Substrate processing apparatus and substrate processing method
US-12532690-B2 · Jan 20, 2026 · US
Controlling ratio of two or more flows of fluid or fluent material
Controlling ratio of two or more flows of fluid or fluent material · Cooperative Patent Classification (CPC)
Computing, optics, measurement, and control technologies.
Related technology areas
Mapped technology topics for this CPC code.
| Metric | Value |
|---|---|
| CPC code | G05D11/02 |
| Official title | Controlling ratio of two or more flows of fluid or fluent material |
| Display label | Controlling ratio of two or more flows of fluid or fluent material |
| Total patents | 51 |
Filing trend
Year-over-year patent counts classified under this CPC code.
Filing activity over the last five years is growing.
| Year | Patents |
|---|---|
| 2015 | 5 |
| 2016 | 5 |
| 2017 | 2 |
| 2018 | 5 |
| 2019 | 4 |
| 2020 | 3 |
| 2021 | 6 |
| 2022 | 2 |
| 2023 | 4 |
| 2024 | 6 |
| 2025 | 8 |
| 2026 | 1 |
Representative patents
Representative publications under this CPC code from precomputed stats, or recent filings when stats are unavailable.
Substrate processing apparatus and substrate processing method
US-2025308946-A1 · Oct 2, 2025 · US
Substrate processing apparatus and substrate processing method
US-12424459-B2 · Sep 23, 2025 · US
Substrate processing apparatus and substrate processing method
US-12400882-B2 · Aug 26, 2025 · US
Composition mixture control of efem environment
US-2025093890-A1 · Mar 20, 2025 · US
Substrate processing device and substrate processing method
US-2025069897-A1 · Feb 27, 2025 · US
Device for distributing fertilizer
US-2025031607-A1 · Jan 30, 2025 · US
Dosing Process With Alternating Supply, and Associated Devices
US-2025033079-A1 · Jan 30, 2025 · US
Flow rate adjustment method in substrate processing apparatus and substrate processing apparatus
US-2025025908-A1 · Jan 23, 2025 · US
Dosing unit for generating a mixed gas
US-2024218985-A1 · Jul 4, 2024 · US
Apparatus and Method for Monitoring Inerting
US-2024125750-A1 · Apr 18, 2024 · US
Titanium diboride coated refractory metal component
US-2024117488-A1 · Apr 11, 2024 · US
Fluid vapor mixing and delivery system
US-2024091823-A1 · Mar 21, 2024 · US
Variable orifice proportioner
US-11934208-B2 · Mar 19, 2024 · US
Substrate processing apparatus and substrate processing method
US-2024021445-A1 · Jan 18, 2024 · US
Substrate processing apparatus and substrate processing method
US-2023307258-A1 · Sep 28, 2023 · US
Lean blowout precursor detection for gas turbines
US-11713725-B2 · Aug 1, 2023 · US
Variable orifice proportioner
US-2023168698-A1 · Jun 1, 2023 · US
Concentration control apparatus, source consumption quantity estimation method, and program recording medium on which a program for a concentration control apparatus is recorded
US-11631596-B2 · Apr 18, 2023 · US
Substrate processing apparatus and substrate processing method
US-2022375768-A1 · Nov 24, 2022 · US
Frequently asked questions
Answers are generated from the same data shown on this page.
- What is CPC G05D11/02?
- CPC G05D11/02 is the Cooperative Patent Classification code for “Controlling ratio of two or more flows of fluid or fluent material.”
- How many patents are filed under CPC G05D11/02 (Controlling ratio of two or more flows of fluid or fluent material)?
- Our database includes 51 publications tagged with this CPC code.
- Is patent activity under CPC G05D11/02 growing?
- Publication counts under this code: 6 in 2024 vs 8 in 2025 (latest complete years).