Apparatuses including a memory array with separate global read and write lines and/or sense amplifier region column select line and related methods
US-10153007-B2 · Dec 11, 2018 · US
US11081192B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-11081192-B2 |
| Application number | US-201916668949-A |
| Country | US |
| Kind code | B2 |
| Filing date | Oct 30, 2019 |
| Priority date | Oct 30, 2019 |
| Publication date | Aug 3, 2021 |
| Grant date | Aug 3, 2021 |
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A non-volatile memory device comprising a memory cell region having a plurality of co-planar memory cell planes arranged in a plane parallel to a semiconductor substrate, with each memory cell plane comprising a plurality of sub-planes disposed adjacent one another along an axis that is parallel to the substrate. Further, each memory cell plane comprises a plurality of sense amplifier regions arranged along the axis in an alternating pattern with the sub-planes such that adjacent to each sub-plane is a sense amplifier region and each sense amplifier region is operable with respect to at least a fraction of the bit lines of the two sub-planes immediately adjacent the sense amplifier region.
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What is claimed is: 1. A memory device, comprising: a semiconductor substrate in which a memory cell region and a peripheral region are defined, the memory cell region comprising a plurality of co-planar memory cell planes arranged in a plane parallel to the semiconductor substrate, wherein each memory cell plane is comprised of: a plurality of sub-planes disposed adjacent one another along an axis parallel to the semiconductor substrate, wherein each sub-plane comprises an (n)-bit programmable memory cell array having an (n)-number of bit lines; a plurality of sense amplifier regions arranged along the axis in an alternating pattern with the plurality of sub-planes such that, adjacent to each sub-plane is a sense amplifier region wherein, apart from the sense amplifier regions positioned at terminating ends of the memory cell plane, each sense amplifier region is operable with respect to at least a fraction of the (n)-number of bit lines of the two sub-planes immediately adjacent to the sense amplifier region; and wherein each bit line only traverses one sub-plane and one sense amplifier region. 2. The memory device according to claim 1 , wherein the memory cell array comprises non-volatile memory cells. 3. The memory device according to claim 1 , further comprising a controller communicating with the memory cell region. 4. The memory device according to claim 1 , wherein the fraction is equal to one half of (n)-number. 5. The memory device according to claim 1 , wherein the memory cell region comprises sixteen memory cell planes, each memory cell plane comprising: eight sub-planes; and nine sense amplifier regions. 6. The memory device according to claim 5 , wherein a bit line length of each bit line is approximately 2 KB. 7. The memory device according to claim 6 , wherein a read latency performance of the memory cell region is one of: one microsecond; or below one microsecond. 8. The memory device according to claim 1 , wherein: each of the sub-planes is equal in length along the axis; each of the sense amplifier regions is equal in length along the axis; and a length of each sub-plane along the axis is greater than a length of each sense amplifier region along the axis. 9. The memory device according to claim 1 , wherein: a length of each bit line traverses its respective sub-plane and sense amplifier region; and the portion of the bit line length that traverses the sub-plane is greater than the portion of the bit line length that traverses the sense amplifier region. 10. A memory device, comprising: a semiconductor substrate in which a memory cell region and a peripheral region are defined, the memory cell region comprising a plurality of co-planar memory cell planes arranged in a plane parallel to the semiconductor substrate, wherein each memory cell plane is comprised of: an (m)-number of sub-planes disposed adjacent one another along an axis parallel to the semiconductor substrate, wherein each sub-plane comprises an (n)-bit programmable memory cell array having an (n)-number of bit lines; an (m+1) number of sense amplifier regions arranged along the axis in an alternating pattern with the sub-planes such that, adjacent to each sub-plane is a sense amplifier region wherein, apart from the sense amplifier regions positioned at terminating ends of the memory cell plane, each sense amplifier region is operable with respect to at least a fraction of the (n)-number of bit lines of the two sub-planes immediately adjacent to the sense amplifier region; and wherein each bit line only traverses one sub-plane and one sense amplifier region. 11. The memory device according to claim 10 , wherein the memory cell array comprises non-volatile memory cells. 12. The memory device according to claim 10 , further comprising a controller communicating with the memory cell region. 13. The memory device according to claim 10 , wherein the fraction is equal to one half of (n)-number. 14. The memory device according to claim 10 , wherein the memory cell region comprises sixteen memory cell planes and (m) equals eight. 15. The memory device according to claim 14 , wherein a bit line length of each bit line is approximately 2 KB. 16. The memory device according to claim 15 , wherein a read latency performance of the memory cell region is one of: one microsecond; or below one microsecond. 17. The memory device according to claim 10 , wherein: each of the sub-planes is equal in length along the axis; each of the sense amplifier regions is equal in length along the axis; and a length of each sub-plane along the axis is greater than a length of each sense amplifier region along the axis. 18. The memory device according to claim 10 , wherein: a length of each bit line traverses its respective sub-plane and sense amplifier region; and the portion of the bit line length that traverses the sub-plane is greater than the portion of the bit line length that traverses the sense amplifier region. 19. A method for reducing the bit line capacitance in a non-volatile memory device, comprising: in a memory device having a semiconductor substrate in which a memory cell region and a peripheral region are defined, partitioning the memory cell region into a plurality of co-planar memory cell planes arranged in a plane parallel to the semiconductor substrate; partitioning each memory cell plane into a plurality of sub-planes disposed adjacent one another along an axis parallel to the semiconductor substrate, wherein each sub-plane comprises an (n)-bit programmable memory cell array having an (n)-number of bit lines; and arranging a plurality of sense amplifier regions along the axis in an alternating pattern with the plurality of sub-planes such that, adjacent to each sub-plane is a sense amplifier region wherein, apart from the sense amplifier regions positioned at terminating ends of the memory cell plane, each sense amplifier region is operable with respect to at least a fraction of the (n)-number of bit lines of the two sub-planes immediately adjacent to the sense amplifier region; and wherein each bit line only traverses one sub-plane and one sense amplifier region. 20. The method according to claim 19 , wherein: a length of each bit line traverses its respective sub-plane and sense amplifier region; and the portion of the bit line length that traverses the sub-plane is greater than the portion of the bit line length that traverses the sense amplifier region.
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