Gas enclosure assembly and system

Patent metadata

Field	Value
Publication number	US-11034176-B2
Application number	US-201916287577-A
Country	US
Kind code	B2
Filing date	Feb 27, 2019
Priority date	Jun 13, 2008
Publication date	Jun 15, 2021
Grant date	Jun 15, 2021

Abstract

The present teachings relate to various embodiments of an hermetically-sealed gas enclosure assembly and system that can be readily transportable and assemblable and provide for maintaining a minimum inert gas volume and maximal access to various devices and apparatuses enclosed therein. Various embodiments of an hermetically-sealed gas enclosure assembly and system of the present teachings can have a gas enclosure assembly constructed in a fashion that minimizes the internal volume of a gas enclosure assembly, and at the same time optimizes the working space to accommodate a variety of footprints of various OLED printing systems. Various embodiments of a gas enclosure assembly so constructed additionally provide ready access to the interior of a gas enclosure assembly from the exterior during processing and readily access to the interior for maintenance, while minimizing downtime.

First claim

What is claimed is:

1. A method comprising:
moving a printhead assembly from a first enclosure section of a gas enclosure to a second enclosure section of the gas enclosure, wherein:
the first enclosure section defines a first volume and houses a printing system to print a substrate, and
the second enclosure section defines a second volume and houses a device used to perform at least one of a printhead maintenance and calibration procedure;

positioning the printhead assembly to seal an opening positioned to provide flow communication between the first volume of the first enclosure section and the second volume of the second enclosure section, wherein the positioning of the printhead assembly isolates the first volume and the second volume from flow communication with each other; and
performing at least one of a maintenance procedure and a calibration procedure on the printhead assembly while the printhead assembly is in sealing engagement with the opening.

2. The method of claim 1 , wherein moving the printhead assembly comprises moving the printhead assembly along a bridge extending over a substrate support apparatus of the printing system.

3. The method of claim 1 , further comprising, while performing at least one of the maintenance procedure and calibration procedure, controlling a processing environment of the first volume within a defined specification that is different from an environment external to the gas enclosure.

4. The method of claim 3 , wherein controlling the processing environment comprises controlling a level of one or more reactive species.

5. The method of claim 3 , wherein controlling the processing environment comprises providing an inert gas processing environment within the first volume.

6. The method of claim 5 , wherein the inert gas processing environment comprises gas selected from nitrogen, any noble gases, and combinations thereof.

7. The method of claim 3 , wherein controlling the processing environment comprises controlling an amount of particulates in the first volume.

8. The method of claim 1 , further comprising accessing the second volume from an environment external the gas enclosure while the printhead assembly is positioned to seal the opening.

9. The method of claim 8 , further comprising loading at least one of a replacement printhead and a replacement printhead assembly into the second volume while the printhead assembly is positioned to seal the opening.

10. The method of claim 8 , further comprising removing at least one of a malfunctioning printhead and a malfunctioning printhead assembly from the second enclosure section while the printhead assembly is positioned to seal the opening.

11. The method of claim 1 , further comprising:
after performing the maintenance or calibration procedure, moving the printhead assembly to the first enclosure section to provide flow communication between the first volume and the second volume through the opening; and
controlling the processing environment of the first volume and the second volume within a defined specification.

12. The method of claim 11 , wherein controlling the processing environment comprises controlling a level of the one or more reactive species.

13. The method of claim 11 , wherein controlling the processing environment comprises providing an inert gas processing environment within the gas enclosure.

14. The method of claim 13 , wherein the inert gas processing environment comprises gas selected from nitrogen, any noble gases, and combinations thereof.

15. The method of claim 11 , wherein controlling the processing environment comprises controlling an amount of particulates in the first volume.

16. The method of claim 1 , wherein the second volume of the second enclosure section is about 1% to about 10% of a total volume of the gas enclosure.

17. The method of claim 1 , wherein the second volume of the second enclosure section is about 2% to about 5% of a total volume of the gas enclosure.

18. A method comprising:
controlling a processing environment of a first gas enclosure defining a first volume and a second gas enclosure defining a second volume to within a defined specification while the first volume and the second volume are in flow communication with each other;
depositing material, from a printhead assembly mounted in the second gas enclosure, on a substrate located in the first volume of the first gas enclosure, wherein the printhead assembly deposits the material through an opening providing the flow communication between the first volume and the second volume;
after depositing the material, closing the opening and isolating the first volume and the second volume from each other; and
performing at least one of a maintenance procedure and a calibration procedure on the printhead assembly while the first volume and the second volume are isolated from each other.

19. The method of claim 18 , wherein controlling the processing environment of the first gas enclosure occurs while performing at least one of the maintenance procedure and calibration procedure.

20. The method of claim 18 , further comprising opening the second volume of the second enclosure to an external environment not within the defined specification while performing at least one of the maintenance procedure and calibration procedure.

21. The method of claim 18 , further comprising moving the printhead assembly along the opening during the depositing of the material on the substrate.

22. The method of claim 18 , wherein closing the opening comprises moving a door into position to close the opening.

Assignees

• Kateeva Inc

Inventors

• Mauck Justin
• Ko Alexander Sou-Kang
• Vronsky Eliyahu
• Alderson Shandon

Classifications

• H10P72/0462 Primary

  characterised by the construction of the processing chambers, e.g. modular processing chambers · CPC title

• B41J2/165

  Prevention {or detection} of nozzle clogging, e.g. cleaning, capping or moistening for nozzles · CPC title

• H10K71/00

  Manufacture or treatment specially adapted for the organic devices covered by this subclass · CPC title

• B41J29/13 Primary

  Cases or covers · CPC title

• H10H20/01

  Manufacture or treatment · CPC title