Heat-light separation for a UV radiation source

Patent metadata

Field	Value
Publication number	US-11052423-B2
Application number	US-201414902052-A
Country	US
Kind code	B2
Filing date	Jun 30, 2014
Priority date	Jul 3, 2013
Publication date	Jul 6, 2021
Grant date	Jul 6, 2021

Abstract

A device for applying UV radiation to substrates in a field of application. The device includes: a radiation source, which emits both UV radiation and visible light and infrared radiation in a spatial angle; and a radiation-selective deflecting mirror, which mostly reflects the UV radiation and mostly transmits the VIS and IR radiation. The deflecting mirror includes at least two flat mirror strips, which are tilted with respect to each other.

First claim

What is claimed is:

1. Apparatus for exposing substrates to UV radiation within an application-area, whereby the apparatus comprises:
a radiation source which comprises a reflector and emits a diverging direct radiation that comprises UV radiation as well as visible light (“VIS”) and infrared radiation (“IR”) in a spatial angle; and
a radiation selective deflecting mirror which reflects most part of the UV radiation and transmits most part of the VIS & IR radiation,
wherein the deflecting mirror comprises at least two flat mirror strips, each having two longer edges and two shorter edges, wherein each of the at least two flat mirror strips has its own axis parallel to a longer edge of said flat mirror strip, wherein each of the at least two flat mirror strips is configured to rotate around its own axis and relative to each other in such a manner that a combination of the at least two flat mirror strips forms a concave surface and the at least two flat mirror strips reflect the diverging direct radiation from the radiation source in direction to the application-area and thereby at least reduce the divergence and consequently lead to an increase of a surface intensity of the UV radiation in the application-area, and
wherein the apparatus comprises a support including a plurality of fixation elements arranged on the two shorter edges of each of the at least two flat mirror strips, wherein two fixation elements of neighboring mirror strips are linked by a joint, the support being configured to twist an inclination of each of the at least two flat mirror strips at a certain angle range about each respective axis of each of the at least two flat mirror strips.

2. Apparatus according to claim 1 characterized by the fact that the deflecting mirror comprises three flat mirror strips.

3. A method for manufacturing an apparatus for exposing substrates to UV radiation within an application-area, said method comprising the following steps:
providing a radiation source which comprises a reflector and emits a diverging direct radiation that comprises UV radiation as well as visible light (“VIS”) and infrared radiation (“IR”) in a spatial angle;
coating at least one flat glass plate with an interference filter which is based on thin film layer systems, whereby the interference filter, for a predetermined impinging angle, reflects UV radiation and transmits VIS & IR radiation;
dissecting the at least one flat glass plate in strips subsequent to the coating, each strip having two longer edges and two shorter edges, wherein the two longer edges are parallel to an axis;
mounting at least two strips in a mutually inclined manner around the axis and relative to each other on a support, whereby the at least two strips reflect the diverging direct radiation from the radiation source in a direction to the application-area and thereby at least reduce the divergence and consequently lead to an increase of a surface intensity of the UV radiation in the application-area; and
providing a deflecting mirror comprising the at least one flat glass plate and the at least two mutually inclined strips, wherein the deflecting mirror reflects most part of the UV radiation and transmits most part of the VIS & IR radiation.

4. The method according to claim 3 , wherein each of the at least two strips is coated with a different interference filter optimized for a specific angle.

5. The apparatus according to claim 1 characterized by the fact that the deflecting mirror comprises exactly three strips.

6. The apparatus according to claim 5 , wherein the exactly three strips are inclined relative to each other.

7. The apparatus according to claim 5 , wherein the deflecting mirror is concave and the exactly three strips are inclined relative to each other such that the exactly three strips form a concave curvature.

8. The method according to claim 3 , wherein the support is tailored so that each of the at least two mirror strips is oriented at a pre-determined angle relative to a main optical path of the UV radiation.

9. The method according to claim 3 , wherein each of the at least two mirror strips is fixed to the support such that each of the at least two mirror strips is configured to be twisted at a certain angle range about the axis.

10. The method according to claim 3 , wherein each of the at least two mirror strips is fixed to the support via fixation elements provided along shorter edges of the at least two mirror strips.

11. The method according to claim 10 , wherein two outermost strips of the at least two mirror strips are fixed to the support via additional fixation elements fixed to circular arcs.

12. The apparatus according to claim 1 , wherein the deflecting mirror comprises strips of differently coated glass plates.

13. The apparatus according to claim 1 , wherein each of the at least two flat mirror strips comprises a thin film mirror layer with an individual spectral characteristic.

Assignees

• Oerlikon Surface Solutions Ag Trubbach
• Oerlikon Surface Solutions Ag Pfaeffikon

Inventors

• Zuger Othmar

Classifications

• B05D3/062 Primary

  Pretreatment · CPC title

• F26B3/28

  by radiation, e.g. from the sun · CPC title

• B05D3/067 Primary

  Curing or cross-linking the coating · CPC title