Solder mask inkjet inks for manufacturing printed circuit boards

US11098215B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11098215-B2
Application numberUS-201716348161-A
CountryUS
Kind codeB2
Filing dateNov 7, 2017
Priority dateNov 10, 2016
Publication dateAug 24, 2021
Grant dateAug 24, 2021

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

An inkjet method for producing a solder mask in the manufacture of a Printed Circuit Board uses a solder mask inkjet ink containing a polymerizable adhesion promoter and a phenolic compound including at least two phenolic groups. A high quality solder mask withstanding the high thermal stress during the soldering process while maintaining excellent physical properties is produced.

First claim

Opening claim text (preview).

The invention claimed is: 1. A radiation curable solder mask inkjet ink comprising: a polymerizable compound; an adhesion promoter; and a phenolic compound including at least two phenolic groups; wherein the adhesion promoter has a chemical structure according to Formula I, or a salt thereof: wherein n is 0 or 1; R 1 is selected from the group consisting of a hydrogen atom, a substituted or unsubstituted alkyl group, and a substituted or unsubstituted aryl group; L 1 represents a divalent linking group including 20 carbon atoms or less in which L 1 is linked to carboxylic acid via an aliphatic carbon atom; X represents O or NR 4 ; R 4 is selected from the group consisting of a hydrogen atom, a substituted or unsubstituted alkyl group, a substituted or unsubstituted alkenyl group, a substituted or unsubstituted alkynyl group, a substituted or unsubstituted alkaryl group, a substituted or unsubstituted aralkyl group, and a substituted or unsubstituted (hetero)aryl group; R 4 and L 1 may represent atoms that form a 5 to 8 membered ring; R 2 and R 3 are independently selected from the group consisting of hydrogen, a substituted or unsubstituted alkyl group, a substituted or unsubstituted aryl group, and a substituted or unsubstituted heteroaryl group. 2. The radiation curable solder mask inkjet ink according to claim 1 , wherein R 1 is a hydrogen atom or a methyl group. 3. The radiation curable solder mask inkjet ink according to claim 1 , wherein X is an oxygen atom or NH. 4. The radiation curable solder mask inkjet ink according to claim 1 , wherein L 1 represents a substituted or unsubstituted alkylene group. 5. The radiation curable solder mask inkjet ink according to claim 1 , wherein the phenolic compound has a structure according to Formula II: wherein R 5 and R 6 are independently selected from the group consisting of a hydrogen atom, a substituted or unsubstituted alkyl group, a hydroxyl group, and a substituted or unsubstituted alkoxy group; Y is selected from the group consisting of CR 7 R 8 , SO 2 , SO, S, O, and CO; R 7 and R 8 are independently selected from the group consisting of a hydrogen atom, a substituted or unsubstituted alkyl group, a substituted or unsubstituted alkenyl group, a substituted or unsubstituted alkynyl group, a substituted or unsubstituted alkaryl group, a substituted or unsubstituted aralkyl group, and a substituted or unsubstituted (hetero)aryl group; and R 7 and R 8 may represent atoms that form a 5 to 8 membered ring. 6. The radiation curable solder mask inkjet ink according to claim 5 , wherein Y is CR 7 R 8 or SO 2 , and R 7 and R 8 represent a hydrogen atom or an alkyl group. 7. The radiation curable solder mask inkjet ink according to claim 1 , wherein the phenolic compound is a phenolic resin or a hydroxystyrene based resin. 8. The radiation curable solder mask inkjet ink according to claim 1 , wherein an amount of the adhesion promoter is between 0.5 and 20 wt % relative to a total weight of the inkjet ink. 9. The radiation curable solder mask inkjet ink according to claim 1 , wherein an amount of the phenolic compound is between 0.5 and 20 wt % relative to a total weight of the inkjet ink. 10. The radiation curable solder mask inkjet ink according to claim 1 , wherein the polymerizable compound is selected from the group consisting of neopentyl glycol hydroxypivalate diacrylate, isobornyl acrylate, dipropylene glycol diacrylate, trimethylol propane triacrylate, and 2-(vinylethoxy)ethyl acrylate. 11. The radiation curable solder mask inkjet ink according to claim 1 , further comprising a cyan pigment, a yellow pigment, or a green pigment. 12. A method of manufacturing an electronic device, the method comprising: jetting a radiation curable solder mask inkjet ink as defined in claim 1 onto a dielectric substrate including an electrically conductive pattern; and curing the jetted solder mask inkjet ink. 13. The method according to claim 12 , wherein the step of curing is performed using UV radiation. 14. The method according to claim 12 , further comprising: heating the jetted solder mask inkjet ink. 15. The method according to claim 12 , wherein the electronic device is a printed circuit board.

Assignees

Inventors

Classifications

  • Pigment inks · CPC title

  • characterised by the pigment · CPC title

  • Inkjet printing, e.g. for printing insulating material or resist · CPC title

  • Dispersed materials, e.g. conductive pastes or inks · CPC title

  • Photosensitive compositions · CPC title

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Frequently asked questions

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What does patent US11098215B2 cover?
An inkjet method for producing a solder mask in the manufacture of a Printed Circuit Board uses a solder mask inkjet ink containing a polymerizable adhesion promoter and a phenolic compound including at least two phenolic groups. A high quality solder mask withstanding the high thermal stress during the soldering process while maintaining excellent physical properties is produced.
Who is the assignee on this patent?
Agfa Gevaert Nv, Electra Polymer Ltd, Agfa Gevaert
What technology area does this patent fall under?
Primary CPC classification C09D11/38. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Aug 24 2021 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).