Centrifuge tile assembly

US11065628B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11065628-B2
Application numberUS-201816030155-A
CountryUS
Kind codeB2
Filing dateJul 9, 2018
Priority dateJul 9, 2018
Publication dateJul 20, 2021
Grant dateJul 20, 2021

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

Wear resistant centrifuge tile assemblies include a backing portion and a wear-resistant tile. Wear resistant centrifuge tile assemblies are provided with self-fixturing features to provide a desired mounting position and to restrict movement of the wear-resistant tile with respect to the backing plate during bonding. The self-fixturing features provide the ability to perform repeatable and consistent bonding of the wear-resistant tile to the backing plate. The bonding of the wear-resistant tile to the backing plate can be performed with a braze material.

First claim

Opening claim text (preview).

What is claimed is: 1. A centrifuge tile assembly comprising: a backing plate comprising a generally planar top seating face extending from a front edge of the backing plate toward a vertical seating face of a rear mounting shoulder of the backing plate; and a wear-resistant tile comprising a front edge, a distal-most rear seating edge opposite the front edge at a peripheral edge of the wear-resistant tile, first and second sides, a continuous and uninterrupted top surface and a generally planar bottom seating face, wherein the backing plate and the wear-resistant tile define an X-axis parallel with a plane of the generally planar top seating face of the backing plate, parallel with a plane of the generally planar bottom seating face of the wear-resistant tile, and extending parallel to the distal-most rear seating edge of the wear-resistant tile, and a Y-axis parallel with the plane of the generally planar top seating face of the backing plate, parallel with a plane of the generally planar bottom seating face of the wear-resistant tile, and extending normal to the distal-most rear seating edge of the wear-resistant tile, and wherein at least one protrusion extending from the vertical seating face of the backing plate engages at least one opposing recess recessed from the distal-most rear seating edge of the wear-resistant tile to thereby restrict relative movement between the backing plate and the wear-resistant tile in the X-axis direction and the Y-axis direction. 2. The centrifuge tile assembly of claim 1 , wherein the backing plate comprises a retaining groove recessed in the generally planar top seating face, and wherein the wear-resistant tile comprises an alignment tab extending from the generally planar bottom seating face and structured and arranged to be received in the retaining groove of the backing plate. 3. A centrifuge tile assembly comprising: a backing plate comprising a generally planar top seating face extending from a front edge of the backing plate toward a rear mounting shoulder of the backing plate, a retaining groove recessed into and below the generally planar top seating face, and a vertical seating face on the rear mounting shoulder extending from the retaining groove below the generally planar top seating face and normal to the generally planar top seating face of the backing plate; a wear-resistant tile comprising a top surface, a front edge, a rear seating edge, first and second sides and a generally planar bottom seating face, the generally planar bottom seating face comprising at least one alignment tab extending from the generally planar bottom seating face and structured and arranged to be received within the retaining groove of the backing plate; and a first bonding layer between the generally planar top seating face of the backing plate and the generally planar bottom seating face of the wear-resistant tile, and a second bonding layer between the vertical seating face of the backing plate and the rear seating edge of the wear-resistant tile. 4. The centrifuge tile assembly of claim 3 , wherein the backing plate and the wear-resistant tile define an X-axis parallel with a plane of the generally planar top seating face of the backing plate, parallel with a plane of the generally planar bottom seating face of the wear-resistant tile, and extending parallel to the rear seating edge of the wear-resistant tile, and a Y-axis parallel with the plane of the generally planar top seating face of the backing plate, parallel with a plane of the generally planar bottom seating face of the wear-resistant tile, and extending normal to the rear seating edge of the wear-resistant tile. 5. The centrifuge tile assembly of claim 4 , wherein the backing plate comprises an alignment protrusion extending from the vertical seating face, and wherein the rear seating edge of the wear-resistant tile comprises an alignment notch recessed from the rear seating edge and structured and arranged to receive the alignment protrusion of the backing plate to thereby restrict relative movement between the backing plate and the wear-resistant tile in the X-axis direction and the Y-axis direction. 6. The centrifuge assembly of claim 5 , wherein at least a portion of the alignment notch of the wear-resistant tile is spaced from the alignment protrusion of the backing plate. 7. The centrifuge tile assembly of claim 4 , wherein the at least one alignment tab of the wear-resistant tile is received in the retaining groove of the backing plate to provide a desired orientation between the wear-resistant tile and the backing plate in the Y-axis direction. 8. The centrifuge tile assembly of claim 4 , wherein the backing plate and the wear-resistant tile define a Z-axis normal to the plane of the generally planar top seating face of the backing plate and normal to the plane of the generally planar bottom seating face of the wear-resistant tile, and wherein the generally planar bottom seating face of the wear-resistant tile comprises at least one spacing foot extending from the generally planar bottom seating face in the Z-axis. 9. The centrifuge tile assembly of claim 8 , wherein the at least one spacing foot of the wear-resistant tile contacts the generally planar top seating face of the backing plate to provide a Z-axis braze spacing between the generally planar top seating face of the backing plate and the generally planar bottom seating face of the wear-resistant tile. 10. The centrifuge tile assembly of claim 4 , wherein the wear-resistant tile comprises first and second alignment tabs extending from the generally planar bottom seating face at a Y-axis offset distance from the rear seating edge. 11. The centrifuge tile assembly of claim 3 , wherein the first side of the wear-resistant tile is aligned with a first side of the backing plate and the second side of the wear-resistant tile is aligned with a second side of the backing plate. 12. The centrifuge tile assembly of claim 3 , wherein the at least one alignment tab of the wear-resistant tile is spaced from a bottom surface of the retaining groove of the backing plate. 13. The centrifuge tile assembly of claim 3 , wherein the rear seating edge of the wear-resistant tile is spaced from the vertical seating face of the backing plate to provide a Y-axis braze spacing. 14. The centrifuge tile assembly of claim 3 , wherein the retaining groove of the backing plate extends from a first side of the backing plate to a second side of the backing plate. 15. The centrifuge tile assembly of claim 3 , wherein the backing plate and the wear-resistant tile define a Z-axis normal to the plane of the generally planar top seating face of the backing plate and normal to the plane of the generally planar bottom seating face of the wear-resistant tile, and wherein a Z-axis distance between the generally planar bottom seating face of the wear-resistant tile and the retaining groove of the backing plate forms a braze reservoir. 16. The centrifuge tile assembly of claim 3 , wherein the first and second bonding layers have a thickness of at least 0.0025 inches. 17. The centrifuge tile assembly of claim 3 , wherein the first and second bonding layers are formed by a braze material. 18. The centrifuge tile assembly of claim 17 , wherein the braze material is provided as a braze shim comprising at least one edge recess structured and arranged to receive the at least one alignment tab of the wear-resistant tile, and at least one thru-hole structured and arranged to receive at least one spacing foot of the wear-resistant tile. 19. The c

Assignees

Inventors

Classifications

  • B04B1/2008Primary

    with an abrasion-resistant conveyor or drum · CPC title

  • B04B7/12Primary

    Inserts, e.g. armouring plates · CPC title

  • B04B7/00Primary

    Elements of centrifuges (drives B04B9/00; feeding, charging, or discharging appurtenances or devices B04B11/00) · CPC title

  • Feeding, charging, or discharging bowls (B04B1/00, B04B3/00, B04B7/04 take precedence) · CPC title

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Frequently asked questions

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What does patent US11065628B2 cover?
Wear resistant centrifuge tile assemblies include a backing portion and a wear-resistant tile. Wear resistant centrifuge tile assemblies are provided with self-fixturing features to provide a desired mounting position and to restrict movement of the wear-resistant tile with respect to the backing plate during bonding. The self-fixturing features provide the ability to perform repeatable and con…
Who is the assignee on this patent?
Kennametal Inc
What technology area does this patent fall under?
Primary CPC classification B04B1/2008. Mapped technology areas include Operations & Transport.
When was this patent published?
Publication date Tue Jul 20 2021 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 4 related publications on this page (citations in our corpus or others sharing the same primary CPC).