manufacturing method, the method including: receiving measurement data of one or more parameters measured on wafers; updating the set of fingerprints based on an expected evolution of the one or more process parameters; and evaluation of the updated set of fingerprints based on decomposition of the received measurement data in terms of the updated set of fingerprints. Each fingerprint may have a stored likelihood of occurrence, and the decomposition may involve: estimating, based the received measurement data, likelihoods of occurrence of the set of fingerprints in the received measurement data; and updating the stored likelihoods of occurrence based on the estimated likelihoods.

First claim

The invention claimed is:

1. A method of maintaining a set of fingerprints representing variation of one or more process parameters associated with one or more product units processed by a manufacturing process, the method comprising:
receiving measurement data of one or more parameters measured on one or more product units;
determining a first updated set of fingerprints based on an expected evolution of the set of fingerprints; and
determining a second updated set of fingerprints based on decomposition of the received measurement data in terms of the first updated set of fingerprints.

2. The method of claim 1 , wherein the expected evolution is one or more selected from a random variation, drift due to heating, drift due to dynamics, oscillation due to dynamics, drift due to wear, and/or (near) stable behavior.

3. The method of claim 1 , wherein the measurement data comprises one or more selected from leveling data, alignment data, overlay data, CD data, focus data, side-wall angle data, and/or wafer topography data.

4. The method of claim 1 , wherein each fingerprint has a stored likelihood of occurrence, and the decomposition of the received measurement data in terms of the first updated set of fingerprints comprises:
estimating, based on the received measurement data, likelihoods of occurrence of the first updated set of fingerprints in the received measurement data; and
updating the stored likelihoods of occurrence based on the estimated likelihoods.

5. The method of claim 4 , wherein the decomposition comprises using a factorial model wherein the estimated likelihoods of occurrence comprise coefficients of the factorial model.

6. The method of claim 1 , further comprising determining performance data and/or a process control action, based on the decomposition of the received measurement data.

7. The method of claim 6 , comprising determining performance data, wherein the performance data comprises a fingerprint of a performance parameter across a product unit.

8. The method of claim 1 , further comprising the stop of receiving context data representing one or more records of one or more process parameters of the one or more product unit(s) on which the measurement data was measured, and wherein the determining a first updated set of fingerprints is further based on the received context data.

9. The method of claim 8 , further comprising a step of attributing a relevance parameter to a fingerprint out of the second updated set of fingerprints based on the received context data.

10. The method of claim 9 , further comprising determining performance data and/or a process control action, based on the relevance parameter and the fingerprint.

11. The method of claim 10 , further comprising a-step-of updating the set of fingerprints based on the determined performance data and/or process control action.

12. The method of claim 1 , wherein the determining a first updated set of fingerprints comprises one or more selected from of: adapting a fingerprint of the set, adding a new fingerprint to the set, and/or removing a fingerprint from the set.

13. The method of claim 1 , further comprising adding a fingerprint to the set by retrieving a fingerprint from a set of reference fingerprints.

14. The method of claim 13 , further comprising warping the retrieved fingerprint to determine the added fingerprint.

15. The method of claim 13 , wherein the set of reference fingerprints are derived from historical measurement data representing one or more parameters measured on one or more product units.

16. The method of claim 13 , further comprising updating the set of reference fingerprints with an updated fingerprint from the set of fingerprints.

17. The method of claim 1 , wherein the one or more product units are one or more substrates processed by a device manufacturing method.

18. The method of claim 8 , wherein the determining the first updated set of fingerprints comprises:
calculating expected measurement data based on:
one or more predicted fingerprints; and
the received context data;

determining a process control action based on the calculated expected measurement data; and
updating the set of fingerprints based on the determined process control action.

19. A non-transitory computer-readable medium comprising instructions stored therein, the instructions, upon execution by a computer system, configured to cause the computer system to at least:
receive measurement data of one or more parameters measured on one or more product units processed by a manufacturing process, wherein a set of fingerprints represent variation of one or more process parameters associated with one or more product units;
determine a first updated set of fingerprints based on an expected evolution of the set of fingerprints; and
determine a second updated set of fingerprints based on decomposition of the received measurement data in terms of the first updated set of fingerprints.

20. An apparatus specifically configured to carry out the method of claim 1 .

Assignees

• Asml Netherlands Bv

Inventors

• Ypma Alexander
• Bastani Vahid
• Sonntag Dag
• Nije Jelle
• Cekli Hakki Ergün
• Tsirogiannis Georgios
• Van Wijk Robert Jan

Classifications

• G03F7/70508

  Data handling in all parts of the microlithographic apparatus, e.g. handling pattern data for addressable masks or data transfer to or from different components within the exposure apparatus · CPC title

• G03F7/70525

  Controlling normal operating mode, e.g. matching different apparatus, remote control or prediction of failure · CPC title

• G03F9/7003

  Alignment type or strategy, e.g. leveling, global alignment · CPC title

• G03F7/705

  Modelling or simulating from physical phenomena up to complete wafer processes or whole workflow in wafer productions · CPC title

• G03F7/706841

  Machine learning · CPC title