Plating apparatus and plating method

Patent metadata

Field	Value
Publication number	US-11047063-B2
Application number	US-201916373456-A
Country	US
Kind code	B2
Filing date	Apr 2, 2019
Priority date	Nov 20, 2014
Publication date	Jun 29, 2021
Grant date	Jun 29, 2021

Abstract

A plating apparatus according to the present disclosure includes an anode holder configured to hold an anode; a substrate holder placed opposite the anode holder and configured to hold a substrate; and an anode mask installed on a front face of the anode holder and provided with a first opening adapted to allow passage of an electric current flowing between an anode and the substrate. The diameter of the first opening in the anode mask is configured to be adjustable. When a first substrate is plated, a diameter of the first opening is adjusted to a first diameter. When a second substrate is plated, the diameter of the first opening is adjusted to a second diameter smaller than the first diameter.

First claim

What is claimed is:

1. A plating method comprising:
placing an anode holder in a plating bath, where the anode holder is integrally provided with an anode mask having a first opening adapted to allow passage of an electric current flowing between an anode and a substrate;
placing a substrate holder adapted to hold a first substrate in the plating bath;
placing a regulation plate between the anode mask and the substrate in a state that the regulation plate separates from the substrate holder and the anode holder, where the regulation plate includes a second opening adapted to allow passage of the electric current flowing between the anode and the substrate;
plating the first substrate with a diameter of the first opening adjusted to a first diameter;
placing a substrate holder adapted to hold a second substrate in the plating bath; and
plating the second substrate with a diameter of the first opening adjusted to a second diameter smaller than the first diameter.

2. The plating method according to claim 1 , wherein:
the first substrate and the second substrate are partially covered with resist; and
a resist aperture ratio of the second substrate is lower than a resist aperture ratio of the first substrate.

3. The plating method according to claim 1 , wherein a seed layer of the second substrate is thinner than a seed layer of the first substrate.

4. The plating method according to claim 1 , wherein
a plating solution used in the step of plating the second substrate is lower in electrical resistance than a plating solution used in the step of plating the first substrate.

5. The plating method according to claim 1 , further comprising adjusting the diameter of the second opening in the regulation plate.

6. The plating method according to claim 5 , wherein
the regulation plate includes an elastic body installed along the second opening; and
the step of adjusting the diameter of the second opening in the regulation plate includes a step of injecting a fluid into the elastic body or discharging the fluid out of the elastic body.

7. The plating method according to claim 1 , wherein
the diameter of the first opening of the anode holder is smaller than the diameter of the second opening of the regulation plate.

Assignees

• Ebara Corp

Inventors

• Fujikata Jumpei
• Shimoyama Masashi
• Nakagawa Yoichi
• Mukaiyama Yoshitaka
• Minami Yoshio

Classifications

• C25D17/008 Primary

  Current shielding devices · CPC title

• C25D17/10

  Electrodes {, e.g. composition, counter electrode} · CPC title

• C25D17/06

  Suspending or supporting devices for articles to be coated · CPC title

• C25D17/001

  Apparatus specially adapted for electrolytic coating of wafers, e.g. semiconductors or solar cells · CPC title

• C25D5/022

  using masking means · CPC title