Substrate processing apparatus, processing apparatus, and method for manufacturing device

US11073767B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11073767-B2
Application numberUS-202016879142-A
CountryUS
Kind codeB2
Filing dateMay 20, 2020
Priority dateMar 26, 2012
Publication dateJul 27, 2021
Grant dateJul 27, 2021

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A pattern forming apparatus comprising: a rotary drum that includes a cylindrical outer circumferential surface which is curved at a predetermined radius from a predetermined center line, that rotates about the center line in a state in which a part of a sheet substrate is supported in a length direction of the sheet substrate along the outer circumferential surface; a pattern forming part that forms the pattern on the sheet substrate at a first specific position; a scale disk that is fixed to an end portion of the rotary drum in a direction in which the center line extends while being coaxial with the center line and that includes a circular scale; and a first reading mechanism that is arranged to oppose with the scale formed at the outer circumferential surface of the scale disk, that is arranged at substantially same azimuth as an azimuth.

First claim

Opening claim text (preview).

The invention claimed is: 1. A pattern forming apparatus that forms a pattern on a long sheet substrate while a rotary drum transfers the sheet substrate in a length direction of the sheet substrate by rotating about a predetermined center line, the rotary drum being configured to wound a part of the sheet substrate in the length direction around a cylindrical outer circumferential surface thereof which is curved at a constant radius from the predetermined center line, the pattern forming apparatus comprising: a scale portion that includes a scale for an encoder measurement and that is configured to rotate about the center line together with the rotary drum, the scale being formed in a circular shape at a position which is predetermined radius from the center line, a first pattern forming part that forms a pattern on the sheet substrate at a first specific position, the first specific position being a position in a circumferential direction which is within a range in which the sheet substrate is wound around among the outer circumferential surface of the rotary drum, a second pattern forming part that forms a pattern on the sheet substrate at a second specific position, the second specific position being a position which is within a range in which the sheet substrate is wound around among the outer circumferential surface of the rotary drum and which is separated from the first specific position in the circumferential direction for a predetermined angle, and a first encoder head that is arranged at a substantially same azimuth as an intermediate position of the first and second specific positions in the circumferential direction when viewed from the center line so as to oppose with the scale portion in order to measure a rotation angle position of the rotation drum and that reads the scale of the scale portion. 2. The pattern forming apparatus according to claim 1 , provided that the predetermined angle regarding the first and second specific positions in the circumferential direction is 2θ°, wherein an angle from the intermediate position to the first specific position in the circumferential direction is set to −θ° and an angle from the intermediate position to the second specific position in the circumferential direction is set to +θ°. 3. The pattern forming apparatus according to claim 2 , further comprising: a second encoder head that reads the scale while opposing with the scale portion at an azimuth which is rotated substantially 180 degrees in the circumferential direction from the intermediate position, and a third encoder head that reads the scale while opposing with the scale portion at an azimuth which is rotated substantially 90 degrees in the circumferential direction from both of the azimuth of the first encoder head and the azimuth of the second encoder head. 4. The pattern forming apparatus according to claim 3 , provided that a measured value of the scale read by the first encoder head is Me 6 , a measured value of the scale read by the second encoder head is Me 3 and a measured value of the scale read by the third encoder head is Me 4 , wherein a fine movement component ΔXd of the scale portion, which is due to eccentricity to a same direction as the azimuth of the second encoder head, is obtained by a calculation of (Me 6 −Me 3 )/2, and a displacement component DRp, which is due to a rotation of the scale portion, is obtained by a calculation of (Me 6 +Me 3 )/2. 5. The pattern forming apparatus according to claim 4 , wherein a fine movement component ΔZd of the rotary drum, which relates to a direction along a line connecting a reading position of the first encoder head and a reading position of the third encoder head, is obtained by obtaining a difference between the measured value Me 4 and the displacement component ΔRp.

Assignees

Inventors

Classifications

  • G03F7/24Primary

    Curved surfaces {(G03F7/70 takes precedence)} · CPC title

  • Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically (G03F7/22 takes precedence; preparation of photographic masks G03F1/00; within photographic printing apparatus for making copies G03B27/00) · CPC title

  • G03F7/16Primary

    Coating processes; Apparatus therefor (applying coatings to base materials in general B05; applying photosensitive compositions to base for photographic purposes G03C1/74) · CPC title

  • Large workpieces, e.g. glass substrates for flat panel displays or solar panels · CPC title

  • Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load · CPC title

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Frequently asked questions

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What does patent US11073767B2 cover?
A pattern forming apparatus comprising: a rotary drum that includes a cylindrical outer circumferential surface which is curved at a predetermined radius from a predetermined center line, that rotates about the center line in a state in which a part of a sheet substrate is supported in a length direction of the sheet substrate along the outer circumferential surface; a pattern forming part that…
Who is the assignee on this patent?
Nikon Corp
What technology area does this patent fall under?
Primary CPC classification G03F7/24. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Jul 27 2021 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).