Method for producing a chromatography-enrichment column

Patent metadata

Field	Value
Publication number	US-9885692-B2
Application number	US-201314414853-A
Country	US
Kind code	B2
Filing date	Jul 2, 2013
Priority date	Jul 19, 2012
Publication date	Feb 6, 2018
Grant date	Feb 6, 2018

Abstract

The invention concerns a method for producing a chromatography-enrichment column, the method comprising the following steps: (a) depositing at least one layer of desired particles, which may be identical or different, and are intended to constitute the stationary phase, in a compact assembly, on the flat surface of a substrate; (b) crosslinking the layer in at least the regions corresponding to the desired shape of the enrichment column to be obtained; (c) impregnating the layer with a light radiation-sensitive material; (d) insolating the layer obtained in step (c) so as to form insolated regions of which the shape corresponds to the desired internal shape of the enrichment column, if the light radiation-sensitive material behaves like a positive resin or to form non-insolated regions of which the shape corresponds to the desired internal shape of the enrichment column if the light radiation-sensitive material behaves like negative resin; and (e) eliminating the light radiation-sensitive material in the zones corresponding to the internal shape of the enrichment column. The invention is used in particular in the field of chemical analysis.

First claim

The invention claimed is:

1. A process for manufacturing a chromatography enrichment column, characterized in that it comprises the following steps:
a) providing a support comprising a flat outer surface ( 1 ), wherein the support does not comprise a channel,
b) depositing at least one layer ( 2 ) of the desired particles, which can be identical to or different from one another, as a compact assemblage on the flat outer surface of the support ( 1 ),
c) crosslinking the at least one layer in at least the regions corresponding to the desired shape of the column to be obtained,
d) impregnating the layer with a material sensitive to light radiation in order to obtain an impregnated layer,
e) insolating the layer obtained in step d) in order to form insolated regions, the shape of which corresponds to the internal shape of the desired enrichment column, when the material sensitive to light radiation behaves as a positive resin, or in order to form non-insolated regions, the shape of which corresponds to the internal shape desired for the enrichment column, when the material sensitive to light radiation behaves as a negative resin, and
f) removing the material sensitive to light radiation in the region of the layer which corresponds to the internal shape desired for the enrichment column, to thereby provide the chromatography enrichment column.

2. The process as claimed in claim 1 , characterized in that step c) is carried out after step d) and in that the particles of the layer ( 2 ) have a functional group which is photocrosslinkable at a wavelength λ 1 and the material sensitive to light radiation ( 6 ) is a material sensitive to light radiation having a wavelength λ 2 identical to or different from the wavelength λ 1 .

3. The process as claimed in claim 1 , characterized in that it additionally comprises, before step b), a step of activation of said surface of the substrate ( 1 ) by O2 plasma, UV radiation, a mixture of sulfuric acid and of hydrogen peroxide, or ozone.

4. The process as claimed in claim 1 , characterized in that said particles have a mean diameter is from 50 nm to 500 μm inclusive.

5. The process as claimed in claim 1 , characterized in that the thickness of the layer ( 2 ) or the total thickness of the layers ( 2 ) is from 50 to 700 μm inclusive.

6. The process as claimed in claim 1 , characterized in that the particles are particles made of a metal oxide, of a metal, of a polysaccharide, of a ceramic or a mixture of these.

7. The process as claimed in claim 1 , characterized in that step a) is carried out by the Langmuir-Blodgett method, or by the Langmuir-Schaefer method, or by Marangoni self-assembling, or by the vortical surface method, or by floating-transferring, or by dip coating, or by spin coating.

8. The process as claimed in claim 1 , characterized in that the photosensitive material behaves as a positive resin sensitive to radiation with a wavelength λ 2 of from 150 to 700 nm inclusive.

9. The process as claimed in claim 1 , characterized in that the photosensitive material behaves as a negative resin sensitive to radiation with a wavelength λ 2 of from 150 to 700 nm inclusive.

10. The process as claimed in claim 1 , characterized in that the photosensitive material is obtained by a sol-gel process.

11. The process as claimed in claim 2 , characterized in that the particles are functionalized with a functional group sensitive to light radiation with a wavelength λ 1 of from 150 to 700 nm inclusive.

12. The process as claimed in claim 1 , characterized in that step d) of impregnation of the layer ( 2 ) is carried out by spin deposition of the material sensitive to light radiation ( 6 ) on the layer ( 2 ) or by immersion of the substrate ( 1 ) coated with the layer ( 2 ) in the material photosensitive to light radiation ( 6 ).

13. The process as claimed in claim 1 , characterized in that it additionally comprises, after step f), a step of covering and sealing the layer ( 2 ) of the structure obtained with a covering cap ( 4 ).

14. The process as claimed in claim 1 , characterized in that the substrate ( 1 ) is made of a metal oxide, of a metal, of a polymer, of a polysaccharide or of a ceramic.

15. The process as claimed in claim 1 , characterized in that the substrate ( 1 ) is made of silicon.

16. The process of claim 6 , characterized in that the particles are particles made of a material chosen from silica, titanium dioxide, alumina, latex, polydimethoxysilane, gold, copper and the mixtures thereof and are optionally functionalized.

17. The process of claim 6 , characterized in that the particles are functionalized.

Assignees

• Commissariat Energie Atomique

Inventors

• Dellea Olivier
• Fugier Pascal
• Marie Helene
• Vignoud Severine

Classifications

• B01D53/0423

  Beds in columns · CPC title

• B05D1/005

  Spin coating · CPC title

• G01N30/60 Primary

  Construction of the column · CPC title

• G01N2030/025

  Gas chromatography · CPC title

• B05D3/062

  Pretreatment · CPC title