Random copolymer, laminate, and method for forming pattern

US11054747B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11054747-B2
Application numberUS-201816106512-A
CountryUS
Kind codeB2
Filing dateAug 21, 2018
Priority dateAug 22, 2017
Publication dateJul 6, 2021
Grant dateJul 6, 2021

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  1. Title

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  2. Abstract

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  5. First independent claim

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Abstract

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Provided are a random copolymer for forming a neutral layer promoting directed self-assembly pattern formation, a laminate for forming a pattern including the same, and a method for forming a high-quality pattern using the same.

First claim

Opening claim text (preview).

What is claimed is: 1. A laminate for forming a pattern, comprising: a substrate, and a neutral layer formed on the substrate and including a random copolymer comprising structural units represented by the following Chemical Formulae 1 to 3: wherein: R 1 to R 8 are independently of one another hydrogen, halogen or a C 1 to C 10 hydrocarbyl group, L 1 and L 2 are a linking group, and independently of each other a direct bond, —C(═O)—O— or a C 1 to C 20 hydrocarbylene group, R 9 and R 10 are independently of each other hydrogen, halogen, a C 1 to C 10 hydrocarbyl group, and at least one of R 9 and R 10 is L 3 is a C 1 to C 10 hydrocarbylene group, R 11 and R 12 are independently of each other a C 1 to C 10 hydrocarbyl group, a C 1 to C 10 halocarbyl group or a halo-substituted C 1 to C 10 hydrocarbyl group, and when mole fractions of Chemical Formulae 1 to 3 which are each randomly arranged structural units are defined as m, n and l, respectively in this order, m, n and l satisfy 0.2<m<0.9, 0.2<n<0.9, and 0<l<0.4, respectively, based on total mole fractions of the structural units. 2. The laminate of claim 1 , wherein the neutral layer has a thickness variation value due to washing, satisfying the following Equation 1: | T 0 - T 1 T 0 | < 0.30 [ Equation ⁢ ⁢ 1 ] wherein T 0 is a thickness of the neutral layer before washing, and T 1 is a thickness of the neutral layer after washing. 3. The laminate of claim 1 , wherein in Chemical Formulae 1 to 3, R 1 to R 8 are independently of one another hydrogen, halogen or a C 1 to C 10 alkyl group, L 1 and L 2 are a linking group, and independently of each other a direct bond, —C(═O)—O—, a C 1 to C 10 alkylene group or a C 6 to C 20 arylene group, R 9 and R 10 are independently of each other hydrogen, halogen, a C 1 to C 10 alkyl group, and at least one of R 9 and R 10 is L 3 is a C 1 to C 10 alkylene group, and R 11 and R 12 are independently of each other a C 1 to C 10 alkyl group, a halo-substituted C 1 to C 10 alkyl group, or a C 1 to C 10 haloalkyl group. 4. The laminate of claim 1 , wherein in Chemical Formula 3, L 1 is a direct bond as the linking group, and L 2 is —C(═O)—O— as the linking group, R 9 is hydrogen or a C 1 to C 10 alkyl group, R 10 is and L 3 is a C 1 to C 10 alkylene group, and R 12 is a C 1 to C 10 alkyl group, a halo-substituted C 1 to C 10 alkyl group or C 1 to C 10 haloalkyl group. 5. The laminate of claim 1 , wherein in Chemical Formula 3, L 1 is a direct bond as the linking group, and L 2 is a C 6 to C 20 arylene group as the linking group, R 9 is hydrogen or a C 1 to C 10 alkyl group, R 10 is and L 3 is a C 1 to C 10 alkylene group, and R 12 is a C 1 to C 10 alkyl group, a halo-substituted C 1 to C 10 alkyl group or a C 1 to C 10 haloalkyl group. 6. The laminate of claim 1 , wherein in Chemical Formulae 1 and 2, R 1 and R 3 are independently of one another hydrogen or a C 1 to C 10 alkyl group, R 2 is a C 1 to C 10 alkyl group, and R 4 to R 8 are independently of one another hydrogen or halogen. 7. The laminate of claim 1 , wherein in Chemical Formula 3, L 1 is a direct bond as the linking group, and L 2 is —C(═O)—O— as the linking group, and R 9 is hydrogen or a C 1 to C 10 alkyl group, R 10 is and L 3 is a C 1 to C 5 alkylene group, and R 12 is a C 1 to C 5 alkyl group, a halo-substituted C 1 to C 5 alkyl group or a C 1 to C 5 haloalkyl group. 8. The laminate of claim 1 , wherein in Chemical Formula 3, L 1 is a direct bond as the linking group, and L 2 is a C 6 to C 15 arylene group as the linking group, R 9 is hydrogen or a C 1 to C 5 alkyl group, R 10 is and L 3 is a C 1 to C 5 alkylene group, R 12 is a C 1 to C 5 alkyl group, a halo-substituted C 1 to C 5 alkyl group or a C 1 to C 5 haloalkyl group. 9. The laminate of claim 1 , wherein in Chemical Formulae 1 and 2, R 1 and R 3 are independently of one another hydrogen or a C 1 to C 5 alkyl group, R 2 is a C 1 to C 5 alkyl group, and R 4 to R 8 are independently of one another hydrogen or halogen. 10. The laminate of claim 1 , wherein the random copolymer includes 0.1 to 20 mol % of a monomer of the structural unit represented by Chemical Formula 3, based on total 100 mol % of the monomers forming the random copolymer. 11. The laminate of claim 1 , wherein the random copolymer has a number average molecular weight of 1,000 to 500,000 g/mol, and a polydispersity index of 1.0 to 2.0. 12. The laminate of claim 1 , further comprising a vertical oriented lamellar phase pattern of a block copolymer formed on the neutral layer.

Assignees

Inventors

Classifications

  • C08F220/14Primary

    Methyl esters {, e.g. methyl (meth)acrylate} · CPC title

  • C08F8/14Primary

    Esterification · CPC title

  • substituted by heteroatoms or groups containing heteroatoms · CPC title

  • G03F7/2037Primary

    Exposure with X-ray radiation or corpuscular radiation, through a mask with a pattern opaque to that radiation · CPC title

  • Fluorine · CPC title

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What does patent US11054747B2 cover?
Provided are a random copolymer for forming a neutral layer promoting directed self-assembly pattern formation, a laminate for forming a pattern including the same, and a method for forming a high-quality pattern using the same.
Who is the assignee on this patent?
Sk Innovation Co Ltd
What technology area does this patent fall under?
Primary CPC classification C08F220/14. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Jul 06 2021 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 2 related publications on this page (citations in our corpus or others sharing the same primary CPC).