Charged particle source

Patent metadata

Field	Value
Publication number	US-10468227-B2
Application number	US-201816042871-A
Country	US
Kind code	B2
Filing date	Jul 23, 2018
Priority date	Dec 9, 2014
Publication date	Nov 5, 2019
Grant date	Nov 5, 2019

Abstract

This invention provides a charged particle source, which comprises an emitter and means of generating a magnetic field distribution. The magnetic field distribution is minimum, about zero, or preferred zero at the tip of the emitter, and along the optical axis is maximum away from the tip immediately. In a preferred embodiment, the magnetic field distribution is provided by dual magnetic lens which provides an anti-symmetric magnetic field at the tip, such that magnetic field at the tip is zero.

First claim

What is claimed is:

1. A method for providing an electron beam from an electron beam inspection tool, comprising:
emitting an electron beam along an optical axis from a tip of an emitter;
generating a first magnetic field with a first magnetic lens located above the tip of the emitter; and
generating a second magnetic field with a second magnetic lens located below the tip of the emitter, wherein, upon the generation of the first magnetic field and the second magnetic field, the first magnetic field and the second magnetic field are superposed to provide a superposed magnetic field distribution to influence the electron beam based on an operation mode of the electron beam inspection tool.

2. The method of claim 1 , wherein the tip of the emitter is a portion of the emitter from which electrons are emitted to form the electron beam.

3. The method of claim 1 , wherein the first magnetic lens is located above an emitting plane of the emitter and wherein the second magnetic lens is located below the emitting plane of the emitter.

4. The method of claim 3 , wherein the first magnetic lens includes a first excitation coil and the second magnetic lens includes a second excitation coil.

5. The method of claim 4 , further comprising:
applying a first excitation current to the first excitation coil; and
applying a second excitation current to the second excitation coil, wherein the first excitation current and the second excitation current are the same in amount but opposite in direction.

6. The method of claim 5 , wherein the superposed magnetic field distribution is anti-symmetric relative to the tip of the emitter.

7. The method of claim 6 , wherein the superposed magnetic field distribution is weakest at the tip of the emitter and strongest between the tip of the emitter and an extraction electrode.

8. The method of claim 7 , wherein the weakest magnetic field distribution at the tip of the emitter is zero.

9. The method of claim 8 , wherein the superposed magnetic field distribution provides a high-resolution operation mode.

10. The method of claim 4 , further comprising:
applying a first excitation current to the first excitation coil; and
applying a second excitation current to the second excitation coil, wherein the first excitation current and the second excitation current are the same in amount and in direction.

11. The method of claim 10 , wherein the superposed magnetic field distribution is symmetric relative to the tip of the emitter in the high throughput mode.

12. The method of claim 11 , wherein the superposed magnetic field distribution is strongest at the tip of the emitter.

13. The method of claim 12 , wherein the superposed magnetic field distribution provides a high-throughput operation mode.

Assignees

• Hermes Microvision Inc

Inventors

• Li Shuai

Classifications

• H01J2237/0653

  Intensity · CPC title

• H01J37/063

  Geometrical arrangement of electrodes for beam-forming · CPC title

• H01J2237/06308

  Thermionic sources · CPC title

• H01J37/143 Primary

  Permanent magnetic lenses · CPC title

• H01J2237/2817

  Pattern inspection · CPC title