Quartz component with protective coating

Patent metadata

Field	Value
Publication number	US-11087961-B2
Application number	US-201815910739-A
Country	US
Kind code	B2
Filing date	Mar 2, 2018
Priority date	Mar 2, 2018
Publication date	Aug 10, 2021
Grant date	Aug 10, 2021

Abstract

A quartz structure includes a protective layer comprising yttrium oxide. The quartz structure may be fabricated by: (a) receiving a quartz structure; and (b) coating the quartz structure with a protective layer comprising yttrium oxide to form a part to be used in the plasma reactor. The part has a size and shape adapted for forming a window or injector in a plasma reactor. The protective layer does not substantially change the size or shape of the quartz structure. The part may be installed in the plasma reactor at a location where, during operation, a plasma will contact or be proximate to the part.

First claim

What is claimed is:

1. A quartz component comprising:
a) a quartz structure having a size and shape adapted for use as a component of a plasma reactor; and
b) a protective layer comprising yttrium oxide disposed on at least one surface of the quartz structure that, when installed, is exposed to plasma generated in the plasma reactor during operation,
wherein the protective layer does not substantially change the size or shape of the quartz structure and the protective layer continuously and conformally coats the at least one surface of the quart structure, wherein the protective layer has a thickness of between about 10 nm and 10 μm, and wherein the thickness is an average thickness over the at least one surface of the quartz structure.

2. The quartz component of claim 1 , wherein the quartz component has a size and shape to serve as a window between a plasma source located exterior to the plasma reactor and an interior region of the plasma reactor.

3. The quartz component of claim 1 , wherein the quartz component is a quartz window configured to be disposed in the plasma reactor at a position permitting radio frequency or microwave power from a radio frequency or microwave source to pass through the quartz window into an interior region of the plasma reactor.

4. The quartz component of claim 3 , wherein the quartz window has a thickness of between about 1 cm and 3 cm.

5. The quartz component of claim 3 , wherein the quartz window is substantially flat and has a diameter or length that is between about 40 cm and 100 cm.

6. The quartz component of claim 1 , wherein the quartz component is a quartz injector comprising one or more flow passages for introducing gas into an interior region of the plasma reactor and/or removing the gas from the interior region of the plasma reactor.

7. The quartz component of claim 1 , wherein the quartz component is a hollow dome.

8. The quartz component of claim 1 , wherein the quartz component has a surface roughness, R a , of between about 0.01 μm and 2 μm, wherein the surface roughness is an average surface roughness over a surface of the quartz component.

9. The quartz component of claim 1 , wherein the protective layer has, on average, a porosity of less than about 1%.

10. The quartz component of claim 1 , wherein the protective layer comprises yttrium oxide crystallites having, on average, a largest cross-sectional dimension of between about 10 nm and 100 nm.

11. The quartz component of claim 1 , wherein the protective layer comprises at least about 90% by mass yttrium oxide.

12. The quartz component of claim 1 , wherein the protective layer comprises at least about 99% by mass yttrium oxide.

13. The quartz component of claim 1 , wherein the protective layer has a thickness of between about 10 nm and 10 μm and a surface roughness R a of between about 0.03 μm and 0.3 μm, wherein the thickness is an average thickness over a surface of the quartz component.

14. A plasma reactor comprising:
a substrate support configured to hold a substrate during a plasma processing operation;
a plasma source configured to provide power to an interior region of the plasma reactor where, during operation, a plasma is formed;
a quartz component comprising:
a) a quartz structure having a size and shape adapted for use as a component of the plasma reactor; and
b) a protective layer comprising yttrium oxide disposed on at least one surface of the quartz structure that, when installed, is exposed to the plasma when formed in the plasma reactor, wherein the protective layer does not substantially change the size or shape of the quartz structure and the protective layer continuously and conformally coats the at least one surface of the quart structure, wherein the protective layer has a thickness of between about 10 nm and 10 μm, wherein the thickness is an average thickness over the at least one surface of the quartz structure; and

a controller comprising program instructions for causing the plasma source to provide radio frequency or microwave power to the interior region of the plasma reactor.

15. The plasma reactor of claim 14 , wherein the quartz component in the plasma reactor is disposed at a location where, during operation, the plasma will contact or be proximate to the quartz component.

16. The plasma reactor of claim 15 , wherein the plasma is a hydrogen-containing plasma.

17. The plasma reactor of claim 14 , wherein the plasma reactor is an etching tool, an ashing tool, and/or a deposition tool.

18. The plasma reactor of claim 14 , wherein the plasma source comprises coils.

19. The plasma reactor of claim 14 , wherein the plasma source comprises a radio frequency generator.

20. The plasma reactor of claim 14 , wherein the plasma source comprises a microwave generator.

21. The plasma reactor of claim 14 , wherein the quartz component has a size and shape to serve as a window between the plasma source and the interior region of the plasma reactor.

22. The plasma reactor of claim 14 , wherein the quartz component is a quartz window configured to be disposed in the plasma reactor at a position permitting the radio frequency or microwave power from a radio frequency or microwave source to pass through the quartz window into the interior region of the plasma reactor.

23. The plasma reactor of claim 22 , wherein the quartz window has a thickness of between about 1 cm and 3 cm.

24. The plasma reactor of claim 22 , wherein the quartz window is substantially flat and has a diameter or length that is between about 40 cm and 100 cm.

25. The plasma reactor of claim 14 , wherein the quartz component is a quartz injector comprising one or more flow passages for introducing gas into the interior region of the plasma reactor and/or removing the gas from the interior region of the plasma reactor.

26. The plasma reactor of claim 14 , wherein the quartz component is a hollow dome.

27. The plasma reactor of claim 14 , wherein the quartz component has a surface roughness, R a , of between about 0.01 μm and 2 μm, wherein the surface roughness is an average surface roughness over a surface of the quartz component.

28. The plasma reactor of claim 14 , wherein the protective layer has, on average, a porosity of less than about 1%.

29. The plasma reactor of claim 14 , wherein the protective layer comprises yttrium oxide crystallites having, on average, a largest cross-sectional dimension of between about 10 nm and 100 nm.

30. The plasma reactor of claim 14 , wherein the protective layer comprises at least about 90% by mass yttrium oxide.

31. The plasma reactor of claim 14 , wherein the protective layer comprises at least about 99% by mass yttrium oxide.

Assignees

• Lam Res Corp

Inventors

• Xu Lin
• KOSHY Robin
• Daugherty John E
• Srinivasan Satish
• Wetzel David

Classifications

• H10P72/10

  using carriers specially adapted therefor, e.g. front opening unified pods [FOUP] · CPC title

• H01J37/32798 Primary

  Further details of plasma apparatus not provided for in groups H01J37/3244 - H01J37/32788; special provisions for cleaning or maintenance of the apparatus · CPC title

• H01J37/32495 Primary

  Means for protecting the vessel against plasma · CPC title

• H01J37/32715

  Workpiece holder · CPC title

• C23C16/40

  Oxides · CPC title