Sintered non-porous cathode and sputter ion vacuum pump containing the same

Patent metadata

Field	Value
Publication number	US-11056326-B2
Application number	US-201716068803-A
Country	US
Kind code	B2
Filing date	Feb 15, 2017
Priority date	Feb 19, 2016
Publication date	Jul 6, 2021
Grant date	Jul 6, 2021

Abstract

The present invention relates to cathodes electrodes compositions suitable to provide a pumping mechanism which exhibits an extremely high pumping speed and capacity of noble gas suitable to be used in several vacuum devices as for example sputter ion vacuum pumping systems comprising them as active element.

First claim

The invention claimed is:

1. A cathode comprising:
a molded sintered bulk mixture of a powder of a first metal M1;
a powder of a second metal M2, which is different from M1; and
optionally, a powder of one or more metallic elements, which are different from M1 and M2;
wherein
the powders M1, M2 and one or more metallic elements different from M1 and M2 are homogeneously distributed in the sintered bulk mixture,
the molded sintered bulk mixture is nonporous,
a content of the one or more metallic elements is less than 3 atonic %, based on a total number of atoms Q of the sintered bulk mixture,
wherein M1 and M2 are each independently selected from a group consisting of titanium (Ti), tantalum (Ta), zirconium (Zr), niobium (Nb), hafnium (Hf), a rare earth metal, nickel (Ni), and molybdenum (Mo), and
wherein M1 and M2 have a mean atomic mass W in a range of 80 to 160 amu according to the formula
W=W 1* q 1+ W 2* q 2

wherein M1 has an atomic mass W1 in an amount q1 expressed as an atomic percent of the total number of atoms Q of the sintered bulk mixture and M2 has atomic mass W2 in an amount q2 expressed as an atomic percent of the total number of atoms Q.

2. The cathode of claim 1 , wherein W is in a range of 100 to 160 amu.

3. The cathode of claim 2 , wherein M1 and M2 are Ta and Ti respectively and a ratio of Ta/Ti is 50 parts Ta to 50 parts Ti.

4. The cathode of claim 2 , wherein M1 and M2 are Ta and Zr respectively and a ratio of Ta/Zr is 35 parts Ta to 65 parts Zr.

5. A sputter-ion pump system comprising as active pumping elements at least two of the non-porous cathodes of claim 4 .

6. The cathode of claim 2 , wherein M1 and M2 are Ta and Zr respectively and a ratio of Ta/Zr is 50 parts Ta to 50 parts Zr.

7. A sputter-ion pump system comprising as active pumping elements at least two of the non-porous cathodes of claim 2 .

8. The cathode of claim 1 , wherein the one or more metallic elements, which are each different from M1 and M2, are each independently selected from the group consisting of aluminum, copper, titanium, tantalum, zirconium, niobium, molybdenum, nickel, a rare earth metal, hafnium, iron, cobalt, and vanadium.

9. A sputter-ion pump system comprising as active pumping elements at least two of the non-porous cathodes of claim 8 .

10. The cathode of claim 1 , wherein M1 and M2 are each independently selected from the group consisting of titanium, tantalum, and zirconium.

11. A sputter-ion pump system comprising as active pumping elements at least two of the non-porous cathodes of claim 10 .

12. A sputter-ion pump system comprising as active pumping elements at least two of the non-porous cathodes of claim 1 .

13. The cathode of claim 1 , wherein M1 and M2 are Ta and Ti respectively and a ratio of Ta/Ti is 35 parts Ta to 65 parts Ti.

14. A sputter-ion pump system comprising as active pumping elements at least two of the non-porous cathodes of claim 13 .

15. The cathode of claim 1 , wherein M1 and M2 are Ta and Ti respectively and a ratio of Tall is 50 parts Ta to 50 parts Ti.

16. A sputter-ion pump system comprising as active pumping elements at least two of the non-porous cathodes of claim 15 .

17. The cathode of claim 1 , wherein M1 and M2 are Ta and Zr respectively and a ratio of Ta/Zr is 35 parts Ta to 65 parts Zr.

18. A sputter-ion pump system comprising as active pumping elements at least two of the non-porous cathodes of claim 17 .

19. The cathode of claim 1 , wherein M1 and M2 are Ta and Zr respectively and a ratio of Ta/Zr is 50 parts Ta to 50 parts Zr.

20. A sputter-ion pump system comprising as active pumping elements at least two of the non-porous cathodes of claim 19 .

Assignees

• Getters Spa

Inventors

• Porcelli Tommaso
• Siviero Fabrizio
• Gallitognotta Alessandro

Classifications

• F04B37/04

  Selection of specific absorption or adsorption materials · CPC title

• F05D2300/133

  Titanium · CPC title

• H01J41/20 Primary

  using gettering substances · CPC title

• C23C14/165

  by cathodic sputtering · CPC title

• F05D2300/134

  Zirconium · CPC title