Patterned stamp manufacturing method, patterned stamp and imprinting method

Patent metadata

Field	Value
Publication number	US-11086217-B2
Application number	US-201515538354-A
Country	US
Kind code	B2
Filing date	Dec 9, 2015
Priority date	Dec 22, 2014
Publication date	Aug 10, 2021
Grant date	Aug 10, 2021

Abstract

A method of manufacturing a patterned stamp (100) for patterning a contoured surface (10) is disclosed. The method comprises applying a layer (115) of a pliable material precursor over a master (50) carrying an inverse pattern (52) to form a desired pattern (112) in said layer; curing the pliable material precursor to form a pliable stamp layer (120) comprising said desired pattern; providing an intermediate stamp structure by adhering a porous pliable support layer (130) to the pliable stamp layer; releasing the intermediate stamp structure from the master; forcing the intermediate stamp structure onto the contoured surface with said pattern of features facing the contoured surface; forming the patterned stamp by filling the porous pliable support layer with a filler material to reduce the pliability of the support layer; and removing the patterned stamp from the contoured surface. A corresponding patterned stamp, imprinting method and imprinted article are also disclosed.

First claim

The invention claimed is:

1. A printing stamp for imprint lithography, comprising:
a pliable stamp layer, wherein the pliable stamp layer has a contoured surface carrying a relief pattern; and
a support layer,
wherein the support layer is connected to the pliable stamp layer,
wherein the support layer comprises a plurality of pores,
wherein the plurality of pores are filled with a filler material.

2. The imprint stamp of claim 1 , wherein the filler material is a different material than the material of the pliable stamp layer.

3. The imprint stamp of claim 1 , wherein the filler material is the same material as the material of the pliable stamp layer.

4. The imprint stamp of claim 1 , wherein at least one of the pliable stamp layer and the support layer comprises a siloxane based polymer.

5. The imprint stamp of claim 1 ,
wherein the pliable stamp layer has a first Young's modulus,
wherein the support layer has a second Young's modulus,
wherein the first Young's modulus is larger than the second Young's modulus.

6. The imprint stamp of claim 1 ,
wherein the material of the support layer and the filler material have a refractive index,
wherein the refractive index is arranged such that the support layer is at least partially transparent for optical radiation.

Assignees

• Koninklijke Philips Nv

Inventors

• Van Brakel Remco
• Verschuuren Marcus Antonius

Classifications

• H10P76/2041

  Photolithographic processes · CPC title

• G03F7/00 Primary

  Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (using photoresist structures for special production processes, see the relevant places, e.g. B44C, H10P76/00, H05K) · CPC title

• G03F7/0002 Primary

  Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping · CPC title

• G03F7/70241

  Optical aspects of refractive lens systems, i.e. comprising only refractive elements · CPC title

• G03F7/2012

  using liquid photohardening compositions, e.g. for the production of reliefs such as flexographic plates or stamps · CPC title