Magnetically microfocused electron emission source

Patent metadata

Field	Value
Publication number	US-11037753-B2
Application number	US-201916450242-A
Country	US
Kind code	B2
Filing date	Jun 24, 2019
Priority date	Jul 3, 2018
Publication date	Jun 15, 2021
Grant date	Jun 15, 2021

Abstract

A magnetically microfocused electron emission source apparatus is disclosed. The apparatus may include a magnetic emitter unit, wherein the magnetic emitter unit comprises an emitter. Further, the magnetic emitter unit may include one or more magnetic portions formed from one or more magnetic materials, wherein the one or more magnetic portions of the magnetic emitter unit are configured to generate a magnetic field proximate to a tip of the emitter of the magnetic emitter unit for enhancing focusing of the emitted electrons from the electron emitter.

First claim

What is claimed is:

1. An apparatus comprising:
a magnetic emitter unit, wherein the magnetic emitter unit comprises an emitter and a magnetic sleeve structure surrounding the emitter and in mechanical contact with the emitter, wherein the emitter is formed from a non-magnetic material, the magnetic sleeve structure is configured to generate a magnetic field proximate to a tip of the emitter of the magnetic emitter unit for enhancing focusing of the emitted electrons from the emitter.

2. The apparatus of claim 1 , wherein the magnetic field generated by the magnetic emitter unit is configured to generate a lensing field for particle emission from the tip of the emitter of the magnetic emitter unit.

3. The apparatus of claim 2 , wherein the lensing field has a strength between 0.5-2.5 Tesla at a surface of the tip of the emitter.

4. The apparatus of claim 1 , wherein the particle emission from the tip of the emitter comprises:
at least one of thermal electron emission, Schottky electron emission, extended-Schottky electron emission, cold field electron emission, or photoemission.

5. The apparatus of claim 1 , wherein the magnetic sleeve structure is formed from at least one of nickel, iron, or cobalt.

6. An apparatus comprising:
an electron source including a magnetic emitter unit, wherein the magnetic emitter unit comprises an emitter and a magnetic sleeve structure surrounding the emitter and in mechanical contact with the emitter, wherein the emitter is formed from a non-magnetic material, the magnetic sleeve structure is configured to generate a magnetic field proximate to a tip of the emitter of the magnetic emitter unit for enhancing focusing of the emitted electrons from the emitter;
an electron-optical column including a set of electron-optical elements configured to direct an electron beam onto a sample; and
a detector assembly configured to detect an electron signal from the sample.

7. The apparatus of claim 6 , wherein the magnetic field generated by the magnetic emitter unit is configured to generate a lensing field for particle emission from the tip of the emitter of the magnetic emitter unit.

8. The apparatus of claim 7 , wherein the lensing field has a strength between 0.5-2.5 Tesla at a surface of the tip of the emitter.

9. The apparatus of claim 6 , wherein the particle emission from the tip of the emitter comprises:
at least one of thermal electron emission, Schottky electron emission, extended-Schottky electron emission, cold field electron emission, or photoemission.

10. The apparatus of claim 6 , wherein the magnetic sleeve structure is formed from at least one of nickel, iron, or cobalt.

11. The apparatus of claim 6 , wherein the apparatus comprises a scanning electron microscopy system.

12. The apparatus of claim 6 , wherein the apparatus comprises at least one of an inspection system or imaging-based metrology system.

13. A method comprising:
emitting a particle beam from a tip of an electron emitter surrounded by a magnetic sleeve structure in mechanical contact with the electron emitter; and
generating a magnetic field proximate to the tip of the electron emitter with the magnetic sleeve structure surrounding the electron emitter to enhance focusing of the emitted electrons from the electron emitter.

14. The method of claim 13 , wherein the magnetic sleeve structure is formed from at least one of nickel, iron, or cobalt.

Assignees

• Kla Tencor Corp
• Kla Corp

Inventors

• Sears Christopher

Classifications

• H01J37/28

  with scanning beams {(H01J37/268, H01J37/292, H01J37/2955 take precedence)} · CPC title

• H01J37/1475 Primary

  magnetic · CPC title

• H01J1/304

  Field-emissive cathodes · CPC title

• H01J37/143 Primary

  Permanent magnetic lenses · CPC title

• H01J37/285

  Emission microscopes, e.g. field-emission microscopes · CPC title