Method for providing a magnetic recording transducer using a chemical buffer
US-9196283-B1 · Nov 24, 2015 · US
US2016118073A1 · US · A1
| Field | Value |
|---|---|
| Publication number | US-2016118073-A1 |
| Application number | US-201414894900-A |
| Country | US |
| Kind code | A1 |
| Filing date | Jun 29, 2014 |
| Priority date | Jun 29, 2013 |
| Publication date | Apr 28, 2016 |
| Grant date | — |
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The present invention provides a method for manufacturing a glass substrate for a magnetic disk or the like according to which surface roughnesses of main surfaces of a glass substrate can be reduced more than with currently available methods. In the present invention, by mirror-polishing (final finishing-polishing) the main surfaces of the glass substrate used in a magnetic disk, for example, using a polishing liquid containing organic-based particles made of a styrene-based resin, an acrylic resin, or a urethane-based resin, as polishing abrasive particles, surface roughnesses of the main surfaces of the substrate can be reduced more than with currently available methods.
Opening claim text (preview).
1 . A method for manufacturing a glass substrate, comprising: mirror-polishing main surfaces of the glass substrate using a polishing liquid containing organic-based particles as polishing abrasive particles. 2 . The method for manufacturing the glass substrate according to claim 1 , wherein the organic-based particles are made of a styrene-based resin, an acryl-based resin, or a urethane-based resin. 3 . The method for manufacturing the glass substrate according to claim 1 , wherein a particle diameter of the organic-based particles is in a range of 0.5 to 60 μm. 4 . The method for manufacturing the glass substrate according to claim 1 , wherein after the main surfaces of the glass substrate are polished using a polishing liquid containing silica abrasive particles as polishing abrasive particles, the main surfaces of the glass substrate are mirror-polished using the polishing liquid containing the organic-based particles as polishing abrasive particles. 5 . The method for manufacturing the glass substrate according to claim 1 , wherein with regard to roughnesses of the main surfaces of the glass substrate before the main surfaces of the glass substrate are mirror-polished using the polishing liquid containing the organic-based particles as polishing abrasive particles, an arithmetic mean roughness Ra is 0.3 nm or less. 6 . The method for manufacturing the glass substrate according to claim 1 , wherein after the main surfaces of the glass substrate are mirror-polished using the polishing liquid containing the organic-based particles as polishing abrasive particles, the glass substrate is cleaned using an alcohol-based cleaning agent. 7 . The method for manufacturing the glass substrate according to claim 1 , wherein the glass substrate is a magnetic-disk glass substrate. 8 . The method for manufacturing a glass substrate according to claim 1 , wherein the glass substrate is a glass substrate for a mask blank. 9 . A method for manufacturing a magnetic disk, in which at least a magnetic layer is formed on a magnetic-disk glass substrate that is obtained with the manufacturing method according to claim 7 . 10 . A polishing liquid composition for a glass substrate, which is to be applied in polishing processing for polishing surfaces of a glass substrate, the polishing liquid composition comprising: organic-based particles as polishing abrasive particles. 11 . The polishing liquid composition for the glass substrate according to claim 10 , wherein a particle diameter of the organic-based particles is in a range of 0.5 to 60 μm. 12 . The method for manufacturing the glass substrate according to claim 2 , wherein a particle diameter of the organic-based particles is in a range of 0.5 to 60 μm. 13 . The method for manufacturing the glass substrate according to claim 2 , wherein after the main surfaces of the glass substrate are polished using a polishing liquid containing silica abrasive particles as polishing abrasive particles, the main surfaces of the glass substrate are mirror-polished using the polishing liquid containing the organic-based particles as polishing abrasive particles. 14 . The method for manufacturing the glass substrate according to claim 3 , wherein after the main surfaces of the glass substrate are polished using a polishing liquid containing silica abrasive particles as polishing abrasive particles, the main surfaces of the glass substrate are mirror-polished using the polishing liquid containing the organic-based particles as polishing abrasive particles. 15 . The method for manufacturing the glass substrate according to claim 12 , wherein after the main surfaces of the glass substrate are polished using a polishing liquid containing silica abrasive particles as polishing abrasive particles, the main surfaces of the glass substrate are mirror-polished using the polishing liquid containing the organic-based particles as polishing abrasive particles. 16 . The method for manufacturing the glass substrate according to claim 2 , wherein with regard to roughnesses of the main surfaces of the glass substrate before the main surfaces of the glass substrate are mirror-polished using the polishing liquid containing the organic-based particles as polishing abrasive particles, an arithmetic mean roughness Ra is 0.3 nm or less. 17 . The method for manufacturing the glass substrate according to claim 3 , wherein with regard to roughnesses of the main surfaces of the glass substrate before the main surfaces of the glass substrate are mirror-polished using the polishing liquid containing the organic-based particles as polishing abrasive particles, an arithmetic mean roughness Ra is 0.3 nm or less. 18 . The method for manufacturing the glass substrate according to claim 4 , wherein with regard to roughnesses of the main surfaces of the glass substrate before the main surfaces of the glass substrate are mirror-polished using the polishing liquid containing the organic-based particles as polishing abrasive particles, an arithmetic mean roughness Ra is 0.3 nm or less. 19 . The method for manufacturing the glass substrate according to claim 12 , wherein with regard to roughnesses of the main surfaces of the glass substrate before the main surfaces of the glass substrate are mirror-polished using the polishing liquid containing the organic-based particles as polishing abrasive particles, an arithmetic mean roughness Ra is 0.3 nm or less. 20 . The method for manufacturing the glass substrate according to claim 13 , wherein with regard to roughnesses of the main surfaces of the glass substrate before the main surfaces of the glass substrate are mirror-polished using the polishing liquid containing the organic-based particles as polishing abrasive particles, an arithmetic mean roughness Ra is 0.3 nm or less.
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