Exhaust system and exhaust method

Patent metadata

Field	Value
Publication number	US-11090619-B2
Application number	US-202017061899-A
Country	US
Kind code	B2
Filing date	Oct 2, 2020
Priority date	Oct 10, 2019
Publication date	Aug 17, 2021
Grant date	Aug 17, 2021

Abstract

An exhaust system capable of diluting a hydrogen gas to a concentration below the lower explosive limit without requiring a large amount of dilution gas while preventing an increase in a pressure of an exhaust gas in a buffer tank is disclosed. The exhaust system performs, when a main valve disposed in an exhaust line is closed, an initial exhaust operation in which a gas heavier than the hydrogen gas is discharged from a lower part of a buffer tank while an inlet valve disposed in an inlet line and a first outlet valve disposed in an outlet line are opened to introduce the exhaust gas from an equipment in a tangential direction of a buffer tank. Next, the exhaust system performs a hydrogen-gas discharge operation in which the inlet valve and the first outlet valve are closed, and the a bypass valve disposed in a bypass line and the second outlet valve disposed in a hydrogen-gas discharge line are opened to discharge the hydrogen gas stayed in an upper part of the buffer tank while flowing the exhaust gas into a bypass line.

First claim

What is claimed is:

1. An exhaust system connected to an exhaust line in which an exhaust gas containing a hydrogen gas is flown, comprising:
an inlet line which is branched from the exhaust line, and in which an inlet valve is disposed;
a buffer tank which is coupled to the inlet line and has a cylindrical-shaped portion;
an outlet line which is coupled to a lower part of the buffer tank and in which a first outlet valve is disposed;
a bypass line which couples the inlet line to the outlet line and in which a bypass valve is disposed;
a hydrogen-gas discharge line which extends from an upper part of the buffer tank to the bypass line or the outlet line and in which a second outlet valve is disposed;
a purge line for supplying a purge gas into the buffer tank;
a dilution gas line which is coupled to the outlet line and in which a dilution-gas introduction valve is disposed; and
a controller for controlling operations of the inlet valve, the first outlet valve, the second outlet valve, and the dilution-gas introduction valve,
wherein the inlet line is coupled to an upper part of the cylindrical-shaped portion so as to introduce the exhaust gas toward a tangential direction of the buffer tank,
the controller is configured to
perform, when a main valve disposed in the exhaust line is closed, an initial exhaust operation which opens at least the inlet valve and the first outlet valve, and
perform, after performing the initial exhaust operation for a predetermined time, a hydrogen-gas discharge operation which closes the inlet valve and the first outlet valve, and opens the bypass valve, the second outlet valve, and the dilution-gas introduction valve.

2. The exhaust system according to claim 1 , wherein a guide plate extending in a spiral form is disposed in an inner peripheral surface of the buffer tank.

3. The exhaust system according to claim 1 , wherein the cylindrical-shaped portion of the buffer tank is formed as a truncated cone shape having a diameter which gradually increases from a top end toward a bottom end thereof.

4. The exhaust system according to claim 1 , wherein the controller further opens the dilution-gas introduction valve during the initial exhaust operation.

5. The exhaust system according to claim 1 , wherein the exhaust gas is an exhaust gas discharged from EUV exposure equipment.

6. A method of diluting and discharging hydrogen gas, contained in an exhaust gas flowing in an exhaust line in which a main valve is disposed, to a concentration below a lower explosive limit, comprising:
performing, when the main valve is closed, an initial exhaust operation in which a gas heavier than the hydrogen gas contained in the exhaust gas is discharged from a lower part of a buffer tank while the exhaust gas flowing in the exhaust line is introduced in a tangential direction of the buffer tank to form a swirling flow of the exhaust gas in the buffer tank; and
performing, after performing the initial exhaust operation for a predetermined time, a hydrogen-gas exhaust operation in which the hydrogen gas is discharged from an upper part of the buffer tank in accordance with a flow rate of purge gas supplied to the buffer tank through a purge gas line.

7. The method according to claim 6 , wherein the initial exhaust operation is an operation in which an inlet valve disposed in an inlet line that is branched from the exhaust line, and the first outlet valve disposed in an outlet line that is coupled to a lower part of the buffer tank are opened, and
the hydrogen-gas exhaust operation is an operation in which the inlet valve and the first outlet valve are closed, and a bypass valve disposed in a bypass line that couples the inlet line to the outlet line, a second outlet valve disposed in a hydrogen-gas discharge line that extends from an upper part of the buffer tank to the bypass line or the outlet line, and a dilution-gas introduction valve disposed in a dilution-gas line which is coupled to the outlet line are opened.

8. The method according to claim 7 , wherein the dilution-gas introduction valve is further opened during the initial exhaust operation.

9. The method according to claim 6 , wherein the exhaust gas is an exhaust gas discharged from EUV exposure equipment.

Assignees

• Ebara Corp

Inventors

• Matsushima Keisuke
• Miyazaki Kazutomo

Classifications

• H05G2/0092

  Housing of the apparatus for producing X-rays; Environment inside the housing · CPC title

• B01F23/19 Primary

  Mixing systems, i.e. flow charts or diagrams; Arrangements, e.g. comprising controlling means · CPC title

• H01M8/0662

  Treatment of gaseous reactants or gaseous residues, e.g. cleaning · CPC title

• Y02T10/12

  Improving ICE efficiencies · CPC title

• G05D11/02

  Controlling ratio of two or more flows of fluid or fluent material · CPC title