Charged particle source

Patent metadata

Field	Value
Publication number	US-11075053-B2
Application number	US-201916667590-A
Country	US
Kind code	B2
Filing date	Oct 29, 2019
Priority date	Dec 9, 2014
Publication date	Jul 27, 2021
Grant date	Jul 27, 2021

Abstract

This invention provides a charged particle source, which comprises an emitter and means for generating a magnetic field distribution. The magnetic field distribution is minimum, about zero, or preferred zero at the tip of the emitter, and along the optical axis is maximum away from the tip immediately. In a preferred embodiment, the magnetic field distribution is provided by dual magnetic lens which provides an anti-symmetric magnetic field at the tip, such that magnetic field at the tip is zero.

First claim

What is claimed is:

1. A method for providing an electron source for an electron beam inspection tool, comprising:
providing, with an emitter, an electron beam along an optical axis of the electron beam inspection tool;
extracting, with an extraction electrode, the electron beam from a tip of the emitter; and
generating, with a magnetic lens, a magnetic field between the tip of the emitter and the extraction electrode, wherein a strength of the magnetic field increases to a peak point away from the tip of the emitter toward the extraction electrode.

2. The method of claim 1 , wherein the strength of the magnetic field is near or at zero at the tip of the emitter.

3. The method of claim 2 , wherein the strength of the magnetic field increases along the optical axis away from the tip of the emitter until to the peak point.

4. The method of claim 3 , wherein the strength of the magnetic field decreases along the optical axis after the peak point proximate to the extraction electrode.

5. The method of claim 4 , wherein the strength of the magnetic field is near or at zero at the extraction electrode.

6. The method of claim 3 , wherein the tip of the emitter is a portion of the emitter from which a plurality of electrons are emitted to form the electron beam, and the tip of the emitter is on an emitting plane which is perpendicular to the optical axis.

7. The method of claim 6 , wherein the magnetic lens is located on the emitting plane.

8. The method of claim 7 , wherein the magnetic lens comprises a permanent magnet.

9. The method of claim 7 , wherein the magnetic lens comprises an excitation coil.

10. The method of claim 9 , further comprising:
applying an electric current to the excitation coil to generate the magnetic field.

11. An electron source for an electron beam inspection tool, comprising:
an emitter configured to provide an electron beam along an optical axis of the electron beam inspection tool;
an extraction electrode configured to extract the electron beam from a tip of the emitter; and
a magnetic lens configured to generate a magnetic field between the tip of the emitter and the extraction electrode, wherein a strength of the magnetic field increases to a peak point away from the tip of the emitter toward the extraction electrode.

12. The electron source of claim 11 , wherein the strength of the magnetic field is near or at zero at the tip of the emitter.

13. The electron source of claim 12 , wherein the strength of the magnetic field increases along the optical axis away from the tip of the emitter until to the peak point.

14. The electron source of claim 13 , wherein the strength of the magnetic field decreases along the optical axis after the peak point proximate to the extraction electrode.

15. The electron source of claim 14 , wherein the strength of the magnetic field is near or at zero at the extraction electrode.

16. The electron source of claim 13 , wherein the tip of the emitter is a portion of the emitter from which a plurality of electrons are emitted to form the electron beam, and the tip of the emitter is on an emitting plane which is perpendicular to the optical axis.

17. The electron source of claim 16 , wherein the magnetic lens is located on the emitting plane.

18. The electron source of claim 17 , wherein the magnetic lens comprises a permanent magnet.

19. The electron source of claim 17 , wherein the magnetic lens comprises an excitation coil.

20. The electron source of claim 19 , wherein an electric current is applied to the excitation coil to generate the magnetic field.

Assignees

• Asml Netherlands Bv

Inventors

• Li Shuai

Classifications

• H01J37/28 Primary

  with scanning beams {(H01J37/268, H01J37/292, H01J37/2955 take precedence)} · CPC title

• H01J37/065

  Construction of guns or parts thereof (H01J37/067 - H01J37/077 take precedence) · CPC title

• H01J37/063

  Geometrical arrangement of electrodes for beam-forming · CPC title

• H01J2237/2806

  Secondary charged particle · CPC title

• H01J2237/06375

  Arrangement of electrodes · CPC title