Method for manufacturing glass substrate, method for manufacturing magnetic disk, and polishing liquid composition for glass substrate

US2016118073A1 · US · A1

Patent metadata
FieldValue
Publication numberUS-2016118073-A1
Application numberUS-201414894900-A
CountryUS
Kind codeA1
Filing dateJun 29, 2014
Priority dateJun 29, 2013
Publication dateApr 28, 2016
Grant date

How to read this patent

A practical reading order for non-experts. Skip the full description unless you need deep technical detail.

  1. Title

    What the patent document calls the invention.

  2. Abstract

    A short plain-language summary of the technical disclosure.

  3. Assignees and inventors

    Who owns or filed the patent and who is credited as inventor.

  4. Key dates

    Filing, priority, publication, and grant dates set the timeline.

  5. First independent claim

    The legal scope of protection — read this for what is actually claimed.

  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

    Prior art links and similar publications in this corpus.

Abstract

Official abstract text for this publication.

The present invention provides a method for manufacturing a glass substrate for a magnetic disk or the like according to which surface roughnesses of main surfaces of a glass substrate can be reduced more than with currently available methods. In the present invention, by mirror-polishing (final finishing-polishing) the main surfaces of the glass substrate used in a magnetic disk, for example, using a polishing liquid containing organic-based particles made of a styrene-based resin, an acrylic resin, or a urethane-based resin, as polishing abrasive particles, surface roughnesses of the main surfaces of the substrate can be reduced more than with currently available methods.

First claim

Opening claim text (preview).

1 . A method for manufacturing a glass substrate, comprising: mirror-polishing main surfaces of the glass substrate using a polishing liquid containing organic-based particles as polishing abrasive particles. 2 . The method for manufacturing the glass substrate according to claim 1 , wherein the organic-based particles are made of a styrene-based resin, an acryl-based resin, or a urethane-based resin. 3 . The method for manufacturing the glass substrate according to claim 1 , wherein a particle diameter of the organic-based particles is in a range of 0.5 to 60 μm. 4 . The method for manufacturing the glass substrate according to claim 1 , wherein after the main surfaces of the glass substrate are polished using a polishing liquid containing silica abrasive particles as polishing abrasive particles, the main surfaces of the glass substrate are mirror-polished using the polishing liquid containing the organic-based particles as polishing abrasive particles. 5 . The method for manufacturing the glass substrate according to claim 1 , wherein with regard to roughnesses of the main surfaces of the glass substrate before the main surfaces of the glass substrate are mirror-polished using the polishing liquid containing the organic-based particles as polishing abrasive particles, an arithmetic mean roughness Ra is 0.3 nm or less. 6 . The method for manufacturing the glass substrate according to claim 1 , wherein after the main surfaces of the glass substrate are mirror-polished using the polishing liquid containing the organic-based particles as polishing abrasive particles, the glass substrate is cleaned using an alcohol-based cleaning agent. 7 . The method for manufacturing the glass substrate according to claim 1 , wherein the glass substrate is a magnetic-disk glass substrate. 8 . The method for manufacturing a glass substrate according to claim 1 , wherein the glass substrate is a glass substrate for a mask blank. 9 . A method for manufacturing a magnetic disk, in which at least a magnetic layer is formed on a magnetic-disk glass substrate that is obtained with the manufacturing method according to claim 7 . 10 . A polishing liquid composition for a glass substrate, which is to be applied in polishing processing for polishing surfaces of a glass substrate, the polishing liquid composition comprising: organic-based particles as polishing abrasive particles. 11 . The polishing liquid composition for the glass substrate according to claim 10 , wherein a particle diameter of the organic-based particles is in a range of 0.5 to 60 μm. 12 . The method for manufacturing the glass substrate according to claim 2 , wherein a particle diameter of the organic-based particles is in a range of 0.5 to 60 μm. 13 . The method for manufacturing the glass substrate according to claim 2 , wherein after the main surfaces of the glass substrate are polished using a polishing liquid containing silica abrasive particles as polishing abrasive particles, the main surfaces of the glass substrate are mirror-polished using the polishing liquid containing the organic-based particles as polishing abrasive particles. 14 . The method for manufacturing the glass substrate according to claim 3 , wherein after the main surfaces of the glass substrate are polished using a polishing liquid containing silica abrasive particles as polishing abrasive particles, the main surfaces of the glass substrate are mirror-polished using the polishing liquid containing the organic-based particles as polishing abrasive particles. 15 . The method for manufacturing the glass substrate according to claim 12 , wherein after the main surfaces of the glass substrate are polished using a polishing liquid containing silica abrasive particles as polishing abrasive particles, the main surfaces of the glass substrate are mirror-polished using the polishing liquid containing the organic-based particles as polishing abrasive particles. 16 . The method for manufacturing the glass substrate according to claim 2 , wherein with regard to roughnesses of the main surfaces of the glass substrate before the main surfaces of the glass substrate are mirror-polished using the polishing liquid containing the organic-based particles as polishing abrasive particles, an arithmetic mean roughness Ra is 0.3 nm or less. 17 . The method for manufacturing the glass substrate according to claim 3 , wherein with regard to roughnesses of the main surfaces of the glass substrate before the main surfaces of the glass substrate are mirror-polished using the polishing liquid containing the organic-based particles as polishing abrasive particles, an arithmetic mean roughness Ra is 0.3 nm or less. 18 . The method for manufacturing the glass substrate according to claim 4 , wherein with regard to roughnesses of the main surfaces of the glass substrate before the main surfaces of the glass substrate are mirror-polished using the polishing liquid containing the organic-based particles as polishing abrasive particles, an arithmetic mean roughness Ra is 0.3 nm or less. 19 . The method for manufacturing the glass substrate according to claim 12 , wherein with regard to roughnesses of the main surfaces of the glass substrate before the main surfaces of the glass substrate are mirror-polished using the polishing liquid containing the organic-based particles as polishing abrasive particles, an arithmetic mean roughness Ra is 0.3 nm or less. 20 . The method for manufacturing the glass substrate according to claim 13 , wherein with regard to roughnesses of the main surfaces of the glass substrate before the main surfaces of the glass substrate are mirror-polished using the polishing liquid containing the organic-based particles as polishing abrasive particles, an arithmetic mean roughness Ra is 0.3 nm or less.

Assignees

Inventors

Classifications

  • Record carriers characterised by the selection of the material · CPC title

  • for double side lapping · CPC title

  • Abrasive particles per se (preparation of diamond C01B32/25) · CPC title

  • G11B5/8404Primary

    manufacturing base layers · CPC title

  • Abrasive powders, suspensions and pastes for polishing · CPC title

Patent family

Related publications grouped by family.

External sources

Frequently asked questions

Answers are generated from the same data shown on this page.

What does patent US2016118073A1 cover?
The present invention provides a method for manufacturing a glass substrate for a magnetic disk or the like according to which surface roughnesses of main surfaces of a glass substrate can be reduced more than with currently available methods. In the present invention, by mirror-polishing (final finishing-polishing) the main surfaces of the glass substrate used in a magnetic disk, for example, …
Who is the assignee on this patent?
Hoya Corp
What technology area does this patent fall under?
Primary CPC classification G11B5/8404. Mapped technology areas include Physics.
When was this patent published?
Publication date Thu Apr 28 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).