Method for polishing glass substrate, method for manufacturing glass substrate, method for manufacturing magnetic-disk glass substrate, method for manufacturing magnetic disk, polishing liquid, and method for reducing cerium oxide

Patent metadata

Field	Value
Publication number	US-11098224-B2
Application number	US-201716337310-A
Country	US
Kind code	B2
Filing date	Nov 24, 2017
Priority date	Nov 23, 2016
Publication date	Aug 24, 2021
Grant date	Aug 24, 2021

Abstract

A method for polishing a glass substrate, by which a polishing speed that is higher than a conventional polishing speed can be maintained for a long period of time in processing for polishing a glass substrate using cerium oxide as polishing abrasive particles is provided. A polishing liquid containing cerium oxide as polishing abrasive particles is supplied to a polishing surface of a glass substrate, and the glass substrate is subjected to polishing processing. This polishing liquid contains the cerium oxide as polishing abrasive particles and a substance that reduces cerium oxide in response to light irradiation. Also, processing for irradiating the polishing liquid with light is performed when polishing processing is performed.

First claim

The invention claimed is:

1. A method for manufacturing a glass substrate, the method comprising:
performing a polishing processing on a glass substrate using a polishing liquid containing cerium oxide as polishing abrasive particles,
the polishing liquid being irradiated with light when the polishing processing is performed,
the polishing liquid containing a substance that reduces cerium oxide in response to irradiation of the light.

2. The method for manufacturing a glass substrate-according to claim 1 ,
wherein a band gap of the substance that reduces cerium oxide in response to the irradiation of the light is larger than a band gap of the cerium oxide.

3. The method for manufacturing a glass substrate according to claim 1 ,
wherein an energy level at a lower end of a conduction band of the substance that reduces cerium oxide in response to the irradiation of the light is higher than an energy level at a lower end of a conduction band of the cerium oxide.

4. The method for manufacturing a glass substrate according to claim 1 ,
wherein the substance that reduces cerium oxide in response to the irradiation of the light includes at least one of gallium oxide, tantalum oxide, tantalates, niobium oxide, and niobates.

5. The method for manufacturing a glass substrate according to claim 1 ,
wherein the polishing liquid is alkaline.

6. The method for manufacturing a glass substrate according to claim 1 ,
wherein the polishing liquid is used while the polishing liquid is circulated during the polishing processing.

7. A method for manufacturing a magnetic-disk glass substrate,
by which a magnetic-disk glass substrate is manufactured using the method for manufacturing a glass substrate according to claim 1 .

8. A method for manufacturing a magnetic disk, comprising:
manufacturing the glass substrate according to claim 1 ; and
processing in which at least a magnetic film is formed.

9. The method for manufacturing a glass substrate according to claim 4 ,
wherein the polishing liquid is alkaline.

10. The method for manufacturing a glass substrate according to claim 4 ,
wherein the polishing liquid is used while the polishing liquid is circulated during the polishing processing.

11. The method for manufacturing a glass substrate according to claim 9 ,
wherein the polishing liquid is used while the polishing liquid is circulated during the polishing processing.

12. A method for manufacturing a glass substrate, the method comprising:
performing a polishing processing on a glass substrate using a polishing liquid containing polishing abrasive particles,
the polishing liquid being irradiated with light when the polishing processing is performed,
the polishing abrasive particles including cerium oxide whose surface has a substance that reduces cerium oxide in response to irradiation of the light.

13. The method for manufacturing a glass substrate according to claim 12 ,
wherein a band gap of the substance that reduces cerium oxide in response to the irradiation of the light is larger than a band gap of the cerium oxide.

14. The method for manufacturing a glass substrate according to claim 12 ,
wherein an energy level at a lower end of a conduction band of the substance that reduces cerium oxide in response to the irradiation of the light is higher than an energy level at a lower end of a conduction band of the cerium oxide.

15. The method for manufacturing a glass substrate according to claim 12 ,
wherein the substance that reduces cerium oxide in response to the irradiation of the light includes at least one of gallium oxide, tantalum oxide, tantalates, niobium oxide, and niobates.

16. The method for manufacturing a glass substrate according to claim 12 ,
wherein a coverage of the substance that reduces cerium oxide in response to the irradiation of the light on the surface of the cerium oxide is in a range of 0.01% to 50%.

17. The method for manufacturing a glass substrate according to claim 12 ,
wherein the polishing liquid is alkaline.

18. The method for manufacturing a glass substrate according to claim 12 ,
wherein the polishing liquid is used while the polishing liquid is circulated during the polishing processing.

19. A method for manufacturing a magnetic-disk glass substrate,
by which a magnetic-disk glass substrate is manufactured using the method for manufacturing a glass substrate according to claim 12 .

20. A method for manufacturing a magnetic disk, comprising:
manufacturing the glass substrate according to claim 12 ; and
processing in which at least a magnetic film is formed.

Assignees

• Hoya Corp

Inventors

• Nakagawa Hiroki
• NAKAYAMA Kashio

Classifications

• C09G1/02 Primary

  containing abrasives or grinding agents {(abrasives as such C09K3/14; polishing of semi-conductors H10P52/40)} · CPC title

• B24B37/044

  characterised by the composition of the lapping agent · CPC title

• G11B5/8404

  manufacturing base layers · CPC title

• C09K3/1436

  Composite particles, e.g. coated particles · CPC title

• C09K3/1454

  Abrasive powders, suspensions and pastes for polishing · CPC title